JP2005353986A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2005353986A
JP2005353986A JP2004175586A JP2004175586A JP2005353986A JP 2005353986 A JP2005353986 A JP 2005353986A JP 2004175586 A JP2004175586 A JP 2004175586A JP 2004175586 A JP2004175586 A JP 2004175586A JP 2005353986 A JP2005353986 A JP 2005353986A
Authority
JP
Japan
Prior art keywords
optical system
exposure
electric field
projection optical
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004175586A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005353986A5 (https=
Inventor
Giichi Miyajima
義一 宮島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004175586A priority Critical patent/JP2005353986A/ja
Priority to US11/149,532 priority patent/US7196769B2/en
Publication of JP2005353986A publication Critical patent/JP2005353986A/ja
Publication of JP2005353986A5 publication Critical patent/JP2005353986A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004175586A 2004-06-14 2004-06-14 露光装置 Withdrawn JP2005353986A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004175586A JP2005353986A (ja) 2004-06-14 2004-06-14 露光装置
US11/149,532 US7196769B2 (en) 2004-06-14 2005-06-10 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004175586A JP2005353986A (ja) 2004-06-14 2004-06-14 露光装置

Publications (2)

Publication Number Publication Date
JP2005353986A true JP2005353986A (ja) 2005-12-22
JP2005353986A5 JP2005353986A5 (https=) 2007-08-02

Family

ID=35460161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004175586A Withdrawn JP2005353986A (ja) 2004-06-14 2004-06-14 露光装置

Country Status (2)

Country Link
US (1) US7196769B2 (https=)
JP (1) JP2005353986A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2000854A2 (en) 2007-06-04 2008-12-10 Canon Kabushiki Kaisha Substrate processing apparatus and method of manufacturing device
US8259284B2 (en) 2008-08-27 2012-09-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP2005295762A (ja) * 2004-04-05 2005-10-20 Canon Inc ステージ装置および露光装置
US7245350B2 (en) * 2005-11-11 2007-07-17 Canon Kabushiki Kaisha Exposure apparatus
DE102006044591A1 (de) 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
KR100901024B1 (ko) * 2007-09-21 2009-06-04 엘지전자 주식회사 냉장고의 탈기 저장장치
WO2009059614A1 (en) 2007-11-06 2009-05-14 Carl Zeiss Smt Ag Method for removing a contamination layer from an optical surface, method for generating a cleaning gas, and corresponding cleaning and cleaning...
DE102009029282A1 (de) * 2009-09-08 2011-03-24 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie
NL2005208A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
NL2005207A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
KR102099880B1 (ko) * 2013-05-06 2020-04-10 삼성전자 주식회사 유효 열 전자 강화 유닛을 갖는 리소그래피 장치 및 패턴 형성 방법
US10527956B2 (en) 2017-03-24 2020-01-07 Nikon Corporation Temperature controlled heat transfer frame for pellicle
CN111736432A (zh) * 2020-06-15 2020-10-02 上海集成电路研发中心有限公司 一种阻隔光阻放气污染的装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2691865B2 (ja) 1994-03-18 1997-12-17 株式会社ソルテック 極紫外線縮小投影露光装置
EP1039510A4 (en) 1997-11-14 2003-11-12 Nikon Corp EXPOSURE DEVICE, MANUFACTURING METHOD THEREOF, AND EXPOSURE METHOD
US6153044A (en) * 1998-04-30 2000-11-28 Euv Llc Protection of lithographic components from particle contamination
US6459472B1 (en) * 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6727980B2 (en) 1998-09-17 2004-04-27 Nikon Corporation Apparatus and method for pattern exposure and method for adjusting the apparatus
JP2000268756A (ja) 1999-03-12 2000-09-29 Toshiba Corp 荷電ビーム装置および荷電ビームの制御方法
US20010016302A1 (en) 1999-12-28 2001-08-23 Nikon Corporation Wafer chucks allowing controlled reduction of substrate heating and rapid substrate exchange
JP2002050568A (ja) 2000-08-04 2002-02-15 Nikon Corp 露光方法とこれを用いたデバイスの製造方法、および露光装置とこれを用いたデバイスの製造方法
DE60118669T2 (de) * 2000-08-25 2007-01-11 Asml Netherlands B.V. Lithographischer Projektionsapparat
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2005175187A (ja) 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2000854A2 (en) 2007-06-04 2008-12-10 Canon Kabushiki Kaisha Substrate processing apparatus and method of manufacturing device
EP2161351A1 (en) 2007-06-04 2010-03-10 Canon Kabushiki Kaisha Substrate processing apparatus and method of manufacturing a device
US8259284B2 (en) 2008-08-27 2012-09-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7196769B2 (en) 2007-03-27
US20050275821A1 (en) 2005-12-15

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