JP2005517530A - 常圧プラズマ洗浄装置 - Google Patents

常圧プラズマ洗浄装置 Download PDF

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Publication number
JP2005517530A
JP2005517530A JP2003569341A JP2003569341A JP2005517530A JP 2005517530 A JP2005517530 A JP 2005517530A JP 2003569341 A JP2003569341 A JP 2003569341A JP 2003569341 A JP2003569341 A JP 2003569341A JP 2005517530 A JP2005517530 A JP 2005517530A
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JP
Japan
Prior art keywords
electrode
reaction gas
atmospheric pressure
gas supply
pressure plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003569341A
Other languages
English (en)
Japanese (ja)
Inventor
ダグ−ギュ・リム
Original Assignee
ラジイオンテク・カンパニー・リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0009068A external-priority patent/KR100466016B1/ko
Application filed by ラジイオンテク・カンパニー・リミテッド filed Critical ラジイオンテク・カンパニー・リミテッド
Publication of JP2005517530A publication Critical patent/JP2005517530A/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2003569341A 2002-02-20 2003-02-20 常圧プラズマ洗浄装置 Pending JP2005517530A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2002-0009068A KR100466016B1 (ko) 2002-02-20 2002-02-20 반도체 상압 플라즈마 세정장치
KR10-2003-0008312A KR100483063B1 (ko) 2002-02-20 2003-02-10 상압 플라즈마 세정장치
PCT/KR2003/000343 WO2003070390A2 (fr) 2002-02-20 2003-02-20 Appareil de nettoyage utilisant un plasma a pression atmospherique

Publications (1)

Publication Number Publication Date
JP2005517530A true JP2005517530A (ja) 2005-06-16

Family

ID=27759801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003569341A Pending JP2005517530A (ja) 2002-02-20 2003-02-20 常圧プラズマ洗浄装置

Country Status (4)

Country Link
JP (1) JP2005517530A (fr)
AU (1) AU2003208625A1 (fr)
TW (1) TW591714B (fr)
WO (1) WO2003070390A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172163B1 (ko) * 2010-06-24 2012-08-07 현대하이스코 주식회사 연료전지용 분리판 및 그 제조 방법
RU2649695C1 (ru) * 2017-06-21 2018-04-04 Акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" Способ очистки подложек из ситалла в струе высокочастотной плазмы пониженного давления

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0280074B1 (fr) * 1987-02-24 1995-12-20 International Business Machines Corporation Réacteur à plasma
US5286297A (en) * 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5460684A (en) * 1992-12-04 1995-10-24 Tokyo Electron Limited Stage having electrostatic chuck and plasma processing apparatus using same
JP2845773B2 (ja) * 1995-04-27 1999-01-13 山形日本電気株式会社 常圧ｃｖｄ装置
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode
WO2000070117A1 (fr) * 1999-05-14 2000-11-23 The Regents Of The University Of California Dispositif de flux de plasma a grande plage de pressions compatible a basse temperature
AU2434201A (en) * 1999-12-15 2001-06-25 Plasmasol Corp. Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions

Also Published As

Publication number Publication date
AU2003208625A8 (en) 2003-09-09
TW591714B (en) 2004-06-11
WO2003070390A2 (fr) 2003-08-28
TW200303582A (en) 2003-09-01
AU2003208625A1 (en) 2003-09-09
WO2003070390A3 (fr) 2003-11-27

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