JP2005503018A - 空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査 - Google Patents

空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査 Download PDF

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Publication number
JP2005503018A
JP2005503018A JP2003527781A JP2003527781A JP2005503018A JP 2005503018 A JP2005503018 A JP 2005503018A JP 2003527781 A JP2003527781 A JP 2003527781A JP 2003527781 A JP2003527781 A JP 2003527781A JP 2005503018 A JP2005503018 A JP 2005503018A
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JP
Japan
Prior art keywords
radiation beam
array
radiation
spatially separated
coherence length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003527781A
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English (en)
Japanese (ja)
Inventor
サンドストレーム、トールビョルン
ホルマー、アンナ−カリン
ヴィルヘルムソン、ケネス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mycronic AB
Original Assignee
Micronic MyData AB
Mycronic AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic MyData AB, Mycronic AB filed Critical Micronic MyData AB
Publication of JP2005503018A publication Critical patent/JP2005503018A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48—Laser speckle optics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2003527781A 2001-09-10 2002-09-09 空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査 Pending JP2005503018A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0103006A SE0103006D0 (sv) 2001-09-10 2001-09-10 Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece
PCT/SE2002/001607 WO2003023833A1 (en) 2001-09-10 2002-09-09 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece

Publications (1)

Publication Number Publication Date
JP2005503018A true JP2005503018A (ja) 2005-01-27

Family

ID=20285284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003527781A Pending JP2005503018A (ja) 2001-09-10 2002-09-09 空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査

Country Status (4)

Country Link
EP (1) EP1425783A1 (de)
JP (1) JP2005503018A (de)
SE (1) SE0103006D0 (de)
WO (1) WO2003023833A1 (de)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005277209A (ja) * 2004-03-25 2005-10-06 Tadahiro Omi パターン露光装置および二次元光像発生装置
JP2007179039A (ja) * 2005-12-02 2007-07-12 Asml Netherlands Bv 照明光学システム
JP2008522421A (ja) * 2004-12-01 2008-06-26 カール・ツァイス・エスエムティー・アーゲー 投影露光系、ビーム伝送系及び光ビームの生成方法
JP2009117812A (ja) * 2007-10-16 2009-05-28 Nikon Corp 照明光学系、露光装置及びデバイスの製造方法
JP2011507293A (ja) * 2007-12-21 2011-03-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
JP2013048237A (ja) * 2011-08-19 2013-03-07 Ultratech Inc フォトリソグラフシステムに用いられるプログラム可能な発光体
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006035068A1 (de) * 2006-07-28 2008-01-31 Carl Zeiss Sms Gmbh Kohärenzminderer für ein zugeführtes kohärentes Strahlenbündel und Verfahren zur Verringerung der Kohärenz eines kohärenten Strahlenbündels
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
CN105606344B (zh) 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法
US11333897B2 (en) * 2019-03-12 2022-05-17 Coherent Lasersystems Gmbh & Co. Kg Apparatus for forming a homogeneous intensity distribution with bright or dark edges

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072631A (en) * 1998-07-09 2000-06-06 3M Innovative Properties Company Diffractive homogenizer with compensation for spatial coherence
JP4345127B2 (ja) * 1999-03-18 2009-10-14 ソニー株式会社 照明装置及び照明方法
JP2001148345A (ja) * 1999-09-10 2001-05-29 Nikon Corp 照明光学装置、並びに該装置を用いた露光方法及び装置

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4541010B2 (ja) * 2004-03-25 2010-09-08 財団法人国際科学振興財団 パターン露光装置および二次元光像発生装置
JP2005277209A (ja) * 2004-03-25 2005-10-06 Tadahiro Omi パターン露光装置および二次元光像発生装置
JP2008522421A (ja) * 2004-12-01 2008-06-26 カール・ツァイス・エスエムティー・アーゲー 投影露光系、ビーム伝送系及び光ビームの生成方法
JP2007179039A (ja) * 2005-12-02 2007-07-12 Asml Netherlands Bv 照明光学システム
JP2010199605A (ja) * 2005-12-02 2010-09-09 Asml Netherlands Bv 照明光学システム
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2009117812A (ja) * 2007-10-16 2009-05-28 Nikon Corp 照明光学系、露光装置及びデバイスの製造方法
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2011507293A (ja) * 2007-12-21 2011-03-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
KR101681858B1 (ko) 2007-12-21 2016-12-12 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노광 장치
KR101571181B1 (ko) * 2007-12-21 2015-12-04 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노광 장치
KR20150082662A (ko) * 2007-12-21 2015-07-15 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노광 장치
JP2013048237A (ja) * 2011-08-19 2013-03-07 Ultratech Inc フォトリソグラフシステムに用いられるプログラム可能な発光体

Also Published As

Publication number Publication date
WO2003023833A1 (en) 2003-03-20
EP1425783A1 (de) 2004-06-09
SE0103006D0 (sv) 2001-09-10

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