JP2005527078A - 負荷不整合信頼性および安定性のあるvhfプラズマ処理のための方法および装置 - Google Patents
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Abstract
Description
本発明は、高電力プラズマ処理システムに関し、特に、激しい非線形負荷不整合状態の下で、プラズマ処理システムにVHF高電力無線周波数エネルギを供給するための方法および装置に関する。
プラズマ処理システムは、半導体ウエハ上に所望のパターンを作成するために、薄膜製造のための半導体産業において、広く用いられている。
したがって、本発明の一態様において、非線形負荷不整合状態に抵抗力のあるプラズマ処理システム用無線周波数(RF)発生器装置が提供される。この装置には、RF信号を発生するように構成されたRF発振器と、RF信号に応答し、プラズマチャンバ負荷を駆動するのに十分な電力を有するVHF・RF信号を生成する増幅器と、増幅器に結合され、プラズマチャンバ負荷の非線形性を増幅器から分離するように構成されたVHF帯サーキュレータとが含まれる。
好適な実施形態の次の説明は、本質的には単に例示的なものであり、本発明、その適用または使用を限定することを決して意図したものではない。
Claims (24)
- 非線形負荷不整合状態に抵抗力のあるプラズマ処理システム用の無線周波数(RF)発生器装置であって、
RF信号を発生するように構成されたRF発振器と、
前記RF信号に応答し、プラズマチャンバ負荷を駆動するのに十分な電力を有するVHF・RF信号を生成するRF増幅器と、
前記増幅器に結合され、かつ前記プラズマチャンバ負荷の非線形性を前記RF増幅器から分離するように構成されたVHF帯サーキュレータと、
を含む装置。 - 前記VHF帯サーキュレータがY接合サーキュレータを含む、請求項1に記載の装置。
- 前記RF増幅器が、駆動回路と、電力増幅器と、第1の90度ハイブリッド結合器と、第2の90度ハイブリッド結合器とを含み、前記第1の90度ハイブリッド結合器が、前記駆動回路を、前記電力増幅器から分離する2方向スプリッタとして構成され、前記電力増幅器が、2つのハーフセクションを含み、前記第2の90度ハイブリッド結合器が、前記電力増幅器における両方の前記ハーフセクションの出力を結合する2方向コンバイナとして構成されている、請求項1に記載の装置。
- 前記RF信号の周波数を調整するように構成された制御基板と、前記サーキュレータの出力部に結合された入力部を有し、前記サーキュレータからRF電力を受け取る方向性結合器と、前記サーキュレータの前記出力部におけるRF電力量を表す信号を、前記制御基板へ提供するように構成されたセンサとをさらに含み、前記制御基板が、RF電力量を表す前記信号に応答して、前記RF信号の前記周波数を調整する、請求項1に記載の装置。
- 前記方向性結合器の出力部に結合された入力部を有する低域通過フィルタをさらに含む、請求項4に記載の装置。
- 前記低域通過フィルタの出力部に結合された入力部を有し、前記プラズマチャンバ負荷に結合された信号におけるRF高調波を接地に分路するように構成された高域通過フィルタをさらに含む、請求項5に記載の装置。
- 前記低域通過フィルタの出力部に結合された入力部と、前記プラズマチャンバ負荷に電力を供給するように構成された出力部とを有する負荷整合ネットワークをさらに含み、前記負荷整合ネットワークが、前記装置の出力インピーダンスを、一組の動作状態の下にあるプラズマチャンバ負荷にほぼ整合させるように構成された、請求項6に記載の装置。
- VHF周波数で、少なくとも2.5キロワットのRF電力を生成するように構成された、請求項1に記載の装置。
- 前記増幅器が、プッシュプル構成における、16個以下の出力トランジスタを含む、請求項8に記載の装置。
- 第1のシャーシと、前記第1のシャーシに収容された電源および前記RF発振器を制御するように構成された制御基板と、前記増幅器と、前記第1のシャーシとは別個の第2のシャーシと、前記第2のシャーシ内に収容されたヒートシンクとを含み、
前記第2のシャーシがまた、前記増幅器と、前記VHF帯サーキュレータとを収容する、請求項1に記載の装置。 - 前記VHF帯サーキュレータが集中回路素子を含む、請求項1に記載の装置。
- 前記VHF帯サーキュレータが受動非可逆フェライト素子を含む、請求項1に記載の装置。
- 前記RF発振器が直接デジタルシンセサイザを含む、請求項1に記載の装置。
- 前記RF発振器が位相ロックループで動作する電圧制御発振器を含む、請求項1に記載の装置。
- プラズマチャンバと、
前記プラズマチャンバに動作可能に結合されて、前記プラズマチャンバにVHF周波数でRF電力を供給する無線周波数(RF)発生器装置であって、前記RF発生器装置に供給される前記RF電力を生成するように構成されたRF増幅器と、前記RF電力を前記プラズマチャンバに供給するように構成された出力部を有し、かつ前記プラズマチャンバの非線形性を前記RF増幅器から分離するVHF帯サーキュレータとを含むRF発生器装置と、
を含む、プラズマ処理システム。 - 前記VHF帯サーキュレータがY接合サーキュレータを含む、請求項15に記載のプラズマ処理システム。
- 前記RF増幅器が、駆動回路と、電力増幅器と、第1の90度ハイブリッド結合器と、第2の90度ハイブリッド結合器とを含み、前記第1の90度ハイブリッド結合器が、前記駆動回路を、前記電力増幅器から分離する2方向スプリッタとして構成され、前記電力増幅器が、2つのハーフセクションを含み、前記第2の90度ハイブリッド結合器が、前記電力増幅器における両方の前記ハーフセクションの出力を結合する2方向コンバイナとして構成されている、請求項15に記載のプラズマ処理システム。
- 前記プラズマチャンバに供給される前記RF信号の周波数を調整する制御基板と、前記サーキュレータの出力部に結合された入力部を有し、前記サーキュレータからRF電力を受け取る方向性結合器と、前記サーキュレータの前記出力部におけるRF電力量を表す信号を、前記制御基板へ提供するように構成されたセンサとをさらに含み、前記制御基板が、RF電力量を表す前記信号に応答し、前記RF電力の前記周波数を調整する、請求項15に記載のプラズマ処理システム。
- 前記方向性結合器と前記プラズマチャンバとの間に動作可能に結合され、前記方向性結合器を通過するRF電力における高調波を低減する低域通過フィルタをさらに含む、請求項18に記載のプラズマ処理システム。
- 前記高調波を接地に分路するように構成された高域通過フィルタをさらに含む、請求項19に記載のプラズマ処理システム。
- VHF周波数でRF電力を、非線形プラズマチャンバ負荷に供給するための方法であって、
RF発生器出力段階において、VHF・RF電力を発生することと、
VHF帯サーキュレータを通して、前記VHF・RF電力を送ることと、
前記VHF帯サーキュレータを通して送られた前記VHF・RF電力を、プラズマチャンバ負荷に印加することと、
を含む方法。 - 方向性結合器を用いて、前記RF発生器出力段階からのRF電力出力量を感知することと、
前記感知したRF電力量により、前記RF電力の周波数を調整することと、
前記プラズマチャンバ負荷と前記VHF帯サーキュレータ/アイソレータとの間に動作可能に結合された低域通過フィルタを用いて、前記方向性結合器から前記RF電力の高調波を分離することと、
をさらに含む、請求項21に記載の方法。 - 前記RF電力の高調波を、前記プラズマチャンバ負荷と前記方向性結合器との間で、接地に分路することをさらに含む、請求項22に記載の方法。
- 前記感知したRF電力量により、前記RF電力の周波数を調整することをさらに含む、請求項22に記載の方法。
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US10/151,425 US6703080B2 (en) | 2002-05-20 | 2002-05-20 | Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
PCT/US2003/011122 WO2003101160A2 (en) | 2002-05-20 | 2003-04-14 | Method and apparatus for vhf plasma processing |
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JP2010054147A Pending JP2010182683A (ja) | 2002-05-20 | 2010-03-11 | 負荷不整合信頼性および安定性のあるvhfプラズマ処理のための方法および装置 |
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Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007080249A (ja) * | 2005-07-29 | 2007-03-29 | Mks Instruments Inc | 高信頼性無線周波発生器の構造 |
