JP2005535690A - 帯電防止剤並びに当該帯電防止剤から得られるポリマー組成物 - Google Patents
帯電防止剤並びに当該帯電防止剤から得られるポリマー組成物 Download PDFInfo
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- JP2005535690A JP2005535690A JP2004526002A JP2004526002A JP2005535690A JP 2005535690 A JP2005535690 A JP 2005535690A JP 2004526002 A JP2004526002 A JP 2004526002A JP 2004526002 A JP2004526002 A JP 2004526002A JP 2005535690 A JP2005535690 A JP 2005535690A
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- 229920001059 synthetic polymer Polymers 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- SZWHXXNVLACKBV-UHFFFAOYSA-N tetraethylphosphanium Chemical compound CC[P+](CC)(CC)CC SZWHXXNVLACKBV-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- BXYHVFRRNNWPMB-UHFFFAOYSA-N tetramethylphosphanium Chemical compound C[P+](C)(C)C BXYHVFRRNNWPMB-UHFFFAOYSA-N 0.000 description 1
- CHYBTAZWINMGHA-UHFFFAOYSA-N tetraoctylazanium Chemical compound CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC CHYBTAZWINMGHA-UHFFFAOYSA-N 0.000 description 1
- CZMILNXHOAKSBR-UHFFFAOYSA-N tetraphenylazanium Chemical compound C1=CC=CC=C1[N+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 CZMILNXHOAKSBR-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- GFVKHYGXCQWRON-UHFFFAOYSA-N tributyl(ethyl)azanium Chemical compound CCCC[N+](CC)(CCCC)CCCC GFVKHYGXCQWRON-UHFFFAOYSA-N 0.000 description 1
- HOMONHWYLOPSLL-UHFFFAOYSA-N tributyl(ethyl)phosphanium Chemical compound CCCC[P+](CC)(CCCC)CCCC HOMONHWYLOPSLL-UHFFFAOYSA-N 0.000 description 1
- HNTQYVHJXDXWDT-UHFFFAOYSA-N tributyl(hexadecyl)azanium Chemical compound CCCCCCCCCCCCCCCC[N+](CCCC)(CCCC)CCCC HNTQYVHJXDXWDT-UHFFFAOYSA-N 0.000 description 1
- OKBQUWUVZGPEQZ-UHFFFAOYSA-N tributyl(hexadecyl)phosphanium Chemical compound CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC OKBQUWUVZGPEQZ-UHFFFAOYSA-N 0.000 description 1
- YCBRTSYWJMECAH-UHFFFAOYSA-N tributyl(tetradecyl)phosphanium Chemical compound CCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC YCBRTSYWJMECAH-UHFFFAOYSA-N 0.000 description 1
- PDSVZUAJOIQXRK-UHFFFAOYSA-N trimethyl(octadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)C PDSVZUAJOIQXRK-UHFFFAOYSA-N 0.000 description 1
- IKANSXQHJXBNIN-UHFFFAOYSA-N trimethyl(octadecyl)phosphanium Chemical compound CCCCCCCCCCCCCCCCCC[P+](C)(C)C IKANSXQHJXBNIN-UHFFFAOYSA-N 0.000 description 1
- NACZPBOVCXPUJN-UHFFFAOYSA-N tris-decyl(methyl)azanium Chemical compound CCCCCCCCCC[N+](C)(CCCCCCCCCC)CCCCCCCCCC NACZPBOVCXPUJN-UHFFFAOYSA-N 0.000 description 1
- YDEGKXHZLSSIGB-UHFFFAOYSA-N tris-decyl(methyl)phosphanium Chemical compound CCCCCCCCCC[P+](C)(CCCCCCCCCC)CCCCCCCCCC YDEGKXHZLSSIGB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0075—Antistatics
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/62—Quaternary ammonium compounds
- C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/54—Quaternary phosphonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/548—Silicon-containing compounds containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/064,676 US6900257B2 (en) | 2002-08-06 | 2002-08-06 | Antistatic agents and polymer compositions derived therefrom |
| PCT/US2003/019602 WO2004013218A1 (en) | 2002-08-06 | 2003-06-17 | Antistatic agents and polymer compositions derived therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005535690A true JP2005535690A (ja) | 2005-11-24 |
| JP2005535690A5 JP2005535690A5 (enExample) | 2006-08-03 |
Family
