JP2005504337A - 反射屈折縮小レンズ - Google Patents

反射屈折縮小レンズ Download PDF

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Publication number
JP2005504337A
JP2005504337A JP2003531236A JP2003531236A JP2005504337A JP 2005504337 A JP2005504337 A JP 2005504337A JP 2003531236 A JP2003531236 A JP 2003531236A JP 2003531236 A JP2003531236 A JP 2003531236A JP 2005504337 A JP2005504337 A JP 2005504337A
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JP
Japan
Prior art keywords
beam splitter
projection lens
lens according
lens
object plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003531236A
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English (en)
Japanese (ja)
Other versions
JP2005504337A5 (fr
Inventor
ウルリッヒ ヴィルヘルム
アール シェイファー デイヴィッド
エプレ アレキサンダー
バイエル ヘルムート
ドドーツェ アウレリアン
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・アーゲー filed Critical カール・ツァイス・エスエムティー・アーゲー
Publication of JP2005504337A publication Critical patent/JP2005504337A/ja
Publication of JP2005504337A5 publication Critical patent/JP2005504337A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003531236A 2001-09-20 2002-09-13 反射屈折縮小レンズ Pending JP2005504337A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US32333001P 2001-09-20 2001-09-20
US33125001P 2001-11-13 2001-11-13
US33127601P 2001-11-13 2001-11-13
PCT/EP2002/010281 WO2003027747A1 (fr) 2001-09-20 2002-09-13 Objectif reducteur catadioptrique

Publications (2)

Publication Number Publication Date
JP2005504337A true JP2005504337A (ja) 2005-02-10
JP2005504337A5 JP2005504337A5 (fr) 2005-10-27

Family

ID=27406266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003531236A Pending JP2005504337A (ja) 2001-09-20 2002-09-13 反射屈折縮小レンズ

Country Status (4)

Country Link
EP (1) EP1430346A1 (fr)
JP (1) JP2005504337A (fr)
TW (1) TWI226453B (fr)
WO (1) WO2003027747A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2008542829A (ja) * 2005-06-02 2008-11-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影対物レンズ
JP2013250556A (ja) * 2012-05-30 2013-12-12 Ultratech Inc マイクロリソグラフィーのための等倍率大型反射屈折レンズ

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
AU2003254550A1 (en) * 2002-09-09 2004-04-30 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
JP2006147809A (ja) * 2004-11-18 2006-06-08 Canon Inc 露光装置の投影光学系、露光装置およびデバイスの製造方法
DE102010021539B4 (de) * 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2698521B2 (ja) * 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JP3812051B2 (ja) * 1997-04-30 2006-08-23 株式会社ニコン 反射屈折投影光学系
JPH1184248A (ja) * 1997-09-12 1999-03-26 Nikon Corp 反射屈折縮小光学系
JPH11326767A (ja) * 1998-05-07 1999-11-26 Nikon Corp 反射屈折縮小光学系
EP1102100A3 (fr) * 1999-11-12 2003-12-10 Carl Zeiss Objectif catadioptrique avec diviseur de faisceau

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008542829A (ja) * 2005-06-02 2008-11-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影対物レンズ
JP2012186508A (ja) * 2005-06-02 2012-09-27 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影対物レンズ
JP2014143445A (ja) * 2005-06-02 2014-08-07 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影対物レンズ
KR20140130454A (ko) * 2005-06-02 2014-11-10 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
KR101483791B1 (ko) * 2005-06-02 2015-01-16 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US9097984B2 (en) 2005-06-02 2015-08-04 Carl Zeiss Smt Gmbh Microlithography projection objective
KR101590743B1 (ko) 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US10281824B2 (en) 2005-06-02 2019-05-07 Carl Zeiss Smt Gmbh Microlithography projection objective
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2013250556A (ja) * 2012-05-30 2013-12-12 Ultratech Inc マイクロリソグラフィーのための等倍率大型反射屈折レンズ

Also Published As

Publication number Publication date
WO2003027747A1 (fr) 2003-04-03
TWI226453B (en) 2005-01-11
EP1430346A1 (fr) 2004-06-23

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