JP2007115688A (ja) * | 2005-10-17 | 2007-05-10 | Huettinger Elektronik Gmbh & Co Kg | Hfプラズマ供給装置 |
JP2008117777A (ja) * | 2006-11-04 | 2008-05-22 | Huettinger Elektronik Gmbh & Co Kg | 少なくとも2つの高周波電力発生器のドライブ制御方法、高周波電力発生器ドライブ制御装置および高周波プラズマ励起装置 |
JP2010536117A (ja) * | 2007-07-23 | 2010-11-25 | ヒュッティンガー エレクトローニク ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | プラズマ給電装置 |
JP2011525682A (ja) * | 2008-05-14 | 2011-09-22 | アプライド マテリアルズ インコーポレイテッド | Rf電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置 |
WO2011132454A1 (ja) * | 2010-04-20 | 2011-10-27 | シャープ株式会社 | プラズマ処理装置、プラズマ処理方法および半導体素子の製造方法 |
JP2014508378A (ja) * | 2011-01-04 | 2014-04-03 | アドバンスト・エナジー・インダストリーズ・インコーポレイテッド | プラズマ処理負荷へのシステムレベルの電力送達 |
JP2017516258A (ja) * | 2014-03-24 | 2017-06-15 | アドバンスト・エナジー・インダストリーズ・インコーポレイテッドAdvanced Energy Industries, Inc. | 高周波発生器ソースインピーダンスの制御のためのシステムおよび方法 |
US10224184B2 (en) | 2014-03-24 | 2019-03-05 | Aes Global Holdings, Pte. Ltd | System and method for control of high efficiency generator source impedance |
US10714313B2 (en) | 2015-06-30 | 2020-07-14 | Trumpf Huettinger Gmbh + Co. Kg | High frequency amplifier apparatuses |
US11651939B2 (en) | 2017-07-07 | 2023-05-16 | Advanced Energy Industries, Inc. | Inter-period control system for plasma power delivery system and method of operating same |
US11670487B1 (en) | 2022-01-26 | 2023-06-06 | Advanced Energy Industries, Inc. | Bias supply control and data processing |
US11842884B2 (en) | 2017-11-17 | 2023-12-12 | Advanced Energy Industries, Inc. | Spatial monitoring and control of plasma processing environments |
US11942309B2 (en) | 2022-01-26 | 2024-03-26 | Advanced Energy Industries, Inc. | Bias supply with resonant switching |
US11978613B2 (en) | 2022-09-01 | 2024-05-07 | Advanced Energy Industries, Inc. | Transition control in a bias supply |
Families Citing this family (176)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6838832B1 (en) * | 2002-03-08 | 2005-01-04 | Lam Research Corporation | Apparatus and methods for improving the stability of RF power delivery to a plasma load |
US6794951B2 (en) * | 2002-08-05 | 2004-09-21 | Veeco Instruments, Inc. | Solid state RF power switching network |
JP3641785B2 (ja) * | 2002-08-09 | 2005-04-27 | 株式会社京三製作所 | プラズマ発生用電源装置 |
JP4388287B2 (ja) * | 2003-02-12 | 2009-12-24 | 東京エレクトロン株式会社 | プラズマ処理装置及び高周波電力供給装置 |
US6791274B1 (en) * | 2003-07-15 | 2004-09-14 | Advanced Energy Industries, Inc. | RF power control device for RF plasma applications |
US6995545B2 (en) * | 2003-08-18 | 2006-02-07 | Mks Instruments, Inc. | Control system for a sputtering system |
US7449220B2 (en) * | 2004-04-30 | 2008-11-11 | Oc Oerlikon Blazers Ag | Method for manufacturing a plate-shaped workpiece |
US7292045B2 (en) * | 2004-09-04 | 2007-11-06 | Applied Materials, Inc. | Detection and suppression of electrical arcing |
US7138861B2 (en) * | 2004-12-29 | 2006-11-21 | Telefonaktiebolaget L M Ericsson (Publ) | Load mismatch adaptation in coupler-based amplifiers |
PL1701376T3 (pl) * | 2005-03-10 | 2007-04-30 | Huettinger Elektronik Gmbh Co Kg | Próżniowy generator plazmowy |
EP1739716A1 (de) * | 2005-07-02 | 2007-01-03 | HÜTTINGER Elektronik GmbH + Co. KG | HF-Plasmaprozesssystem |
CN100362619C (zh) * | 2005-08-05 | 2008-01-16 | 中微半导体设备(上海)有限公司 | 真空反应室的射频匹配耦合网络及其配置方法 |
EP1753011B1 (de) * | 2005-08-13 | 2012-10-03 | HÜTTINGER Elektronik GmbH + Co. KG | Verfahren zur Erzeugung von Ansteuersignalen für HF-Leistungsgeneratoren |
KR100784824B1 (ko) * | 2005-11-04 | 2007-12-14 | 한국표준과학연구원 | 플라즈마 진단장치 및 진단방법 |
US20080000768A1 (en) * | 2006-06-30 | 2008-01-03 | Stimson Bradley O | Electrically Coupled Target Panels |
US7902991B2 (en) * | 2006-09-21 | 2011-03-08 | Applied Materials, Inc. | Frequency monitoring to detect plasma process abnormality |
US8004364B2 (en) * | 2006-12-22 | 2011-08-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High power RF solid state power amplifier system |
