TWI226453B - Catadioptric reduction lens - Google Patents

Catadioptric reduction lens Download PDF

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Publication number
TWI226453B
TWI226453B TW91121599A TW91121599A TWI226453B TW I226453 B TWI226453 B TW I226453B TW 91121599 A TW91121599 A TW 91121599A TW 91121599 A TW91121599 A TW 91121599A TW I226453 B TWI226453 B TW I226453B
Authority
TW
Taiwan
Prior art keywords
mirror
beam splitter
projection
scope
plane
Prior art date
Application number
TW91121599A
Other languages
English (en)
Chinese (zh)
Inventor
Wilhelm Ulrich
David Shafer
Alexander Epple
Helmut Beierl
Aurelian Dodoc
Original Assignee
Zeiss Carl Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Semiconductor Mfg filed Critical Zeiss Carl Semiconductor Mfg
Application granted granted Critical
Publication of TWI226453B publication Critical patent/TWI226453B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW91121599A 2001-09-20 2002-09-20 Catadioptric reduction lens TWI226453B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32333001P 2001-09-20 2001-09-20
US33125001P 2001-11-13 2001-11-13
US33127601P 2001-11-13 2001-11-13

Publications (1)

Publication Number Publication Date
TWI226453B true TWI226453B (en) 2005-01-11

Family

ID=27406266

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91121599A TWI226453B (en) 2001-09-20 2002-09-20 Catadioptric reduction lens

Country Status (4)

Country Link
EP (1) EP1430346A1 (fr)
JP (1) JP2005504337A (fr)
TW (1) TWI226453B (fr)
WO (1) WO2003027747A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI631369B (zh) * 2010-05-19 2018-08-01 德商卡爾蔡司Ｓｍｔ有限公司 具有光圈之投射物鏡

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
AU2003254550A1 (en) * 2002-09-09 2004-04-30 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
JP2006147809A (ja) * 2004-11-18 2006-06-08 Canon Inc 露光装置の投影光学系、露光装置およびデバイスの製造方法
KR101590743B1 (ko) * 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
EP1746463A2 (fr) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Procédé pour corriger un objectif de projection lithographique et un tel objectif de projection
US8830590B2 (en) * 2012-05-30 2014-09-09 Ultratech, Inc. Unit magnification large-format catadioptric lens for microlithography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2698521B2 (ja) * 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JP3812051B2 (ja) * 1997-04-30 2006-08-23 株式会社ニコン 反射屈折投影光学系
JPH1184248A (ja) * 1997-09-12 1999-03-26 Nikon Corp 反射屈折縮小光学系
JPH11326767A (ja) * 1998-05-07 1999-11-26 Nikon Corp 反射屈折縮小光学系
EP1102100A3 (fr) * 1999-11-12 2003-12-10 Carl Zeiss Objectif catadioptrique avec diviseur de faisceau

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI631369B (zh) * 2010-05-19 2018-08-01 德商卡爾蔡司Ｓｍｔ有限公司 具有光圈之投射物鏡

Also Published As

Publication number Publication date
WO2003027747A1 (fr) 2003-04-03
JP2005504337A (ja) 2005-02-10
EP1430346A1 (fr) 2004-06-23

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees