SE0103006D0 - Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece - Google Patents
Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpieceInfo
- Publication number
- SE0103006D0 SE0103006D0 SE0103006A SE0103006A SE0103006D0 SE 0103006 D0 SE0103006 D0 SE 0103006D0 SE 0103006 A SE0103006 A SE 0103006A SE 0103006 A SE0103006 A SE 0103006A SE 0103006 D0 SE0103006 D0 SE 0103006D0
- Authority
- SE
- Sweden
- Prior art keywords
- radiation beam
- spatially coherent
- homogenization
- workpiece
- writing
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0103006A SE0103006D0 (sv) | 2001-09-10 | 2001-09-10 | Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece |
JP2003527781A JP2005503018A (ja) | 2001-09-10 | 2002-09-09 | 空間的にコヒーレントな放射ビームの均等化並びに被工作物上のパターンのプリントおよび検査 |
EP02768252A EP1425783A1 (en) | 2001-09-10 | 2002-09-09 | Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
PCT/SE2002/001607 WO2003023833A1 (en) | 2001-09-10 | 2002-09-09 | Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
US10/238,177 US6819490B2 (en) | 2001-09-10 | 2002-09-10 | Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0103006A SE0103006D0 (sv) | 2001-09-10 | 2001-09-10 | Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece |
Publications (1)
Publication Number | Publication Date |
---|---|
SE0103006D0 true SE0103006D0 (sv) | 2001-09-10 |
Family
ID=20285284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0103006A SE0103006D0 (sv) | 2001-09-10 | 2001-09-10 | Homogenization of a spatially coherent radiation beam and reading/writing of a pattern on a workpiece |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1425783A1 (xx) |
JP (1) | JP2005503018A (xx) |
SE (1) | SE0103006D0 (xx) |
WO (1) | WO2003023833A1 (xx) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4541010B2 (ja) * | 2004-03-25 | 2010-09-08 | 財団法人国際科学振興財団 | パターン露光装置および二次元光像発生装置 |
KR20120079181A (ko) | 2004-12-01 | 2012-07-11 | 칼 짜이스 에스엠티 게엠베하 | 투사 노광 시스템, 비임 전달 시스템 및 광의 비임을 발생시키는 방법 |
US20070127005A1 (en) * | 2005-12-02 | 2007-06-07 | Asml Holding N.V. | Illumination system |
DE102006035068A1 (de) * | 2006-07-28 | 2008-01-31 | Carl Zeiss Sms Gmbh | Kohärenzminderer für ein zugeführtes kohärentes Strahlenbündel und Verfahren zur Verringerung der Kohärenz eines kohärenten Strahlenbündels |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
EP2179330A1 (en) * | 2007-10-16 | 2010-04-28 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
DE102008054582A1 (de) * | 2007-12-21 | 2009-07-09 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
KR101695034B1 (ko) | 2008-05-28 | 2017-01-10 | 가부시키가이샤 니콘 | 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법 |
US8823921B2 (en) * | 2011-08-19 | 2014-09-02 | Ultratech, Inc. | Programmable illuminator for a photolithography system |
US11333897B2 (en) * | 2019-03-12 | 2022-05-17 | Coherent Lasersystems Gmbh & Co. Kg | Apparatus for forming a homogeneous intensity distribution with bright or dark edges |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6072631A (en) * | 1998-07-09 | 2000-06-06 | 3M Innovative Properties Company | Diffractive homogenizer with compensation for spatial coherence |
JP4345127B2 (ja) * | 1999-03-18 | 2009-10-14 | ソニー株式会社 | 照明装置及び照明方法 |
JP2001148345A (ja) * | 1999-09-10 | 2001-05-29 | Nikon Corp | 照明光学装置、並びに該装置を用いた露光方法及び装置 |
-
2001
- 2001-09-10 SE SE0103006A patent/SE0103006D0/xx unknown
-
2002
- 2002-09-09 WO PCT/SE2002/001607 patent/WO2003023833A1/en active Application Filing
- 2002-09-09 EP EP02768252A patent/EP1425783A1/en not_active Ceased
- 2002-09-09 JP JP2003527781A patent/JP2005503018A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1425783A1 (en) | 2004-06-09 |
WO2003023833A1 (en) | 2003-03-20 |
JP2005503018A (ja) | 2005-01-27 |
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