JP2005501286A - オプティカルコート製品及びその製造方法 - Google Patents
オプティカルコート製品及びその製造方法 Download PDFInfo
- Publication number
- JP2005501286A JP2005501286A JP2003524053A JP2003524053A JP2005501286A JP 2005501286 A JP2005501286 A JP 2005501286A JP 2003524053 A JP2003524053 A JP 2003524053A JP 2003524053 A JP2003524053 A JP 2003524053A JP 2005501286 A JP2005501286 A JP 2005501286A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- product
- substrate
- optical
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/939,274 US6572975B2 (en) | 2001-08-24 | 2001-08-24 | Optically coated article and method for its preparation |
| PCT/US2002/025378 WO2003019244A1 (en) | 2001-08-24 | 2002-08-07 | Optically coated article and method for its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005501286A true JP2005501286A (ja) | 2005-01-13 |
| JP2005501286A5 JP2005501286A5 (https=) | 2006-01-05 |
Family
ID=25472867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003524053A Pending JP2005501286A (ja) | 2001-08-24 | 2002-08-07 | オプティカルコート製品及びその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6572975B2 (https=) |
| EP (1) | EP1421414A1 (https=) |
| JP (1) | JP2005501286A (https=) |
| WO (1) | WO2003019244A1 (https=) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007079349A (ja) * | 2005-09-16 | 2007-03-29 | Toray Ind Inc | 光学フィルタ |
| KR101587643B1 (ko) * | 2014-10-14 | 2016-01-25 | 광운대학교 산학협력단 | 비훈색성 투과형 컬러필터 및 그 제조방법 |
| KR20170117533A (ko) * | 2015-02-18 | 2017-10-23 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2020071375A (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
| KR20200096892A (ko) * | 2016-11-30 | 2020-08-14 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| JP2022500706A (ja) * | 2018-07-18 | 2022-01-04 | 福州高意光学有限公司Fuzhou Photop Optics Co., Ltd | 広角アプリケーション高反射ミラー |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7045558B2 (en) * | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
| JP2008016799A (ja) * | 2006-06-06 | 2008-01-24 | Mitsubishi Electric Corp | 半導体レーザ装置 |
| DE102009004251B3 (de) * | 2009-01-07 | 2010-07-01 | Ovd Kinegram Ag | Sicherheitselement sowie Verfahren zur Herstellung eines Sicherheitselements |
| KR101569406B1 (ko) * | 2009-08-19 | 2015-11-17 | 주성엔지니어링(주) | 유기 발광 소자 및 이의 제조 방법 |
| KR20110061422A (ko) * | 2009-12-01 | 2011-06-09 | 엘지이노텍 주식회사 | 정전용량 터치 패널 |
| TWI576617B (zh) * | 2012-07-16 | 2017-04-01 | 唯亞威方案公司 | 光學濾波器及感測器系統 |
| US9835952B2 (en) | 2013-03-14 | 2017-12-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Systems and methods for a narrow band high transmittance interference filter |
| DE102016002597A1 (de) * | 2016-03-04 | 2017-09-07 | Optics Balzers Ag | Breitbandentspiegelung für den NlR-Bereich |
| US10644048B2 (en) * | 2017-02-01 | 2020-05-05 | Omnivision Technologies, Inc. | Anti-reflective coating with high refractive index material at air interface |
| CN108333661B (zh) * | 2018-03-13 | 2024-01-02 | 湖北五方光电股份有限公司 | 基于硼掺杂氢化硅的低角度偏移滤光片及其制备方法 |
| CN110824599B (zh) | 2018-08-14 | 2021-09-03 | 白金科技股份有限公司 | 一种红外带通滤波器 |
| US11650361B2 (en) * | 2018-12-27 | 2023-05-16 | Viavi Solutions Inc. | Optical filter |
| BR112021016310A2 (pt) * | 2019-03-05 | 2021-10-13 | Quantum-Si Incorporated | Filtro de absorção óptico para dispositivo integrado |
| CN110109208B (zh) * | 2019-06-05 | 2024-05-31 | 信阳舜宇光学有限公司 | 近红外带通滤光片及光学传感系统 |
| CN112114394B (zh) * | 2019-06-21 | 2023-03-31 | 福州高意光学有限公司 | 具有温度补偿效应的滤光片和传感器系统 |
| CN114868044A (zh) * | 2019-11-08 | 2022-08-05 | Viavi科技有限公司 | 光学涂层和包括该光学涂层的装置 |
| CN111175873A (zh) * | 2019-12-27 | 2020-05-19 | 光驰科技(上海)有限公司 | 一种近红外滤光片 |
| CN112114402A (zh) * | 2020-10-12 | 2020-12-22 | 东莞市微科光电科技有限公司 | 一种cwdm滤光片 |
| US12372701B2 (en) * | 2023-03-21 | 2025-07-29 | Vactronics Technologies Inc. | Narrow bandpass filtering element |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4166919A (en) * | 1978-09-25 | 1979-09-04 | Rca Corporation | Amorphous silicon solar cell allowing infrared transmission |
| JPS59145588A (ja) * | 1983-02-09 | 1984-08-21 | Hitachi Ltd | 半導体レ−ザ装置 |
| JPS61190919A (ja) * | 1984-08-29 | 1986-08-25 | エクソン リサ−チ アンド エンジニアリング カンパニ− | 多層材料 |
| US4859553A (en) * | 1987-05-04 | 1989-08-22 | Xerox Corporation | Imaging members with plasma deposited silicon oxides |
| US4827870A (en) | 1987-10-05 | 1989-05-09 | Honeywell Inc. | Apparatus for applying multilayer optical interference coating on complex curved substrates |
| US5009920A (en) | 1990-03-30 | 1991-04-23 | Honeywell Inc. | Method for applying optical interference coating |
| US5245468A (en) * | 1990-12-14 | 1993-09-14 | Ford Motor Company | Anti-reflective transparent coating |
| FR2673633B1 (fr) * | 1991-03-06 | 1993-06-11 | Air Liquide | Revetement multicouche pour substrat polycarbonate. |
| US5694240A (en) * | 1994-06-24 | 1997-12-02 | Bausch & Lomb Incorporated | Multilayer anti-reflective and ultraviolet blocking coating for sunglasses |
| US6157503A (en) * | 1998-11-10 | 2000-12-05 | Thermo Vision Corporation | High performance optical filters suitable for intense ultraviolet irradiance applications |
| US6164777A (en) * | 1998-12-16 | 2000-12-26 | Bausch & Lomb Incorporated | Color-imparting contact lenses with interference coating and method for making the same |
| US6215802B1 (en) * | 1999-05-27 | 2001-04-10 | Blue Sky Research | Thermally stable air-gap etalon for dense wavelength-division multiplexing applications |
-
2001
- 2001-08-24 US US09/939,274 patent/US6572975B2/en not_active Expired - Fee Related
-
2002
- 2002-08-07 WO PCT/US2002/025378 patent/WO2003019244A1/en not_active Ceased
- 2002-08-07 JP JP2003524053A patent/JP2005501286A/ja active Pending
- 2002-08-07 EP EP20020768483 patent/EP1421414A1/en not_active Withdrawn
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007079349A (ja) * | 2005-09-16 | 2007-03-29 | Toray Ind Inc | 光学フィルタ |
| KR101587643B1 (ko) * | 2014-10-14 | 2016-01-25 | 광운대학교 산학협력단 | 비훈색성 투과형 컬러필터 및 그 제조방법 |
| JP7075444B2 (ja) | 2015-01-23 | 2022-05-25 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2020149071A (ja) * | 2015-01-23 | 2020-09-17 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| US11372144B2 (en) | 2015-02-18 | 2022-06-28 | Materion Corporation | Near infrared optical interference filters with improved transmission |
| JP2018506076A (ja) * | 2015-02-18 | 2018-03-01 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
| KR20230140612A (ko) * | 2015-02-18 | 2023-10-06 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| US12422605B2 (en) | 2015-02-18 | 2025-09-23 | Materion Corporation | Near infrared optical interference filters with improved transmission |
| KR102583883B1 (ko) * | 2015-02-18 | 2023-09-27 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| KR20170117533A (ko) * | 2015-02-18 | 2017-10-23 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| KR102700673B1 (ko) * | 2015-02-18 | 2024-08-30 | 마테리온 코포레이션 | 개선된 투과를 갖는 근적외선 광학 간섭 필터 |
| US11041982B2 (en) | 2016-11-30 | 2021-06-22 | Viavi Solutions Inc. | Silicon-germanium based optical filter |
| KR20240026172A (ko) * | 2016-11-30 | 2024-02-27 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| KR102392653B1 (ko) * | 2016-11-30 | 2022-04-29 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| KR20200096892A (ko) * | 2016-11-30 | 2020-08-14 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| KR102871286B1 (ko) | 2016-11-30 | 2025-10-15 | 비아비 솔루션즈 아이엔씨. | 실리콘-게르마늄계 광학 필터 |
| JP2022500706A (ja) * | 2018-07-18 | 2022-01-04 | 福州高意光学有限公司Fuzhou Photop Optics Co., Ltd | 広角アプリケーション高反射ミラー |
| US12265239B2 (en) | 2018-07-18 | 2025-04-01 | Ii-Vi Delaware, Inc. | Wide angle application high reflective mirror |
| JP7251099B2 (ja) | 2018-10-31 | 2023-04-04 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
| WO2020090615A1 (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
| JP2020071375A (ja) * | 2018-10-31 | 2020-05-07 | 日本電気硝子株式会社 | バンドパスフィルタ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1421414A1 (en) | 2004-05-26 |
| WO2003019244A1 (en) | 2003-03-06 |
| US20030039847A1 (en) | 2003-02-27 |
| US6572975B2 (en) | 2003-06-03 |
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