AU2003208625A8 - Cleaning apparatus using atmospheric pressure plasma - Google Patents

Cleaning apparatus using atmospheric pressure plasma

Info

Publication number
AU2003208625A8
AU2003208625A8 AU2003208625A AU2003208625A AU2003208625A8 AU 2003208625 A8 AU2003208625 A8 AU 2003208625A8 AU 2003208625 A AU2003208625 A AU 2003208625A AU 2003208625 A AU2003208625 A AU 2003208625A AU 2003208625 A8 AU2003208625 A8 AU 2003208625A8
Authority
AU
Australia
Prior art keywords
atmospheric pressure
cleaning apparatus
pressure plasma
plasma
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003208625A
Other versions
AU2003208625A1 (en
Inventor
Dug-Gyu Lim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RADIIONTECH CO Ltd
Original Assignee
RADIIONTECH CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0009068A external-priority patent/KR100466016B1/en
Application filed by RADIIONTECH CO Ltd filed Critical RADIIONTECH CO Ltd
Publication of AU2003208625A1 publication Critical patent/AU2003208625A1/en
Publication of AU2003208625A8 publication Critical patent/AU2003208625A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU2003208625A 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma Abandoned AU2003208625A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR10-2002-0009068A KR100466016B1 (en) 2002-02-20 2002-02-20 Cleaning apparatus using the atmospheric pressure plasma
KR10-2002-0009068 2002-02-20
KR10-2003-0008312A KR100483063B1 (en) 2002-02-20 2003-02-10 Cleaning apparatus using the atmospheric pressure plasma
KR10-2003-0008312 2003-02-10
PCT/KR2003/000343 WO2003070390A2 (en) 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma

Publications (2)

Publication Number Publication Date
AU2003208625A1 AU2003208625A1 (en) 2003-09-09
AU2003208625A8 true AU2003208625A8 (en) 2003-09-09

Family

ID=27759801

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003208625A Abandoned AU2003208625A1 (en) 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma

Country Status (4)

Country Link
JP (1) JP2005517530A (en)
AU (1) AU2003208625A1 (en)
TW (1) TW591714B (en)
WO (1) WO2003070390A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103003998B (en) * 2010-06-24 2016-08-17 现代制铁株式会社 Fuel cell separating plate and preparation method thereof
RU2649695C1 (en) * 2017-06-21 2018-04-04 Акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" Method of glass ceramic substrates cleaning in the low pressure high-frequency plasma jet

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3854792D1 (en) * 1987-02-24 1996-02-01 Ibm Plasma reactor
US5286297A (en) * 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5460684A (en) * 1992-12-04 1995-10-24 Tokyo Electron Limited Stage having electrostatic chuck and plasma processing apparatus using same
JP2845773B2 (en) * 1995-04-27 1999-01-13 山形日本電気株式会社 Atmospheric pressure CVD equipment
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode
US20020129902A1 (en) * 1999-05-14 2002-09-19 Babayan Steven E. Low-temperature compatible wide-pressure-range plasma flow device
IL150105A0 (en) * 1999-12-15 2002-12-01 Stevens Inst Technology Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions

Also Published As

Publication number Publication date
AU2003208625A1 (en) 2003-09-09
TW200303582A (en) 2003-09-01
JP2005517530A (en) 2005-06-16
WO2003070390A2 (en) 2003-08-28
TW591714B (en) 2004-06-11
WO2003070390A3 (en) 2003-11-27

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase