WO2003070390A3 - Cleaning apparatus using atmospheric pressure plasma - Google Patents

Cleaning apparatus using atmospheric pressure plasma Download PDF

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Publication number
WO2003070390A3
WO2003070390A3 PCT/KR2003/000343 KR0300343W WO03070390A3 WO 2003070390 A3 WO2003070390 A3 WO 2003070390A3 KR 0300343 W KR0300343 W KR 0300343W WO 03070390 A3 WO03070390 A3 WO 03070390A3
Authority
WO
WIPO (PCT)
Prior art keywords
reaction gas
gas supply
cleaning apparatus
supply part
lower side
Prior art date
Application number
PCT/KR2003/000343
Other languages
French (fr)
Other versions
WO2003070390A2 (en
Inventor
Dug-Gyu Lim
Original Assignee
Radiiontech Co Ltd
Dug-Gyu Lim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0009068A external-priority patent/KR100466016B1/en
Application filed by Radiiontech Co Ltd, Dug-Gyu Lim filed Critical Radiiontech Co Ltd
Priority to JP2003569341A priority Critical patent/JP2005517530A/en
Priority to AU2003208625A priority patent/AU2003208625A1/en
Publication of WO2003070390A2 publication Critical patent/WO2003070390A2/en
Publication of WO2003070390A3 publication Critical patent/WO2003070390A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A cleaning apparatus includes a reaction gas supply part (30) capable of supplying a reaction gas having a certain pressure to the lower side; a reaction gas suction part (34) which is installed in parallel with the reaction gas supply part with spaced apart from the reaction gas supply part in a certain distance, and which sucks and emits the supplied reaction gas with a certain pressure; an electrode part (32) consisting of the first and second electrodes (44a, b) and installed in parallel with the reaction gas supply part and the reaction gas suction part between them with fixing bodies (46) of an insulation material intervened; a power supply (62) for generating electric field at the lower side of the first and second electrodes; and a table (56) positioned at the lower side of the reaction gas supply part, the reaction gas suction part and the electrode part.
PCT/KR2003/000343 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma WO2003070390A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003569341A JP2005517530A (en) 2002-02-20 2003-02-20 Atmospheric pressure plasma cleaning equipment
AU2003208625A AU2003208625A1 (en) 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2002-0009068 2002-02-20
KR10-2002-0009068A KR100466016B1 (en) 2002-02-20 2002-02-20 Cleaning apparatus using the atmospheric pressure plasma
KR10-2003-0008312A KR100483063B1 (en) 2002-02-20 2003-02-10 Cleaning apparatus using the atmospheric pressure plasma
KR10-2003-0008312 2003-02-10

Publications (2)

Publication Number Publication Date
WO2003070390A2 WO2003070390A2 (en) 2003-08-28
WO2003070390A3 true WO2003070390A3 (en) 2003-11-27

Family

ID=27759801

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2003/000343 WO2003070390A2 (en) 2002-02-20 2003-02-20 Cleaning apparatus using atmospheric pressure plasma

Country Status (4)

Country Link
JP (1) JP2005517530A (en)
AU (1) AU2003208625A1 (en)
TW (1) TW591714B (en)
WO (1) WO2003070390A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172163B1 (en) * 2010-06-24 2012-08-07 현대하이스코 주식회사 Metal separator for fuel cell and method for the same
RU2649695C1 (en) * 2017-06-21 2018-04-04 Акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" Method of glass ceramic substrates cleaning in the low pressure high-frequency plasma jet

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0280074A2 (en) * 1987-02-24 1988-08-31 International Business Machines Corporation Plasma reactor
US5286297A (en) * 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5460684A (en) * 1992-12-04 1995-10-24 Tokyo Electron Limited Stage having electrostatic chuck and plasma processing apparatus using same
US5626677A (en) * 1995-04-27 1997-05-06 Nec Corporation Atmospheric pressure CVD apparatus
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode
WO2000070117A1 (en) * 1999-05-14 2000-11-23 The Regents Of The University Of California Low-temperature compatible wide-pressure-range plasma flow device
US20010031234A1 (en) * 1999-12-15 2001-10-18 Christos Christodoulatos Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0280074A2 (en) * 1987-02-24 1988-08-31 International Business Machines Corporation Plasma reactor
US5286297A (en) * 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5460684A (en) * 1992-12-04 1995-10-24 Tokyo Electron Limited Stage having electrostatic chuck and plasma processing apparatus using same
US5626677A (en) * 1995-04-27 1997-05-06 Nec Corporation Atmospheric pressure CVD apparatus
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode
WO2000070117A1 (en) * 1999-05-14 2000-11-23 The Regents Of The University Of California Low-temperature compatible wide-pressure-range plasma flow device
US20010031234A1 (en) * 1999-12-15 2001-10-18 Christos Christodoulatos Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions

Also Published As

Publication number Publication date
AU2003208625A8 (en) 2003-09-09
TW591714B (en) 2004-06-11
WO2003070390A2 (en) 2003-08-28
TW200303582A (en) 2003-09-01
AU2003208625A1 (en) 2003-09-09
JP2005517530A (en) 2005-06-16

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