US7879731B2 (en) | 2007-01-30 | 2011-02-01 | Applied Materials, Inc. | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources |
US7570028B2 (en) * | 2007-04-26 | 2009-08-04 | Advanced Energy Industries, Inc. | Method and apparatus for modifying interactions between an electrical generator and a nonlinear load |
DE102007036592B4 (de) * | 2007-08-02 | 2014-07-10 | Astrium Gmbh | Hochfrequenzgenerator für Ionen- und Elektronenquellen |
US7811410B2 (en) * | 2008-06-19 | 2010-10-12 | Lam Research Corporation | Matching circuit for a complex radio frequency (RF) waveform |
US7872523B2 (en) * | 2008-07-01 | 2011-01-18 | Mks Instruments, Inc. | Radio frequency (RF) envelope pulsing using phase switching of switch-mode power amplifiers |
US20100123502A1 (en) * | 2008-07-09 | 2010-05-20 | Bhutta Imran A | System for providing a substantially uniform potential profile |
US8674844B2 (en) * | 2009-03-19 | 2014-03-18 | Applied Materials, Inc. | Detecting plasma chamber malfunction |
US8674606B2 (en) * | 2009-04-27 | 2014-03-18 | Advanced Energy Industries, Inc. | Detecting and preventing instabilities in plasma processes |
US8716984B2 (en) | 2009-06-29 | 2014-05-06 | Advanced Energy Industries, Inc. | Method and apparatus for modifying the sensitivity of an electrical generator to a nonlinear load |
US9112452B1 (en) | 2009-07-14 | 2015-08-18 | Rf Micro Devices, Inc. | High-efficiency power supply for a modulated load |
US8143952B2 (en) * | 2009-10-08 | 2012-03-27 | Qualcomm Incorporated | Three dimensional inductor and transformer |
DE102010002753B4 (de) * | 2010-03-11 | 2012-03-29 | Hüttinger Elektronik Gmbh + Co. Kg | Plasmaversorgungsanordnung mit mehreren Leistungskopplungsstufen |
US9431974B2 (en) | 2010-04-19 | 2016-08-30 | Qorvo Us, Inc. | Pseudo-envelope following feedback delay compensation |
US9099961B2 (en) | 2010-04-19 | 2015-08-04 | Rf Micro Devices, Inc. | Output impedance compensation of a pseudo-envelope follower power management system |
EP2782246B1 (en) | 2010-04-19 | 2018-06-13 | Qorvo US, Inc. | Pseudo-envelope following power management system |
US8981848B2 (en) | 2010-04-19 | 2015-03-17 | Rf Micro Devices, Inc. | Programmable delay circuitry |
WO2012047738A1 (en) | 2010-09-29 | 2012-04-12 | Rf Micro Devices, Inc. | SINGLE μC-BUCKBOOST CONVERTER WITH MULTIPLE REGULATED SUPPLY OUTPUTS |
WO2012068258A2 (en) | 2010-11-16 | 2012-05-24 | Rf Micro Devices, Inc. | Digital fast cordic for envelope tracking generation |
WO2012109227A2 (en) | 2011-02-07 | 2012-08-16 | Rf Micro Devices, Inc. | Group delay calibration method for power amplifier envelope tracking |
US9247496B2 (en) | 2011-05-05 | 2016-01-26 | Rf Micro Devices, Inc. | Power loop control based envelope tracking |
US9379667B2 (en) | 2011-05-05 | 2016-06-28 | Rf Micro Devices, Inc. | Multiple power supply input parallel amplifier based envelope tracking |
US9246460B2 (en) | 2011-05-05 | 2016-01-26 | Rf Micro Devices, Inc. | Power management architecture for modulated and constant supply operation |
US8744396B2 (en) * | 2011-05-09 | 2014-06-03 | Bae Systems Information And Electronic Systems Integration Inc. | Compact modular upgrade for GMR software defined tactical radio |
US9178627B2 (en) | 2011-05-31 | 2015-11-03 | Rf Micro Devices, Inc. | Rugged IQ receiver based RF gain measurements |
US9019011B2 (en) | 2011-06-01 | 2015-04-28 | Rf Micro Devices, Inc. | Method of power amplifier calibration for an envelope tracking system |
US8952710B2 (en) | 2011-07-15 | 2015-02-10 | Rf Micro Devices, Inc. | Pulsed behavior modeling with steady state average conditions |
US9263996B2 (en) | 2011-07-20 | 2016-02-16 | Rf Micro Devices, Inc. | Quasi iso-gain supply voltage function for envelope tracking systems |
WO2013033700A1 (en) | 2011-09-02 | 2013-03-07 | Rf Micro Devices, Inc. | Split vcc and common vcc power management architecture for envelope tracking |
US8957728B2 (en) | 2011-10-06 | 2015-02-17 | Rf Micro Devices, Inc. | Combined filter and transconductance amplifier |
CN103988406B (zh) | 2011-10-26 | 2017-03-01 | Qorvo美国公司 | 射频(rf)开关转换器以及使用rf开关转换器的rf放大装置 |
US9484797B2 (en) | 2011-10-26 | 2016-11-01 | Qorvo Us, Inc. | RF switching converter with ripple correction |
US9024688B2 (en) * | 2011-10-26 | 2015-05-05 | Rf Micro Devices, Inc. | Dual parallel amplifier based DC-DC converter |
CN103959189B (zh) | 2011-10-26 | 2015-12-23 | 射频小型装置公司 | 基于电感的并行放大器相位补偿 |
US8902015B1 (en) | 2011-11-18 | 2014-12-02 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Radio frequency power load and associated method |
US9515621B2 (en) | 2011-11-30 | 2016-12-06 | Qorvo Us, Inc. | Multimode RF amplifier system |
US9250643B2 (en) | 2011-11-30 | 2016-02-02 | Rf Micro Devices, Inc. | Using a switching signal delay to reduce noise from a switching power supply |
US8975959B2 (en) | 2011-11-30 | 2015-03-10 | Rf Micro Devices, Inc. | Monotonic conversion of RF power amplifier calibration data |
US9041365B2 (en) | 2011-12-01 | 2015-05-26 | Rf Micro Devices, Inc. | Multiple mode RF power converter |
US9280163B2 (en) | 2011-12-01 | 2016-03-08 | Rf Micro Devices, Inc. | Average power tracking controller |
US9256234B2 (en) | 2011-12-01 | 2016-02-09 | Rf Micro Devices, Inc. | Voltage offset loop for a switching controller |
US8947161B2 (en) | 2011-12-01 | 2015-02-03 | Rf Micro Devices, Inc. | Linear amplifier power supply modulation for envelope tracking |
US9494962B2 (en) | 2011-12-02 | 2016-11-15 | Rf Micro Devices, Inc. | Phase reconfigurable switching power supply |
US9813036B2 (en) | 2011-12-16 | 2017-11-07 | Qorvo Us, Inc. | Dynamic loadline power amplifier with baseband linearization |
US9298198B2 (en) | 2011-12-28 | 2016-03-29 | Rf Micro Devices, Inc. | Noise reduction for envelope tracking |
US8952765B2 (en) * | 2012-03-23 | 2015-02-10 | Mks Instruments, Inc. | System and methods of bimodal automatic power and frequency tuning of RF generators |
US9279722B2 (en) | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
US8981839B2 (en) | 2012-06-11 | 2015-03-17 | Rf Micro Devices, Inc. | Power source multiplexer |
WO2014018861A1 (en) | 2012-07-26 | 2014-01-30 | Rf Micro Devices, Inc. | Programmable rf notch filter for envelope tracking |
US9225231B2 (en) | 2012-09-14 | 2015-12-29 | Rf Micro Devices, Inc. | Open loop ripple cancellation circuit in a DC-DC converter |
US9197256B2 (en) | 2012-10-08 | 2015-11-24 | Rf Micro Devices, Inc. | Reducing effects of RF mixer-based artifact using pre-distortion of an envelope power supply signal |
US9207692B2 (en) | 2012-10-18 | 2015-12-08 | Rf Micro Devices, Inc. | Transitioning from envelope tracking to average power tracking |
US9627975B2 (en) | 2012-11-16 | 2017-04-18 | Qorvo Us, Inc. | Modulated power supply system and method with automatic transition between buck and boost modes |
US9294100B2 (en) * | 2012-12-04 | 2016-03-22 | Advanced Energy Industries, Inc. | Frequency tuning system and method for finding a global optimum |
US9401264B2 (en) * | 2013-10-01 | 2016-07-26 | Lam Research Corporation | Control of impedance of RF delivery path |
US9337000B2 (en) | 2013-10-01 | 2016-05-10 | Lam Research Corporation | Control of impedance of RF return path |
EP2936541B1 (de) | 2012-12-18 | 2017-02-01 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur erzeugung einer hochfrequenzleistung und leistungsversorgungssystem mit einem leistungswandler zur versorgung einer last mit leistung |
WO2014094738A2 (de) | 2012-12-18 | 2014-06-26 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschverfahren und leistungsversorgungssystem mit einem leistungswandler |
US9929696B2 (en) | 2013-01-24 | 2018-03-27 | Qorvo Us, Inc. | Communications based adjustments of an offset capacitive voltage |
US9178472B2 (en) | 2013-02-08 | 2015-11-03 | Rf Micro Devices, Inc. | Bi-directional power supply signal based linear amplifier |
US9536713B2 (en) * | 2013-02-27 | 2017-01-03 | Advanced Energy Industries, Inc. | Reliable plasma ignition and reignition |