ID=31493933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004526002A Pending JP2005535690A (ja) | 2002-08-06 | 2003-06-17 | 帯電防止剤並びに当該帯電防止剤から得られるポリマー組成物 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6900257B2 (enExample) |
| EP (1) | EP1556437B1 (enExample) |
| JP (1) | JP2005535690A (enExample) |
| KR (1) | KR20050062767A (enExample) |
| CN (1) | CN100341928C (enExample) |
| AT (1) | ATE402977T1 (enExample) |
| AU (1) | AU2003247597A1 (enExample) |
| DE (1) | DE60322565D1 (enExample) |
| ES (1) | ES2306896T3 (enExample) |
| TW (1) | TW200402444A (enExample) |
| WO (1) | WO2004013218A1 (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013005712A1 (ja) | 2011-07-04 | 2013-01-10 | 日清紡ホールディングス株式会社 | イオン液体 |
| WO2014061482A1 (ja) | 2012-10-16 | 2014-04-24 | 日清紡ホールディングス株式会社 | イオン液体 |
| JP2014082315A (ja) * | 2012-10-16 | 2014-05-08 | Nisshinbo Holdings Inc | 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス |
| WO2016181726A1 (ja) * | 2015-05-11 | 2016-11-17 | 日清紡ホールディングス株式会社 | ケイ素含有イオン液体を含む潤滑剤 |
| JP2017036234A (ja) * | 2015-08-10 | 2017-02-16 | 日清紡ホールディングス株式会社 | 下限臨界共溶温度型の相挙動を示す化合物の利用 |
| WO2017051587A1 (ja) * | 2015-09-25 | 2017-03-30 | 日清紡ホールディングス株式会社 | 電解液用添加剤 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6841598B2 (en) * | 2002-08-16 | 2005-01-11 | General Electric Company | Antistatic and antidust agents, compositions thereof, and methods of manufacture |
| KR101016913B1 (ko) * | 2003-03-31 | 2011-02-22 | 도쿄엘렉트론가부시키가이샤 | 처리요소용 배리어층 및 그의 형성방법 |
| WO2006076716A1 (en) * | 2005-01-14 | 2006-07-20 | E.I. Dupont De Nemours And Company | Antistatic agent for polymers |
| US8071667B2 (en) | 2005-06-02 | 2011-12-06 | Nalco Company | Compositions comprising (poly) alpha olefins |
| EP3004208A4 (en) | 2013-06-03 | 2017-01-04 | PolyOne Corporation | Low molecular weight polyphenylene ether prepared without solvents |
| JP6651968B2 (ja) | 2016-04-21 | 2020-02-19 | 日清紡ホールディングス株式会社 | ケイ素含有硫酸エステル塩 |
| JP6958511B2 (ja) * | 2018-08-17 | 2021-11-02 | 信越化学工業株式会社 | オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3141898A (en) * | 1961-01-03 | 1964-07-21 | Minnesota Mining & Mfg | 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts |
| US3328449A (en) | 1963-12-05 | 1967-06-27 | Dow Corning | Sulfopropylated, organofunctional silanes and siloxanes |
| US4093589A (en) * | 1977-02-03 | 1978-06-06 | General Electric Company | Non-opaque flame retardant polycarbonate composition |
| DE2931172A1 (de) * | 1979-08-01 | 1981-02-19 | Bayer Ag | Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien |
| US4570197A (en) | 1983-01-03 | 1986-02-11 | Minnesota Mining & Manufacturing Company | Static reduction in magnetic recording cassettes |
| US4943380A (en) * | 1987-09-18 | 1990-07-24 | Takemoto Yushi Kabushiki Kaisha | Antistatic resin composition with transparency containing phosphonium sulphonate |
| US4873020A (en) | 1988-10-04 | 1989-10-10 | Minnesota Mining And Manufacturing Company | Fluorochemical surfactants and process for preparing same |
| US4904825A (en) | 1988-11-08 | 1990-02-27 | Ppg Industries, Inc. | Quaternary ammonium antistatic compounds |
| US4973616A (en) * | 1988-11-14 | 1990-11-27 | Ppg Industries, Inc. | Toluene sulfonate salts of 2-alkyl imidazolines |
| JP2855370B2 (ja) | 1990-11-19 | 1999-02-10 | 日華化学株式会社 | 内部練込み型ポリエステル樹脂用帯電防止剤 |
| DE4320920C1 (de) * | 1993-06-24 | 1994-06-16 | Goldschmidt Ag Th | Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien |
| JP3427848B2 (ja) * | 1993-07-02 | 2003-07-22 | 三菱瓦斯化学株式会社 | 帯電防止性樹脂組成物 |
