WO2003027747A1 - Objectif reducteur catadioptrique - Google Patents
Objectif reducteur catadioptrique Download PDFInfo
- Publication number
- WO2003027747A1 WO2003027747A1 PCT/EP2002/010281 EP0210281W WO03027747A1 WO 2003027747 A1 WO2003027747 A1 WO 2003027747A1 EP 0210281 W EP0210281 W EP 0210281W WO 03027747 A1 WO03027747 A1 WO 03027747A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- beamsplitter
- projection lens
- lens according
- foregoing
- ooooooooe
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Definitions
- This system is largely characterized by the fact that no lens group is arranged between the concave mirror and beamsplitter, and that the concave mirror has a strong reduction effect, i.e., a strong image demagnification.
- Longitudinal chromatic aberration (CHL) is primarily corrected by employing a highly convergent beam in the beamsplitter cube and may result in full achromatization of longitudinal chromatic aberration.
- the beam ahead of the concave mirror, i.e., that undergoing its first pass of the beamsplitter is nearly, or substantially, collimated, while the beam following the concave mirror, i.e., that undergoing its second pass of the beamsplitter, is normally highly convergent.
- the intermediate image lies outside the beamsplitter in order to avoid overheating of the beamsplitter material due to high radiant-energy densities. It may be provided to arrange a beamsplitter within a region where marginal-ray heights are low, where the marginal-ray heights therein should preferably be less than about 70 % of the marginal-ray heights at the concave mirror for both transits of the beamsplitter.
- the positive refractive power within the optical near-field of the object plane may be provided in various manners.
- Positive refractive power may be provided between the object plane and the beamsplitter by, for example, arranging a positive lens that, due to its proximity to the object plane, may have a small diameter, within that region. At most one positive lens is frequently provided within that region.
- Arranging positive refractive power ahead of the entrance face of the beamsplitter may be utilized for reducing the divergence of radiation coming from object plane to the extent where a well-collimated beam results in order that variations in the angle of incidence of incident radiation will be relatively small in the vicinity of the beamsplitting surface.
- no isolated lenses are arranged between the object plane and the beamsplitter. This allows keeping the designs in that particular section highly compact and arranging a beamsplitter close to their object plane, where marginal-ray heights are low. Positive refractive power may then be arranged within the space between the beamsplitter and the concave mirror, to be more specific, within the optical near-field of the object plane, in particular, at a location where the marginal-ray heights at the at least one positive lens are less than about 30 % of the marginal-ray heights at the concave mirror.
- just one positive lens is provided.
- Embodiments having at least one intermediate image also have at least one other field plane in addition to their object plane and image plane, as well as at least one conjugate stop plane in addition to their system stop, which means that additional degrees of freedom for incorporating effective aspherical surfaces exist.
- the vicinity of the object plane 101 may be arranged between two optical elements, the first of which transforms the incident partially polarized light into circularly polarized light, while that following the reticle transforms that circularly polarized light into largely linearly polarized light.
- These optical elements which maybe be laid out in a sandwich arrangement about the reticle, may, for example, be formed from quarter-wave plates.
- Lithium fluoride has much lower intrinsic stress- birefringence coefficients than calcium fluoride, which may also be employed, which will allow optimizing the polarization characteristics of the beamsplitter design, which will be particularly beneficial in conjunction with the small beamsplitter volume employed here, which allows keeping the length of the optical path within the slightly birefringent material short, and thus keeping the associated retardations small.
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02799405A EP1430346A1 (fr) | 2001-09-20 | 2002-09-13 | Objectif reducteur catadioptrique |
JP2003531236A JP2005504337A (ja) | 2001-09-20 | 2002-09-13 | 反射屈折縮小レンズ |
US10/805,393 US7136220B2 (en) | 2001-08-21 | 2004-03-22 | Catadioptric reduction lens |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32333001P | 2001-09-20 | 2001-09-20 | |
US60/323,330 | 2001-09-20 | ||
US33127601P | 2001-11-13 | 2001-11-13 | |
US33125001P | 2001-11-13 | 2001-11-13 | |
US60/331,276 | 2001-11-13 | ||
US60/331,250 | 2001-11-13 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/224,485 Continuation-In-Part US7317583B2 (en) | 2001-08-21 | 2002-08-21 | High numerical aperture projection system and method for microlithography |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/805,393 Continuation US7136220B2 (en) | 2001-08-21 | 2004-03-22 | Catadioptric reduction lens |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003027747A1 true WO2003027747A1 (fr) | 2003-04-03 |
Family
ID=27406266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/010281 WO2003027747A1 (fr) | 2001-08-21 | 2002-09-13 | Objectif reducteur catadioptrique |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1430346A1 (fr) |
JP (1) | JP2005504337A (fr) |
TW (1) | TWI226453B (fr) |
WO (1) | WO2003027747A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1260845A2 (fr) * | 2001-05-22 | 2002-11-27 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Objectif de réduction catadioptrique |
WO2004025349A1 (fr) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif |
EP1662325A2 (fr) * | 2004-11-18 | 2006-05-31 | Cannon Kabushiki Kaisha | Système optique de projection et appareil d'exposition équipé de celui-çi |
US9097984B2 (en) | 2005-06-02 | 2015-08-04 | Carl Zeiss Smt Gmbh | Microlithography projection objective |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1746463A2 (fr) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Procédé pour corriger un objectif de projection lithographique et un tel objectif de projection |
DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
US8830590B2 (en) * | 2012-05-30 | 2014-09-09 | Ultratech, Inc. | Unit magnification large-format catadioptric lens for microlithography |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0602923A1 (fr) * | 1992-12-14 | 1994-06-22 | Canon Kabushiki Kaisha | Dispositif d'exposition utilisant un système de projection catadioptrique |
US5742436A (en) * | 1994-05-19 | 1998-04-21 | Carl-Zeiss-Stiftung | Maximum aperture catadioptric reduction objective for microlithography |
EP0902329A1 (fr) * | 1997-09-12 | 1999-03-17 | Nikon Corporation | Système optique de réduction catadioptrique |
US6081382A (en) * | 1998-05-07 | 2000-06-27 | Nikon Corporation | Catadioptric reduction projection optical system |
US6208473B1 (en) * | 1997-04-30 | 2001-03-27 | Nikon Corporation | Catadioptric projection lens |
EP1102100A2 (fr) * | 1999-11-12 | 2001-05-23 | Carl Zeiss | Objectif catadioptrique avec diviseur de faisceau |
-
2002
- 2002-09-13 JP JP2003531236A patent/JP2005504337A/ja active Pending
- 2002-09-13 EP EP02799405A patent/EP1430346A1/fr not_active Withdrawn
- 2002-09-13 WO PCT/EP2002/010281 patent/WO2003027747A1/fr not_active Application Discontinuation
- 2002-09-20 TW TW91121599A patent/TWI226453B/zh not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0602923A1 (fr) * | 1992-12-14 | 1994-06-22 | Canon Kabushiki Kaisha | Dispositif d'exposition utilisant un système de projection catadioptrique |
US5742436A (en) * | 1994-05-19 | 1998-04-21 | Carl-Zeiss-Stiftung | Maximum aperture catadioptric reduction objective for microlithography |
US6208473B1 (en) * | 1997-04-30 | 2001-03-27 | Nikon Corporation | Catadioptric projection lens |
EP0902329A1 (fr) * | 1997-09-12 | 1999-03-17 | Nikon Corporation | Système optique de réduction catadioptrique |
US6081382A (en) * | 1998-05-07 | 2000-06-27 | Nikon Corporation | Catadioptric reduction projection optical system |
EP1102100A2 (fr) * | 1999-11-12 | 2001-05-23 | Carl Zeiss | Objectif catadioptrique avec diviseur de faisceau |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1260845A2 (fr) * | 2001-05-22 | 2002-11-27 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Objectif de réduction catadioptrique |
EP1260845A3 (fr) * | 2001-05-22 | 2004-01-02 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Objectif de réduction catadioptrique |
US6717746B2 (en) | 2001-05-22 | 2004-04-06 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Catadioptric reduction lens |
US7006304B2 (en) | 2001-05-22 | 2006-02-28 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
WO2004025349A1 (fr) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif |
EP1662325A2 (fr) * | 2004-11-18 | 2006-05-31 | Cannon Kabushiki Kaisha | Système optique de projection et appareil d'exposition équipé de celui-çi |
EP1662325A3 (fr) * | 2004-11-18 | 2006-09-13 | Cannon Kabushiki Kaisha | Système optique de projection et appareil d exposition équipé de celui-ci |
US9097984B2 (en) | 2005-06-02 | 2015-08-04 | Carl Zeiss Smt Gmbh | Microlithography projection objective |
US10281824B2 (en) | 2005-06-02 | 2019-05-07 | Carl Zeiss Smt Gmbh | Microlithography projection objective |
Also Published As
Publication number | Publication date |
---|---|
TWI226453B (en) | 2005-01-11 |
JP2005504337A (ja) | 2005-02-10 |
EP1430346A1 (fr) | 2004-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9134618B2 (en) | Catadioptric projection objective with intermediate images | |
US7426082B2 (en) | Catadioptric projection objective with geometric beam splitting | |
CN1965259B (zh) | 反射折射投影物镜 | |
US20060132931A1 (en) | Catadioptric projection objective | |
US7268952B2 (en) | Catadioptric projection system, and exposure apparatus having the same | |
WO2005040890A2 (fr) | Objectif de projection catadioptrique | |
US7283294B2 (en) | Catadioptric projection optical system, exposure apparatus having the same, device fabrication method | |
US7136220B2 (en) | Catadioptric reduction lens | |
EP1430346A1 (fr) | Objectif reducteur catadioptrique | |
US7697198B2 (en) | Catadioptric projection objective | |
WO2003052462A2 (fr) | Lentille de reduction catadioptrique |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BY BZ CA CH CN CO CR CU CZ DE DM DZ EC EE ES FI GB GD GE GH HR HU ID IL IN IS JP KE KG KP KR LC LK LR LS LT LU LV MA MD MG MN MW MX MZ NO NZ OM PH PL PT RU SD SE SG SI SK SL TJ TM TN TR TZ UA UG US UZ VC VN YU ZA ZM |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW MZ SD SL SZ UG ZM ZW AM AZ BY KG KZ RU TJ TM AT BE BG CH CY CZ DK EE ES FI FR GB GR IE IT LU MC PT SE SK TR BF BJ CF CG CI GA GN GQ GW ML MR NE SN TD TG US |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003531236 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10805393 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002799405 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2002799405 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2002799405 Country of ref document: EP |