ES2306896T3 - Agentes antiestaticos y composiciones polimericas derivadas de los misos. - Google Patents

Agentes antiestaticos y composiciones polimericas derivadas de los misos. Download PDF

Info

Publication number
ES2306896T3
ES2306896T3 ES03766822T ES03766822T ES2306896T3 ES 2306896 T3 ES2306896 T3 ES 2306896T3 ES 03766822 T ES03766822 T ES 03766822T ES 03766822 T ES03766822 T ES 03766822T ES 2306896 T3 ES2306896 T3 ES 2306896T3
Authority
ES
Spain
Prior art keywords
aliphatic
independently
unsubstituted
group substituted
aromatic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES03766822T
Other languages
English (en)
Spanish (es)
Inventor
Sanjoy Kumar Chowdhury
Theodorus Lambertus Hoeks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
SABIC Innovative Plastics IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SABIC Innovative Plastics IP BV filed Critical SABIC Innovative Plastics IP BV
Application granted granted Critical
Publication of ES2306896T3 publication Critical patent/ES2306896T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0075—Antistatics
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/548—Silicon-containing compounds containing sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ES03766822T 2002-08-06 2003-06-17 Agentes antiestaticos y composiciones polimericas derivadas de los misos. Expired - Lifetime ES2306896T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/064,676 US6900257B2 (en) 2002-08-06 2002-08-06 Antistatic agents and polymer compositions derived therefrom
US64676 2002-08-06

Publications (1)

Publication Number Publication Date
ES2306896T3 true ES2306896T3 (es) 2008-11-16

Family

ID=31493933

Family Applications (1)

Application Number Title Priority Date Filing Date
ES03766822T Expired - Lifetime ES2306896T3 (es) 2002-08-06 2003-06-17 Agentes antiestaticos y composiciones polimericas derivadas de los misos.

Country Status (11)

Country Link
US (1) US6900257B2 (enExample)
EP (1) EP1556437B1 (enExample)
JP (1) JP2005535690A (enExample)
KR (1) KR20050062767A (enExample)
CN (1) CN100341928C (enExample)
AT (1) ATE402977T1 (enExample)
AU (1) AU2003247597A1 (enExample)
DE (1) DE60322565D1 (enExample)
ES (1) ES2306896T3 (enExample)
TW (1) TW200402444A (enExample)
WO (1) WO2004013218A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
WO2004095532A2 (en) * 2003-03-31 2004-11-04 Tokyo Electron Limited A barrier layer for a processing element and a method of forming the same
WO2006076714A1 (en) * 2005-01-14 2006-07-20 E.I. Dupont De Nemours And Company Antistatic agent for polymers
US8071667B2 (en) * 2005-06-02 2011-12-06 Nalco Company Compositions comprising (poly) alpha olefins
JP5866829B2 (ja) 2011-07-04 2016-02-24 日清紡ホールディングス株式会社 イオン液体
JP6090561B2 (ja) * 2012-10-16 2017-03-08 日清紡ホールディングス株式会社 蓄電デバイス用電解質塩及び電解液、並びに蓄電デバイス
JP6051757B2 (ja) * 2012-10-16 2016-12-27 日清紡ホールディングス株式会社 イオン液体
EP3004208A4 (en) 2013-06-03 2017-01-04 PolyOne Corporation Low molecular weight polyphenylene ether prepared without solvents
WO2016181726A1 (ja) * 2015-05-11 2016-11-17 日清紡ホールディングス株式会社 ケイ素含有イオン液体を含む潤滑剤
JP6582705B2 (ja) * 2015-08-10 2019-10-02 日清紡ホールディングス株式会社 下限臨界共溶温度型の相挙動を示す化合物の利用
JP6601094B2 (ja) * 2015-09-25 2019-11-06 日清紡ホールディングス株式会社 電解液用添加剤
JP6651968B2 (ja) * 2016-04-21 2020-02-19 日清紡ホールディングス株式会社 ケイ素含有硫酸エステル塩
JP6958511B2 (ja) * 2018-08-17 2021-11-02 信越化学工業株式会社 オルガノポリシロキサン化合物およびその製造方法並びにそれを含有する帯電防止剤および硬化性組成物