| DE69431642T2 (de) * | 1993-08-26 | 2003-07-10 | Teijin Ltd., Osaka | Process for production of stabilized polycarbonate |
| US5468793A (en) * | 1994-07-25 | 1995-11-21 | Wico Corporation | Plastic compositions with antistatic properties |
| JPH10298539A (ja) | 1997-04-22 | 1998-11-10 | Arutetsuku Kk | 静電防止剤及びこの静電防止剤を用いて成る塗布及び接着剤 |
| US6194497B1 (en) | 1997-07-23 | 2001-02-27 | General Electric Company | Anti-static resin composition containing fluorinated phosphonium sulfonates |
| JPH11106635A (ja) | 1997-09-30 | 1999-04-20 | Ge Plastics Japan Ltd | ポリカーボネート樹脂組成物およびその成形品 |
| US6372829B1 (en) * | 1999-10-06 | 2002-04-16 | 3M Innovative Properties Company | Antistatic composition |
| US6592988B1 (en) | 1999-12-29 | 2003-07-15 | 3M Innovative Properties Company | Water-and oil-repellent, antistatic composition |
-
2002
- 2002-08-06 US US10/064,676 patent/US6900257B2/en not_active Expired - Lifetime
-
2003
- 2003-06-17 JP JP2004526002A patent/JP2005535690A/ja active Pending
- 2003-06-17 KR KR1020057002247A patent/KR20050062767A/ko not_active Ceased
- 2003-06-17 EP EP03766822A patent/EP1556437B1/en not_active Expired - Lifetime
- 2003-06-17 ES ES03766822T patent/ES2306896T3/es not_active Expired - Lifetime
- 2003-06-17 DE DE60322565T patent/DE60322565D1/de not_active Expired - Fee Related
- 2003-06-17 AT AT03766822T patent/ATE402977T1/de not_active IP Right Cessation
- 2003-06-17 WO PCT/US2003/019602 patent/WO2004013218A1/en not_active Ceased
- 2003-06-17 CN CNB038236907A patent/CN100341928C/zh not_active Expired - Fee Related
- 2003-06-17 AU AU2003247597A patent/AU2003247597A1/en not_active Abandoned
- 2003-07-29 TW TW092120685A patent/TW200402444A/zh unknown
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140057534A (ko) | 2011-07-04 | 2014-05-13 | 닛신보 홀딩스 가부시키 가이샤 | 이온 액체 |
| JP2013014536A (ja) * | 2011-07-04 | 2013-01-24 | Nisshinbo Holdings Inc | イオン液体 |
| WO2013005712A1 (ja) | 2011-07-04 | 2013-01-10 | 日清紡ホールディングス株式会社 | イオン液体 |
| KR20150068962A (ko) | 2012-10-16 | 2015-06-22 | 닛신보 홀딩스 가부시키 가이샤 | 이온 액체 |
| JP2014080388A (ja) * | 2012-10-16 | 2014-05-08 | Nisshinbo Holdings Inc | イオン液体 |
| JP2014082315A (ja) * | 2012-10-16 | 2014-05-08 | Nisshinbo Holdings Inc | 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス |
| WO2014061482A1 (ja) | 2012-10-16 | 2014-04-24 | 日清紡ホールディングス株式会社 | イオン液体 |
| US9221847B2 (en) | 2012-10-16 | 2015-12-29 | Nisshinbo Holdings Inc. | Ionic liquid |
| WO2016181726A1 (ja) * | 2015-05-11 | 2016-11-17 | 日清紡ホールディングス株式会社 | ケイ素含有イオン液体を含む潤滑剤 |
| US10619117B2 (en) | 2015-05-11 | 2020-04-14 | Nisshinbo Holdings Inc. | Lubricant including silicon-containing ionic liquid |
| JP2017036234A (ja) * | 2015-08-10 | 2017-02-16 | 日清紡ホールディングス株式会社 | 下限臨界共溶温度型の相挙動を示す化合物の利用 |
| WO2017051587A1 (ja) * | 2015-09-25 | 2017-03-30 | 日清紡ホールディングス株式会社 | 電解液用添加剤 |
| JP2017062955A (ja) * | 2015-09-25 | 2017-03-30 | 日清紡ホールディングス株式会社 | 電解液用添加剤 |
| US10658700B2 (en) | 2015-09-25 | 2020-05-19 | Nisshinbo Holdings Inc. | Additive for electrolyte solutions |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE402977T1 (de) | 2008-08-15 |
| US6900257B2 (en) | 2005-05-31 |
| CN1688644A (zh) | 2005-10-26 |
| KR20050062767A (ko) | 2005-06-27 |
| US20040030015A1 (en) | 2004-02-12 |
| EP1556437B1 (en) | 2008-07-30 |
| ES2306896T3 (es) | 2008-11-16 |
| WO2004013218A1 (en) | 2004-02-12 |
| EP1556437A1 (en) | 2005-07-27 |
| DE60322565D1 (de) | 2008-09-11 |
| AU2003247597A1 (en) | 2004-02-23 |
| CN100341928C (zh) | 2007-10-10 |
| TW200402444A (en) | 2004-02-16 |
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