JP2005510871A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP2005510871A
JP2005510871A JP2003548292A JP2003548292A JP2005510871A JP 2005510871 A JP2005510871 A JP 2005510871A JP 2003548292 A JP2003548292 A JP 2003548292A JP 2003548292 A JP2003548292 A JP 2003548292A JP 2005510871 A JP2005510871 A JP 2005510871A
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Prior art keywords
surface layer
amorphous
semiconductor
dopant atoms
radiation
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Pending
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JP2003548292A
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English (en)
Japanese (ja)
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JP2005510871A5 (enExample
Inventor
ピーター、アー．ストルク
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Koninklijke Philips NV
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Koninklijke Philips Electronics NV
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Publication of JP2005510871A publication Critical patent/JP2005510871A/ja
Publication of JP2005510871A5 publication Critical patent/JP2005510871A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
    • H01L21/2652—Through-implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Recrystallisation Techniques (AREA)
  • Thin Film Transistor (AREA)
JP2003548292A 2001-11-30 2002-11-20 半導体装置の製造方法 Pending JP2005510871A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01204625 2001-11-30
PCT/IB2002/004881 WO2003046967A2 (en) 2001-11-30 2002-11-20 Method of forming a doped region in a semiconductor body comprising a step of amorphization by irradiation

Publications (2)

Publication Number Publication Date
JP2005510871A true JP2005510871A (ja) 2005-04-21
JP2005510871A5 JP2005510871A5 (enExample) 2006-01-12

Family

ID=8181336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003548292A Pending JP2005510871A (ja) 2001-11-30 2002-11-20 半導体装置の製造方法

Country Status (7)

Country Link
US (1) US6982212B2 (enExample)
EP (1) EP1459366A2 (enExample)
JP (1) JP2005510871A (enExample)
KR (1) KR20040054811A (enExample)
AU (1) AU2002348835A1 (enExample)
TW (1) TWI268576B (enExample)
WO (1) WO2003046967A2 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009529245A (ja) * 2006-03-08 2009-08-13 アプライド マテリアルズ インコーポレイテッド 基板に形成された熱処理構造用の方法および装置
JP2013128030A (ja) * 2011-12-19 2013-06-27 Sanken Electric Co Ltd 半導体装置の製造方法、半導体装置
JP2014060423A (ja) * 2006-03-08 2014-04-03 Applied Materials Inc 基板に形成された熱処理構造用の方法および装置
WO2018037751A1 (ja) * 2016-08-25 2018-03-01 パナソニックＩｐマネジメント株式会社 太陽電池セル及びその製造方法
KR20190015262A (ko) * 2016-05-31 2019-02-13 레이저 시스템즈 앤드 솔루션즈 오브 유럽 디이프 접합 전자 소자 및 그의 제조 공정