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141898A (en) * 1961-01-03 1964-07-21 Minnesota Mining & Mfg 2, 2-dimethyl-2-silaalkane-sulfonic acids and their salts
US3328449A (en) 1963-12-05 1967-06-27 Dow Corning Sulfopropylated, organofunctional silanes and siloxanes
US4093589A (en) 1977-02-03 1978-06-06 General Electric Company Non-opaque flame retardant polycarbonate composition
DE2931172A1 (de) 1979-08-01 1981-02-19 Bayer Ag Verwendung von alkali- und erdalkalisalzen alkylsubstituierter aromatischer sulfonsaeuren, phosphonsaeuren und sauerer phosphonsaeureester als interne antistatika fuer polycarbonat, insbesondere fuer polycarbonatfolien
US4570197A (en) 1983-01-03 1986-02-11 Minnesota Mining & Manufacturing Company Static reduction in magnetic recording cassettes
US4943380A (en) 1987-09-18 1990-07-24 Takemoto Yushi Kabushiki Kaisha Antistatic resin composition with transparency containing phosphonium sulphonate
US4873020A (en) 1988-10-04 1989-10-10 Minnesota Mining And Manufacturing Company Fluorochemical surfactants and process for preparing same
US4904825A (en) 1988-11-08 1990-02-27 Ppg Industries, Inc. Quaternary ammonium antistatic compounds
US4973616A (en) 1988-11-14 1990-11-27 Ppg Industries, Inc. Toluene sulfonate salts of 2-alkyl imidazolines
JP2855370B2 (ja) 1990-11-19 1999-02-10 日華化学株式会社 内部練込み型ポリエステル樹脂用帯電防止剤
DE4320920C1 (de) * 1993-06-24 1994-06-16 Goldschmidt Ag Th Silane mit hydrophilen Gruppen, deren Herstellung und Verwendung als Tenside in wäßrigen Medien
JP3427848B2 (ja) 1993-07-02 2003-07-22 三菱瓦斯化学株式会社 帯電防止性樹脂組成物
ES2185644T3 (es) 1993-08-26 2003-05-01 Teijin Ltd Procedimiento de produccion de policarbonato estabilizado.
US5468793A (en) 1994-07-25 1995-11-21 Wico Corporation Plastic compositions with antistatic properties
JPH10298539A (ja) 1997-04-22 1998-11-10 Arutetsuku Kk 静電防止剤及びこの静電防止剤を用いて成る塗布及び接着剤
US6194497B1 (en) 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
JPH11106635A (ja) 1997-09-30 1999-04-20 Ge Plastics Japan Ltd ポリカーボネート樹脂組成物およびその成形品
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition

Also Published As

Publication number Publication date
EP1556437B1 (en) 2008-07-30
CN1688644A (zh) 2005-10-26
CN100341928C (zh) 2007-10-10
DE60322565D1 (de) 2008-09-11
WO2004013218A1 (en) 2004-02-12
TW200402444A (en) 2004-02-16
US20040030015A1 (en) 2004-02-12
KR20050062767A (ko) 2005-06-27
JP2005535690A (ja) 2005-11-24
ATE402977T1 (de) 2008-08-15
EP1556437A1 (en) 2005-07-27
US6900257B2 (en) 2005-05-31
AU2003247597A1 (en) 2004-02-23

Similar Documents

Publication Publication Date Title
ES2306896T3 (es) Agentes antiestaticos y composiciones polimericas derivadas de los misos.
US7851524B2 (en) Antistatic agents, compositions thereof, and methods of manufacture
US3933779A (en) Antistatic polymer blend
US6372829B1 (en) Antistatic composition
CN114258415A (zh) 含膦酸酯阻燃剂的聚合物配混物
KR20000070850A (ko) 정전기 소산성 조성물
KR100737661B1 (ko) 대전방지제
NO149556B (no) Murkonstruksjon.
US3224889A (en) Anti-static high molecular weight compounds
TWI665191B (zh) 紫外線吸收劑及合成樹脂組合物
KR101400630B1 (ko) 대전 방지제 및 이것을 함유하는 대전 방지성 수지 조성물
KR101266296B1 (ko) 폴리에스테르 수지 조성물 및 이를 이용한 성형품
MXPA01010902A (es) Agentes antiestatica y composiciones de resina incorporadas en ellos.
JP6871824B2 (ja) 帯電防止性ポリカーボネート樹脂組成物
US3395137A (en) Process for rendering high molecular weight compounds resistant to electrostatic charge
TW201900665A (zh) 新穎化合物及樹脂組合物
JP2012025840A (ja) 環状アミン塩を含む難燃剤及び難燃性樹脂組成物
KR0166982B1 (ko) 열가소성수지조성물
US20220177674A1 (en) Silyl functional compound for improving flame retardant properties
JP5536513B2 (ja) ポリカーボネート樹脂用帯電防止剤及びポリカーボネート樹脂組成物
TW201602121A (zh) 抗靜電劑、絕緣體高分子材料所構成之成形品及其製造方法
JP2007137915A (ja) 合成樹脂組成物、その製造方法および合成樹脂成形体