US9203353B2 (en) | 2013-03-14 | 2015-12-01 | Rf Micro Devices, Inc. | Noise conversion gain limited RF power amplifier |
WO2014152903A2 (en) | 2013-03-14 | 2014-09-25 | Rf Micro Devices, Inc | Envelope tracking power supply voltage dynamic range reduction |
US9479118B2 (en) | 2013-04-16 | 2016-10-25 | Rf Micro Devices, Inc. | Dual instantaneous envelope tracking |
US9720022B2 (en) * | 2015-05-19 | 2017-08-01 | Lam Research Corporation | Systems and methods for providing characteristics of an impedance matching model for use with matching networks |
US9374005B2 (en) | 2013-08-13 | 2016-06-21 | Rf Micro Devices, Inc. | Expanded range DC-DC converter |
DE102013226537B4 (de) | 2013-12-18 | 2022-12-29 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungssystem mit mehreren Verstärkerpfaden sowie Verfahren zur Anregung eines Plasmas |
DE102013226511B4 (de) | 2013-12-18 | 2016-12-15 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungssystem und Verfahren zur Erzeugung einer Leistung |
US9697991B2 (en) | 2014-01-10 | 2017-07-04 | Reno Technologies, Inc. | RF impedance matching network |
US9755641B1 (en) | 2014-01-10 | 2017-09-05 | Reno Technologies, Inc. | High speed high voltage switching circuit |
US9865432B1 (en) | 2014-01-10 | 2018-01-09 | Reno Technologies, Inc. | RF impedance matching network |
US9496122B1 (en) | 2014-01-10 | 2016-11-15 | Reno Technologies, Inc. | Electronically variable capacitor and RF matching network incorporating same |
US10431428B2 (en) | 2014-01-10 | 2019-10-01 | Reno Technologies, Inc. | System for providing variable capacitance |
US10455729B2 (en) | 2014-01-10 | 2019-10-22 | Reno Technologies, Inc. | Enclosure cooling system |
US9196459B2 (en) | 2014-01-10 | 2015-11-24 | Reno Technologies, Inc. | RF impedance matching network |
US9844127B2 (en) | 2014-01-10 | 2017-12-12 | Reno Technologies, Inc. | High voltage switching circuit |
US10950421B2 (en) * | 2014-04-21 | 2021-03-16 | Lam Research Corporation | Using modeling for identifying a location of a fault in an RF transmission system for a plasma system |
US9614476B2 (en) | 2014-07-01 | 2017-04-04 | Qorvo Us, Inc. | Group delay calibration of RF envelope tracking |
CN104193795B (zh) * | 2014-07-25 | 2016-03-02 | 塔里木大学 | 一种甘草酸联产甘草浸膏和低酸甘草霜的水氨循环生产方法 |
US10043638B2 (en) * | 2014-08-15 | 2018-08-07 | Applied Materials, Inc. | Compact configurable modular radio frequency matching network assembly for plasma processing systems |
US9386680B2 (en) | 2014-09-25 | 2016-07-05 | Applied Materials, Inc. | Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamber |
US11051369B2 (en) | 2014-10-21 | 2021-06-29 | Ultraflex International, Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
US10624158B2 (en) | 2014-10-21 | 2020-04-14 | Ultraflex International Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
US9872341B2 (en) | 2014-11-26 | 2018-01-16 | Applied Materials, Inc. | Consolidated filter arrangement for devices in an RF environment |
US9525412B2 (en) | 2015-02-18 | 2016-12-20 | Reno Technologies, Inc. | Switching circuit |
US9306533B1 (en) | 2015-02-20 | 2016-04-05 | Reno Technologies, Inc. | RF impedance matching network |
US9729122B2 (en) | 2015-02-18 | 2017-08-08 | Reno Technologies, Inc. | Switching circuit |
US11017983B2 (en) | 2015-02-18 | 2021-05-25 | Reno Technologies, Inc. | RF power amplifier |
US10340879B2 (en) | 2015-02-18 | 2019-07-02 | Reno Technologies, Inc. | Switching circuit |
US10153133B2 (en) * | 2015-03-23 | 2018-12-11 | Applied Materials, Inc. | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion |
US9595930B2 (en) | 2015-06-05 | 2017-03-14 | Mks Instruments, Inc. | Solid state microwave generator and power amplifier |
US10692699B2 (en) | 2015-06-29 | 2020-06-23 | Reno Technologies, Inc. | Impedance matching with restricted capacitor switching |
US11342160B2 (en) | 2015-06-29 | 2022-05-24 | Reno Technologies, Inc. | Filter for impedance matching |
US11335540B2 (en) | 2015-06-29 | 2022-05-17 | Reno Technologies, Inc. | Impedance matching network and method |
US11081316B2 (en) | 2015-06-29 | 2021-08-03 | Reno Technologies, Inc. | Impedance matching network and method |
US11342161B2 (en) | 2015-06-29 | 2022-05-24 | Reno Technologies, Inc. | Switching circuit with voltage bias |
US10984986B2 (en) | 2015-06-29 | 2021-04-20 | Reno Technologies, Inc. | Impedance matching network and method |
US11150283B2 (en) | 2015-06-29 | 2021-10-19 | Reno Technologies, Inc. | Amplitude and phase detection circuit |
DE102015212152B4 (de) * | 2015-06-30 | 2018-03-15 | TRUMPF Hüttinger GmbH + Co. KG | Nicht lineare Hochfrequenzverstärkeranordnung |
US9941844B2 (en) | 2015-07-01 | 2018-04-10 | Qorvo Us, Inc. | Dual-mode envelope tracking power converter circuitry |
US9912297B2 (en) | 2015-07-01 | 2018-03-06 | Qorvo Us, Inc. | Envelope tracking power converter circuitry |
US9876476B2 (en) * | 2015-08-18 | 2018-01-23 | Mks Instruments, Inc. | Supervisory control of radio frequency (RF) impedance tuning operation |
US10340124B2 (en) | 2015-10-29 | 2019-07-02 | Applied Materials, Inc. | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide |
US9577516B1 (en) | 2016-02-18 | 2017-02-21 | Advanced Energy Industries, Inc. | Apparatus for controlled overshoot in a RF generator |
AU2017252024B2 (en) * | 2016-04-22 | 2019-12-19 | Fiberlean Technologies Limited | Re-dispersed microfibrillated cellulose |
US9973147B2 (en) | 2016-05-10 | 2018-05-15 | Qorvo Us, Inc. | Envelope tracking power management circuit |
US10263572B2 (en) * | 2016-10-05 | 2019-04-16 | Futurewei Technologies, Inc. | Radio frequency apparatus and method with dual variable impedance components |
KR101884859B1 (ko) * | 2016-10-28 | 2018-08-02 | 세메스 주식회사 | 플라즈마 처리 장치 및 플라즈마 처리 장치의 임피던스 제어 방법 |
EP3367562A1 (en) * | 2017-02-22 | 2018-08-29 | Comet AG | High power amplifier circuit with protective feedback circuit |
WO2018168603A1 (ja) * | 2017-03-17 | 2018-09-20 | 株式会社村田製作所 | 高周波モジュール及び通信装置 |
JP6595002B2 (ja) | 2017-06-27 | 2019-10-23 | キヤノンアネルバ株式会社 | スパッタリング装置 |
KR102421625B1 (ko) | 2017-06-27 | 2022-07-19 | 캐논 아네르바 가부시키가이샤 | 플라스마 처리 장치 |
SG11201912566WA (en) | 2017-06-27 | 2020-01-30 | Canon Anelva Corp | Plasma processing apparatus |
WO2019004184A1 (ja) * | 2017-06-27 | 2019-01-03 | キヤノンアネルバ株式会社 | プラズマ処理装置 |
CN110800377B (zh) | 2017-06-27 | 2022-04-29 | 佳能安内华股份有限公司 | 等离子体处理装置 |
JP6656481B2 (ja) * | 2017-06-27 | 2020-03-04 | キヤノンアネルバ株式会社 | プラズマ処理装置および方法 |
WO2019003345A1 (ja) * | 2017-06-28 | 2019-01-03 | 株式会社日立国際電気 | 高周波電源装置及びそれを用いたプラズマ処理装置 |
US11289307B2 (en) | 2017-07-10 | 2022-03-29 | Reno Technologies, Inc. | Impedance matching network and method |
US10727029B2 (en) | 2017-07-10 | 2020-07-28 | Reno Technologies, Inc | Impedance matching using independent capacitance and frequency control |
US11476091B2 (en) | 2017-07-10 | 2022-10-18 | Reno Technologies, Inc. | Impedance matching network for diagnosing plasma chamber |
US10483090B2 (en) | 2017-07-10 | 2019-11-19 | Reno Technologies, Inc. | Restricted capacitor switching |
US11114280B2 (en) | 2017-07-10 | 2021-09-07 | Reno Technologies, Inc. | Impedance matching with multi-level power setpoint |
US11101110B2 (en) | 2017-07-10 | 2021-08-24 | Reno Technologies, Inc. | Impedance matching network and method |
US11521833B2 (en) | 2017-07-10 | 2022-12-06 | Reno Technologies, Inc. | Combined RF generator and RF solid-state matching network |
US11393659B2 (en) | 2017-07-10 | 2022-07-19 | Reno Technologies, Inc. | Impedance matching network and method |
US11315758B2 (en) | 2017-07-10 | 2022-04-26 | Reno Technologies, Inc. | Impedance matching using electronically variable capacitance and frequency considerations |
US10714314B1 (en) | 2017-07-10 | 2020-07-14 | Reno Technologies, Inc. | Impedance matching network and method |
US11398370B2 (en) | 2017-07-10 | 2022-07-26 | Reno Technologies, Inc. | Semiconductor manufacturing using artificial intelligence |
US10020168B1 (en) * | 2017-07-20 | 2018-07-10 | Lam Research Corporation | Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator |
WO2020112108A1 (en) | 2017-11-29 | 2020-06-04 | COMET Technologies USA, Inc. | Retuning for impedance matching network control |
GB2569811A (en) * | 2017-12-27 | 2019-07-03 | Creo Medical Ltd | Electrosurgical apparatus |
US10476437B2 (en) | 2018-03-15 | 2019-11-12 | Qorvo Us, Inc. | Multimode voltage tracker circuit |
JP2019186098A (ja) * | 2018-04-12 | 2019-10-24 | 東京エレクトロン株式会社 | プラズマを生成する方法 |
SG11202009122YA (en) * | 2018-06-26 | 2020-10-29 | Canon Anelva Corp | Plasma processing apparatus, plasma processing method, program, and memory medium |
RU2695541C1 (ru) * | 2018-07-02 | 2019-07-24 | Акционерное общество "Концерн "Созвзедие" | Устройство ввода энергии в газоразрядную плазму |
EP3605115A1 (en) | 2018-08-02 | 2020-02-05 | TRUMPF Huettinger Sp. Z o. o. | Arc detector for detecting arcs, plasma system and method of detecting arcs |
EP3605582A1 (en) * | 2018-08-02 | 2020-02-05 | TRUMPF Huettinger Sp. Z o. o. | Power converter and power supply system |
US10404294B1 (en) | 2018-09-19 | 2019-09-03 | Harris Global Communications, Inc. | Wireless communication device with efficient broadband matching network and related methods |
US11515123B2 (en) * | 2018-12-21 | 2022-11-29 | Advanced Energy Industries, Inc. | Apparatus and system for modulated plasma systems |
GB2580155A (en) * | 2018-12-21 | 2020-07-15 | Comet Ag | Radiofrequency power amplifier |
CN111491434A (zh) * | 2019-01-25 | 2020-08-04 | 天津吉兆源科技有限公司 | 一种小型射频等离子体喷枪 |
US11538662B2 (en) | 2019-05-21 | 2022-12-27 | Reno Technologies, Inc. | Impedance matching network and method with reduced memory requirements |
US11527385B2 (en) | 2021-04-29 | 2022-12-13 | COMET Technologies USA, Inc. | Systems and methods for calibrating capacitors of matching networks |
US11114279B2 (en) * | 2019-06-28 | 2021-09-07 | COMET Technologies USA, Inc. | Arc suppression device for plasma processing equipment |
US11596309B2 (en) | 2019-07-09 | 2023-03-07 | COMET Technologies USA, Inc. | Hybrid matching network topology |
US11107661B2 (en) | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
CN114207770A (zh) * | 2019-07-31 | 2022-03-18 | 朗姆研究公司 | 具有多个输出端口的射频功率产生器 |
KR20220106820A (ko) | 2019-12-02 | 2022-07-29 | 램 리써치 코포레이션 | Rf (radio-frequency) 보조된 플라즈마 생성시 임피던스 변환 |
CN111128668B (zh) * | 2019-12-17 | 2022-03-04 | 西安航天动力研究所 | 一种用于射频等离子体的阻抗匹配系统及方法 |
US11830708B2 (en) | 2020-01-10 | 2023-11-28 | COMET Technologies USA, Inc. | Inductive broad-band sensors for electromagnetic waves |
US11670488B2 (en) | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
US11521832B2 (en) | 2020-01-10 | 2022-12-06 | COMET Technologies USA, Inc. | Uniformity control for radio frequency plasma processing systems |
US11887820B2 (en) | 2020-01-10 | 2024-01-30 | COMET Technologies USA, Inc. | Sector shunts for plasma-based wafer processing systems |
US11961711B2 (en) | 2020-01-20 | 2024-04-16 | COMET Technologies USA, Inc. | Radio frequency match network and generator |
US11605527B2 (en) | 2020-01-20 | 2023-03-14 | COMET Technologies USA, Inc. | Pulsing control match network |
US11994542B2 (en) | 2020-03-27 | 2024-05-28 | Lam Research Corporation | RF signal parameter measurement in an integrated circuit fabrication chamber |
US11348761B2 (en) * | 2020-09-04 | 2022-05-31 | Tokyo Electron Limited | Impedance matching apparatus and control method |
US11373844B2 (en) | 2020-09-28 | 2022-06-28 | COMET Technologies USA, Inc. | Systems and methods for repetitive tuning of matching networks |
US11923175B2 (en) | 2021-07-28 | 2024-03-05 | COMET Technologies USA, Inc. | Systems and methods for variable gain tuning of matching networks |
US11657980B1 (en) | 2022-05-09 | 2023-05-23 | COMET Technologies USA, Inc. | Dielectric fluid variable capacitor |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6133683Y2 (ja) * | 1980-07-26 | 1986-10-02 | ||
