SE0103006D0 - Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece - Google Patents

Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece

Info

Publication number
SE0103006D0
SE0103006D0 SE0103006A SE0103006A SE0103006D0 SE 0103006 D0 SE0103006 D0 SE 0103006D0 SE 0103006 A SE0103006 A SE 0103006A SE 0103006 A SE0103006 A SE 0103006A SE 0103006 D0 SE0103006 D0 SE 0103006D0
Authority
SE
Sweden
Prior art keywords
radiation beam
spatially coherent
homogenization
workpiece
writing
Prior art date
Application number
SE0103006A
Other languages
English (en)
Swedish (sv)
Inventor
Torbjoern Sandstroem
Original Assignee
Micronic Lasersystems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Lasersystems Ab filed Critical Micronic Lasersystems Ab
Priority to SE0103006A priority Critical patent/SE0103006D0/xx
Publication of SE0103006D0 publication Critical patent/SE0103006D0/xx
Priority to JP2003527781A priority patent/JP2005503018A/ja
Priority to EP02768252A priority patent/EP1425783A1/en
Priority to PCT/SE2002/001607 priority patent/WO2003023833A1/en
Priority to US10/238,177 priority patent/US6819490B2/en

Links

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
SE0103006A 2001-09-10 2001-09-10 Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece SE0103006D0 (sv)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SE0103006A SE0103006D0 (sv) 2001-09-10 2001-09-10 Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece
JP2003527781A JP2005503018A (ja) 2001-09-10 2002-09-09 空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査
EP02768252A EP1425783A1 (en) 2001-09-10 2002-09-09 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
PCT/SE2002/001607 WO2003023833A1 (en) 2001-09-10 2002-09-09 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
US10/238,177 US6819490B2 (en) 2001-09-10 2002-09-10 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0103006A SE0103006D0 (sv) 2001-09-10 2001-09-10 Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece

Publications (1)

Publication Number Publication Date
SE0103006D0 true SE0103006D0 (sv) 2001-09-10

Family

ID=20285284

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0103006A SE0103006D0 (sv) 2001-09-10 2001-09-10 Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece

Country Status (4)

Country Link
EP (1) EP1425783A1 (xx)
JP (1) JP2005503018A (xx)
SE (1) SE0103006D0 (xx)
WO (1) WO2003023833A1 (xx)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4541010B2 (ja) * 2004-03-25 2010-09-08 財団法人国際科学振興財団 パターン露光装置および二次元光像発生装置
KR20120079181A (ko) 2004-12-01 2012-07-11 칼 짜이스 에스엠티 게엠베하 투사 노광 시스템, 비임 전달 시스템 및 광의 비임을 발생시키는 방법
US20070127005A1 (en) * 2005-12-02 2007-06-07 Asml Holding N.V. Illumination system
DE102006035068A1 (de) * 2006-07-28 2008-01-31 Carl Zeiss Sms Gmbh Kohärenzminderer für ein zugeführtes kohärentes Strahlenbündel und Verfahren zur Verringerung der Kohärenz eines kohärenten Strahlenbündels
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
EP2179330A1 (en) * 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
DE102008054582A1 (de) * 2007-12-21 2009-07-09 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
KR101695034B1 (ko) 2008-05-28 2017-01-10 가부시키가이샤 니콘 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법
US8823921B2 (en) * 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US11333897B2 (en) * 2019-03-12 2022-05-17 Coherent Lasersystems Gmbh & Co. Kg Apparatus for forming a homogeneous intensity distribution with bright or dark edges

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072631A (en) * 1998-07-09 2000-06-06 3M Innovative Properties Company Diffractive homogenizer with compensation for spatial coherence
JP4345127B2 (ja) * 1999-03-18 2009-10-14 ソニー株式会社 照明装置及び照明方法
JP2001148345A (ja) * 1999-09-10 2001-05-29 Nikon Corp 照明光学装置、並びに該装置を用いた露光方法及び装置

Also Published As

Publication number Publication date
EP1425783A1 (en) 2004-06-09
WO2003023833A1 (en) 2003-03-20
JP2005503018A (ja) 2005-01-27

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