JP2005525548A - 平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償 - Google Patents

平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償 Download PDF

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Publication number
JP2005525548A
JP2005525548A JP2004503890A JP2004503890A JP2005525548A JP 2005525548 A JP2005525548 A JP 2005525548A JP 2004503890 A JP2004503890 A JP 2004503890A JP 2004503890 A JP2004503890 A JP 2004503890A JP 2005525548 A JP2005525548 A JP 2005525548A
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Japan
Prior art keywords
interferometer
measurement object
relative
wafer
optical path
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JP2004503890A
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Japanese (ja)
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JP2005525548A5 (enExample
Inventor
エイ． ヒル、ヘンリー
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Zygo Corp
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Zygo Corp
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Publication of JP2005525548A publication Critical patent/JP2005525548A/ja
Publication of JP2005525548A5 publication Critical patent/JP2005525548A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2004503890A 2002-05-13 2003-05-13 平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償 Pending JP2005525548A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37800402P 2002-05-13 2002-05-13
PCT/US2003/014915 WO2003095940A2 (en) 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers

Publications (2)

Publication Number Publication Date
JP2005525548A true JP2005525548A (ja) 2005-08-25
JP2005525548A5 JP2005525548A5 (enExample) 2006-06-29

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Family Applications (1)

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JP2004503890A Pending JP2005525548A (ja) 2002-05-13 2003-05-13 平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償

Country Status (4)

Country Link
US (1) US7330274B2 (enExample)
JP (1) JP2005525548A (enExample)
AU (1) AU2003234413A1 (enExample)
WO (1) WO2003095940A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020512551A (ja) * 2017-03-22 2020-04-23 エーエスエムエル ネザーランズ ビー．ブイ． 位置測定システム、ゼロ調整方法、リソグラフィ装置およびデバイス製造方法
JP2021523475A (ja) * 2018-05-11 2021-09-02 ユニバーシティ オブ メリーランド， カレッジ パーク 極低温トラップイオンシステム

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WO2004113826A2 (en) 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7405833B2 (en) * 2004-11-05 2008-07-29 Zygo Corporation Method for calibration and removal of wavefront errors
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7359057B2 (en) * 2005-08-26 2008-04-15 Ball Aerospace & Technologies Corp. Method and apparatus for measuring small shifts in optical wavelengths
JP4659019B2 (ja) * 2007-12-21 2011-03-30 大学共同利用機関法人自然科学研究機構 波面センサ
US8934104B2 (en) * 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object
CN102834766B (zh) * 2010-04-01 2015-04-22 皇家飞利浦电子股份有限公司 激光扫描系统、毛发切割设备和相应的方法
US9213227B2 (en) * 2011-08-18 2015-12-15 Nikon Corporation Custom color or polarization sensitive CCD for separating multiple signals in autofocus projection system
DE102016014802B4 (de) 2016-12-13 2018-09-27 Universität Stuttgart Anordnung und Verfahren zur robusten Zweistrahl-Interferometrie mit einer Dreifach-Reflexions-Anordnung
CN112013972B (zh) * 2019-05-28 2024-03-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法
CN110553580B (zh) * 2019-06-04 2022-05-20 南京英特飞光电技术有限公司 一种倾斜入射相移干涉仪和直角棱镜大面测量方法
CN110441311B (zh) * 2019-07-22 2021-10-08 中国科学院上海光学精密机械研究所 用于多物面成像的多轴多焦镜头
CN111707616B (zh) * 2020-06-30 2023-02-21 西安工业大学 角分辨散射检测装置的多轴运动系统和检测方法
US20240053136A1 (en) * 2020-12-18 2024-02-15 Rapid Phenotyping Pty Limited Method of Processing Interferometry Signal, and Associated Interferometer
CN113607047B (zh) * 2021-08-04 2022-04-22 中国科学院长春光学精密机械与物理研究所 外差干涉信号模拟系统

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020512551A (ja) * 2017-03-22 2020-04-23 エーエスエムエル ネザーランズ ビー．ブイ． 位置測定システム、ゼロ調整方法、リソグラフィ装置およびデバイス製造方法
US10883816B2 (en) 2017-03-22 2021-01-05 Asml Netherlands B.V. Position measurement system, zeroing method, lithographic apparatus and device manufacturing method
JP2021523475A (ja) * 2018-05-11 2021-09-02 ユニバーシティ オブ メリーランド， カレッジ パーク 極低温トラップイオンシステム
JP7385928B2 (ja) 2018-05-11 2023-11-24 ユニバーシティ オブ メリーランド， カレッジ パーク 極低温トラップイオンシステム
JP7385928B6 (ja) 2018-05-11 2023-12-25 ユニバーシティ オブ メリーランド， カレッジ パーク 極低温トラップイオンシステム

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Publication number Publication date
US7330274B2 (en) 2008-02-12
AU2003234413A1 (en) 2003-11-11
WO2003095940A3 (en) 2004-02-12
US20030223077A1 (en) 2003-12-04
WO2003095940A2 (en) 2003-11-20

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