JP2927981B2 (ja) * | 1991-04-04 | 1999-07-28 | 日本電気株式会社 | バランス型マイクロ波帯増幅器 |
US5175472A (en) | 1991-12-30 | 1992-12-29 | Comdel, Inc. | Power monitor of RF plasma |
US5556549A (en) * | 1994-05-02 | 1996-09-17 | Lsi Logic Corporation | Power control and delivery in plasma processing equipment |
US5477188A (en) * | 1994-07-14 | 1995-12-19 | Eni | Linear RF power amplifier |
JPH08316214A (ja) * | 1995-05-24 | 1996-11-29 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
JP2884056B2 (ja) * | 1995-12-07 | 1999-04-19 | パール工業株式会社 | 放電プラズマ発生用高周波電源装置及び半導体製造装置 |
JPH09289402A (ja) * | 1996-04-19 | 1997-11-04 | Taiyo Yuden Co Ltd | 非可逆回路素子 |
DE69815163T2 (de) * | 1997-01-24 | 2004-05-06 | Applied Materials, Inc., Santa Clara | Verfahren und Vorrichtung zur Abscheidung von Titanschichten |
US6256482B1 (en) * | 1997-04-07 | 2001-07-03 | Frederick H. Raab | Power- conserving drive-modulation method for envelope-elimination-and-restoration (EER) transmitters |
US6130910A (en) * | 1997-11-03 | 2000-10-10 | Motorola, Inc. | Method and apparatus for high efficiency wideband power amplification |
US6020794A (en) * | 1998-02-09 | 2000-02-01 | Eni Technologies, Inc. | Ratiometric autotuning algorithm for RF plasma generator |
JP3544136B2 (ja) | 1998-02-26 | 2004-07-21 | キヤノン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP4120051B2 (ja) * | 1998-07-31 | 2008-07-16 | 株式会社日立国際電気 | 高周波共振装置 |
TW507256B (en) | 2000-03-13 | 2002-10-21 | Mitsubishi Heavy Ind Ltd | Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
JP3316490B2 (ja) * | 2000-03-13 | 2002-08-19 | 三菱重工業株式会社 | 放電電極への給電方法、高周波プラズマ生成方法および半導体製造方法 |
JP3377773B2 (ja) * | 2000-03-24 | 2003-02-17 | 三菱重工業株式会社 | 放電電極への給電方法、高周波プラズマ発生方法および半導体製造方法 |
KR20010108968A (ko) * | 2000-06-01 | 2001-12-08 | 황 철 주 | 플라즈마 공정장치 |
AU2001279189A1 (en) * | 2000-08-08 | 2002-02-18 | Tokyo Electron Limited | Plasma processing method and apparatus |
JP2002110566A (ja) * | 2000-10-02 | 2002-04-12 | Mitsubishi Heavy Ind Ltd | 高周波プラズマ生成装置 |
-
2002
- 2002-05-20 US US10/151,425 patent/US6703080B2/en not_active Expired - Fee Related
-
2003
- 2003-04-14 AU AU2003226071A patent/AU2003226071A1/en not_active Abandoned
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- 2003-04-14 EP EP03755332A patent/EP1506564A2/en not_active Withdrawn
- 2003-04-14 JP JP2004507297A patent/JP2005527078A/ja active Pending
- 2003-04-14 CN CNB038115409A patent/CN100530508C/zh not_active Expired - Fee Related
-
2010
- 2010-03-11 JP JP2010054147A patent/JP2010182683A/ja active Pending
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9214909B2 (en) | 2005-07-29 | 2015-12-15 | Mks Instruments, Inc. | High reliability RF generator architecture |
JP2007080249A (ja) * | 2005-07-29 | 2007-03-29 | Mks Instruments Inc | 高信頼性無線周波発生器の構造 |
JP2007115688A (ja) * | 2005-10-17 | 2007-05-10 | Huettinger Elektronik Gmbh & Co Kg | Hfプラズマ供給装置 |
US7745955B2 (en) | 2005-10-17 | 2010-06-29 | Huettinger Elektronik Gmbh + Co. Kg | RF plasma supply device |
JP2008117777A (ja) * | 2006-11-04 | 2008-05-22 | Huettinger Elektronik Gmbh & Co Kg | 少なくとも2つの高周波電力発生器のドライブ制御方法、高周波電力発生器ドライブ制御装置および高周波プラズマ励起装置 |
JP2010536117A (ja) * | 2007-07-23 | 2010-11-25 | ヒュッティンガー エレクトローニク ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | プラズマ給電装置 |
JP2011525682A (ja) * | 2008-05-14 | 2011-09-22 | アプライド マテリアルズ インコーポレイテッド | Rf電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置 |
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Also Published As
Publication number | Publication date |
---|---|
JP2010182683A (ja) | 2010-08-19 |
WO2003101160A2 (en) | 2003-12-04 |
EP1506564A2 (en) | 2005-02-16 |
US6703080B2 (en) | 2004-03-09 |
KR20050029122A (ko) | 2005-03-24 |
CN1656593A (zh) | 2005-08-17 |
US20030215373A1 (en) | 2003-11-20 |
KR100766162B1 (ko) | 2007-10-10 |
AU2003226071A8 (en) | 2003-12-12 |
WO2003101160A3 (en) | 2004-03-25 |
CN100530508C (zh) | 2009-08-19 |
AU2003226071A1 (en) | 2003-12-12 |
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