JP2005526612A5 - - Google Patents

Download PDF

Info

Publication number
JP2005526612A5
JP2005526612A5 JP2004507486A JP2004507486A JP2005526612A5 JP 2005526612 A5 JP2005526612 A5 JP 2005526612A5 JP 2004507486 A JP2004507486 A JP 2004507486A JP 2004507486 A JP2004507486 A JP 2004507486A JP 2005526612 A5 JP2005526612 A5 JP 2005526612A5
Authority
JP
Japan
Prior art keywords
contact
silicon
range
concentrated
cuprous chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004507486A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005526612A (ja
Filing date
Publication date
Priority claimed from US10/150,829 external-priority patent/US20030220514A1/en
Application filed filed Critical
Publication of JP2005526612A publication Critical patent/JP2005526612A/ja
Publication of JP2005526612A5 publication Critical patent/JP2005526612A5/ja
Withdrawn legal-status Critical Current

Links

JP2004507486A 2002-05-20 2003-05-13 触体の製造方法 Withdrawn JP2005526612A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/150,829 US20030220514A1 (en) 2002-05-20 2002-05-20 Method for preparing a contact mass
PCT/US2003/015032 WO2003099829A1 (en) 2002-05-20 2003-05-13 Method for preparing a contact mass

Publications (2)

Publication Number Publication Date
JP2005526612A JP2005526612A (ja) 2005-09-08
JP2005526612A5 true JP2005526612A5 (https=) 2006-06-29

Family

ID=29548347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004507486A Withdrawn JP2005526612A (ja) 2002-05-20 2003-05-13 触体の製造方法

Country Status (7)

Country Link
US (1) US20030220514A1 (https=)
EP (1) EP1507782A1 (https=)
JP (1) JP2005526612A (https=)
KR (1) KR20050000428A (https=)
AU (1) AU2003232125A1 (https=)
TW (1) TW200400157A (https=)
WO (1) WO2003099829A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4788866B2 (ja) * 2004-10-19 2011-10-05 信越化学工業株式会社 フェニルクロロシランの製造方法
US7230138B2 (en) * 2004-12-10 2007-06-12 Air Products And Chemicals, Inc. Bis(3-alkoxypropan-2-ol) sulfides, sulfoxides, and sulfones: new preparative methods
EP2668194A1 (en) * 2011-01-25 2013-12-04 Dow Corning Corporation Method of preparing a diorganodihalosilane
DE102011006869A1 (de) 2011-04-06 2012-10-11 Wacker Chemie Ag Verfahren zur Herstellung einer Kontaktmasse
US8865850B2 (en) 2012-06-14 2014-10-21 Dow Corning Corporation Method of selectively forming a reaction product in the presence of a metal silicide
CN104736547A (zh) 2012-08-13 2015-06-24 道康宁公司 通过使氢、卤硅烷和有机卤化物在铜催化剂上以两步法反应制备有机卤硅烷的方法
KR102299593B1 (ko) 2013-11-12 2021-09-09 다우 실리콘즈 코포레이션 할로실란의 제조 방법
DE102014225460A1 (de) 2014-12-10 2016-06-16 Wacker Chemie Ag Verfahren zur Direktsynthese von Methylchlorsilanen in Wirbelschichtreaktoren
EP3274296B1 (en) * 2015-03-24 2020-02-19 Dow Silicones Corporation Method for fluidizing copper silicide and process for preparing a halosilane using the method
CZ310103B6 (cs) * 2022-10-29 2024-08-14 Ústav Chemických Procesů Av Čr, V. V. I. Způsob elektrochemické přeměny vodných roztoků uhličitanů, hydrogenuhličitanů, CO2, solí C2-C5 kyselin a jejich směsí

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2903473A (en) * 1954-03-19 1959-09-08 Takami Yasuo Process for the production of phenylchlorosilanes
DE1076131B (de) * 1954-09-25 1960-02-25 Wacker Chemie Gmbh Verfahren zur Herstellung von Organohalogensilanen
DE1046619B (de) * 1954-12-07 1958-12-18 Wacker Chemie Gmbh Verfahren zur Herstellung von Arylchlorsilanen
FR1132611A (fr) * 1955-07-13 1957-03-13 Onera (Off Nat Aerospatiale) Perfectionnement à la préparation des organo-halogénosilanes
US6528674B1 (en) * 2000-04-20 2003-03-04 General Electric Company Method for preparing a contact mass
US6423860B1 (en) * 2000-09-05 2002-07-23 General Electric Company Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production

Similar Documents

Publication Publication Date Title
JP2005526612A5 (https=)
JP2008505224A5 (https=)
JPS6348274B2 (https=)
MY126255A (en) Preparation of organohalosilanes
JP2005514312A (ja) アモルファスシリコンおよび/またはこれから得られるオルガノハロゲンシランの製造方法
KR20110107349A (ko) 오가노할로하이드로실란의 제조 공정
JP4435572B2 (ja) フェニルオルガノシリコン中間体を製造する方法
JPH0331290A (ja) 第3級炭化水素基含有ハロゲン化シランの製造方法
MY117705A (en) Preparation of organohalosilanes
CN102482299B (zh) 使氯硅烷加氢脱氯成氢硅烷的催化剂及用该催化剂合成氢硅烷的方法
JPH0812682A (ja) ビス(ジクロロオルガノシリル)アルカン誘導体及びその製造方法
JPS6222790A (ja) 第3級炭化水素シリル化合物の製造方法
JP4338237B2 (ja) ピリジルメチルイソチオシアネートの製造法
JP2851588B2 (ja) ジメチルジクロルシランの製造法
JP3553469B2 (ja) メチルクロロシランを直接合成するための連続法
JP4181130B2 (ja) アルキルハロシランの直接合成のための触媒系及び方法
NO831302L (no) Fremgangsmaate for fremstilling av metylklorsilaner
Han et al. Slurry phase reaction of elemental silicon with methanol in the presence of copper: direct synthesis of trimethoxysilane
JP5294537B2 (ja) トリ(第2級アルキル)シラン化合物の製造方法
JP4120034B2 (ja) ハロオルガノシラン化合物の製造方法
JP3560905B2 (ja) 2−トリアルキルシリル2,2−ジフルオロ酢酸エステルの製造方法
CN109942618B (zh) 锂电池助剂中间体3-氰丙基二甲基氯硅烷的合成方法
이창엽 et al. Synthesis of tris (silyl) methanes by modified direct process
JP2016138086A (ja) 第3級アルキルシラン及び第3級アルキルアルコキシシランの製造方法
JP2014181212A (ja) ケイ素化合物の製造方法及び触媒組成物