GB2387964B - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
GB2387964B
GB2387964B GB0309001A GB0309001A GB2387964B GB 2387964 B GB2387964 B GB 2387964B GB 0309001 A GB0309001 A GB 0309001A GB 0309001 A GB0309001 A GB 0309001A GB 2387964 B GB2387964 B GB 2387964B
Authority
GB
United Kingdom
Prior art keywords
processing apparatus
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB0309001A
Other versions
GB0309001D0 (en
GB2387964A (en
Inventor
Nicholas John Appleyard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aviza Europe Ltd
Original Assignee
Aviza Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aviza Europe Ltd filed Critical Aviza Europe Ltd
Publication of GB0309001D0 publication Critical patent/GB0309001D0/en
Publication of GB2387964A publication Critical patent/GB2387964A/en
Application granted granted Critical
Publication of GB2387964B publication Critical patent/GB2387964B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
GB0309001A 2002-04-24 2003-04-22 Plasma processing apparatus Expired - Lifetime GB2387964B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0209291A GB0209291D0 (en) 2002-04-24 2002-04-24 Plasma processing apparatus

Publications (3)

Publication Number Publication Date
GB0309001D0 GB0309001D0 (en) 2003-05-28
GB2387964A GB2387964A (en) 2003-10-29
GB2387964B true GB2387964B (en) 2005-12-07

Family

ID=9935365

Family Applications (2)

Application Number Title Priority Date Filing Date
GB0209291A Ceased GB0209291D0 (en) 2002-04-24 2002-04-24 Plasma processing apparatus
GB0309001A Expired - Lifetime GB2387964B (en) 2002-04-24 2003-04-22 Plasma processing apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB0209291A Ceased GB0209291D0 (en) 2002-04-24 2002-04-24 Plasma processing apparatus

Country Status (1)

Country Link
GB (2) GB0209291D0 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100599094B1 (en) * 2004-11-29 2006-07-12 삼성전자주식회사 Electro-magnatic accelerator with Coil turn modulation
EP1936656A1 (en) * 2006-12-21 2008-06-25 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Plasma generator and method for cleaning an object
KR20120042748A (en) 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 Outgassing method for inspecting a coated surface
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP6095678B2 (en) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド Passivation, pH protection or slippery coatings for pharmaceutical packages, coating processes and equipment
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609428A (en) * 1984-07-23 1986-09-02 Fujitsu Limited Method and apparatus for microwave plasma anisotropic dry etching
EP0283519A1 (en) * 1986-09-29 1988-09-28 Nippon Telegraph And Telephone Corporation Ion generation apparatus, thin film formation apparatus using the ion generation apparatus, and ion source
US5189446A (en) * 1991-05-17 1993-02-23 International Business Machines Corporation Plasma wafer processing tool having closed electron cyclotron resonance
US5346579A (en) * 1991-10-17 1994-09-13 Applied Materials, Inc. Magnetic field enhanced plasma processing chamber

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609428A (en) * 1984-07-23 1986-09-02 Fujitsu Limited Method and apparatus for microwave plasma anisotropic dry etching
EP0283519A1 (en) * 1986-09-29 1988-09-28 Nippon Telegraph And Telephone Corporation Ion generation apparatus, thin film formation apparatus using the ion generation apparatus, and ion source
US5189446A (en) * 1991-05-17 1993-02-23 International Business Machines Corporation Plasma wafer processing tool having closed electron cyclotron resonance
US5346579A (en) * 1991-10-17 1994-09-13 Applied Materials, Inc. Magnetic field enhanced plasma processing chamber

Also Published As

Publication number Publication date
GB0309001D0 (en) 2003-05-28
GB0209291D0 (en) 2002-06-05
GB2387964A (en) 2003-10-29

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20150716 AND 20150722

PE20 Patent expired after termination of 20 years

Expiry date: 20230421