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3737504B2 (ja) * 2004-03-31 2006-01-18 松下電器産業株式会社 半導体装置の製造方法
FR2870988B1 (fr) * 2004-06-01 2006-08-11 Michel Bruel Procede de realisation d'une structure multi-couches comportant, en profondeur, une couche de separation
JP2006066686A (ja) * 2004-08-27 2006-03-09 Matsushita Electric Ind Co Ltd 不純物導入方法および不純物導入装置
US7091097B1 (en) * 2004-09-03 2006-08-15 Advanced Micro Devices, Inc. End-of-range defect minimization in semiconductor device
US7615502B2 (en) * 2005-12-16 2009-11-10 Sandisk 3D Llc Laser anneal of vertically oriented semiconductor structures while maintaining a dopant profile
KR100732630B1 (ko) * 2006-02-01 2007-06-27 삼성전자주식회사 불순물 도핑 영역을 포함하는 반도체 소자 및 그 형성 방법
US7745909B2 (en) * 2007-02-26 2010-06-29 International Business Machines Corporation Localized temperature control during rapid thermal anneal
US20090096066A1 (en) * 2007-10-10 2009-04-16 Anderson Brent A Structure and Method for Device-Specific Fill for Improved Anneal Uniformity
US7679166B2 (en) * 2007-02-26 2010-03-16 International Business Machines Corporation Localized temperature control during rapid thermal anneal
US7692275B2 (en) * 2007-02-26 2010-04-06 International Business Machines Corporation Structure and method for device-specific fill for improved anneal uniformity
US7759773B2 (en) 2007-02-26 2010-07-20 International Business Machines Corporation Semiconductor wafer structure with balanced reflectance and absorption characteristics for rapid thermal anneal uniformity
US8138066B2 (en) 2008-10-01 2012-03-20 International Business Machines Corporation Dislocation engineering using a scanned laser
ES2680648T3 (es) 2009-03-09 2018-09-10 1366 Technologies Inc. Procedimientos de fabricación de cuerpos semiconductores delgados a partir de material fundido
GB201112610D0 (en) * 2011-07-22 2011-09-07 Rec Wafer Norway As Heating a furnace for the growth of semiconductor material
US9597744B2 (en) * 2013-11-11 2017-03-21 Siemens Energy, Inc. Method for utilizing a braze material with carbon structures
DE102016114264B4 (de) * 2016-08-02 2024-10-24 Infineon Technologies Ag Herstellungsverfahren einschliesslich einer aktivierung von dotierstoffen
CN108807276A (zh) * 2017-05-05 2018-11-13 中芯国际集成电路制造(上海)有限公司 半导体结构及其形成方法
CN112885715A (zh) * 2021-01-08 2021-06-01 中国科学院微电子研究所 一种半导体器件的制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4535220A (en) * 1981-11-10 1985-08-13 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Integrated circuits
JPH01256124A (ja) * 1988-04-05 1989-10-12 Ricoh Co Ltd Ｍｏｓ型半導体装置の製造方法
US5950078A (en) * 1997-09-19 1999-09-07 Sharp Laboratories Of America, Inc. Rapid thermal annealing with absorptive layers for thin film transistors on transparent substrates
US5953615A (en) * 1999-01-27 1999-09-14 Advance Micro Devices Pre-amorphization process for source/drain junction
US6777317B2 (en) * 2001-08-29 2004-08-17 Ultratech Stepper, Inc. Method for semiconductor gate doping

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009529245A (ja) * 2006-03-08 2009-08-13 アプライド マテリアルズ インコーポレイテッド 基板に形成された熱処理構造用の方法および装置
JP2014060423A (ja) * 2006-03-08 2014-04-03 Applied Materials Inc 基板に形成された熱処理構造用の方法および装置
US10141191B2 (en) 2006-03-08 2018-11-27 Applied Materials, Inc. Method of thermal processing structures formed on a substrate
US10840100B2 (en) 2006-03-08 2020-11-17 Applied Materials, Inc. Method of thermal processing structures formed on a substrate
JP2013128030A (ja) * 2011-12-19 2013-06-27 Sanken Electric Co Ltd 半導体装置の製造方法、半導体装置
KR20190015262A (ko) * 2016-05-31 2019-02-13 레이저 시스템즈 앤드 솔루션즈 오브 유럽 디이프 접합 전자 소자 및 그의 제조 공정
JP2019523986A (ja) * 2016-05-31 2019-08-29 レーザー システムズ アンド ソリューションズ オブ ヨーロッパ 深い接合の電子装置及びその製造方法
KR102478873B1 (ko) 2016-05-31 2022-12-19 레이저 시스템즈 앤드 솔루션즈 오브 유럽 디이프 접합 전자 소자 및 그의 제조 공정
WO2018037751A1 (ja) * 2016-08-25 2018-03-01 パナソニックＩｐマネジメント株式会社 太陽電池セル及びその製造方法
JP2018032786A (ja) * 2016-08-25 2018-03-01 パナソニックＩｐマネジメント株式会社 太陽電池セル及びその製造方法

Also Published As

Publication number Publication date
AU2002348835A1 (en) 2003-06-10
WO2003046967A3 (en) 2003-10-16
US20050003638A1 (en) 2005-01-06
US6982212B2 (en) 2006-01-03
TW200409293A (en) 2004-06-01
WO2003046967A2 (en) 2003-06-05
EP1459366A2 (en) 2004-09-22
KR20040054811A (ko) 2004-06-25
TWI268576B (en) 2006-12-11

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