JP2005353986A5 - - Google Patents
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- Publication number
- JP2005353986A5 JP2005353986A5 JP2004175586A JP2004175586A JP2005353986A5 JP 2005353986 A5 JP2005353986 A5 JP 2005353986A5 JP 2004175586 A JP2004175586 A JP 2004175586A JP 2004175586 A JP2004175586 A JP 2004175586A JP 2005353986 A5 JP2005353986 A5 JP 2005353986A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004175586A JP2005353986A (ja) | 2004-06-14 | 2004-06-14 | 露光装置 |
| US11/149,532 US7196769B2 (en) | 2004-06-14 | 2005-06-10 | Exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004175586A JP2005353986A (ja) | 2004-06-14 | 2004-06-14 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005353986A JP2005353986A (ja) | 2005-12-22 |
| JP2005353986A5 true JP2005353986A5 (https=) | 2007-08-02 |
Family
ID=35460161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004175586A Withdrawn JP2005353986A (ja) | 2004-06-14 | 2004-06-14 | 露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7196769B2 (https=) |
| JP (1) | JP2005353986A (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4383911B2 (ja) * | 2004-02-03 | 2009-12-16 | キヤノン株式会社 | 露光装置及び半導体デバイスの製造方法 |
| JP2005295762A (ja) * | 2004-04-05 | 2005-10-20 | Canon Inc | ステージ装置および露光装置 |
| US7245350B2 (en) * | 2005-11-11 | 2007-07-17 | Canon Kabushiki Kaisha | Exposure apparatus |
| DE102006044591A1 (de) | 2006-09-19 | 2008-04-03 | Carl Zeiss Smt Ag | Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination |
| JP2008300806A (ja) | 2007-06-04 | 2008-12-11 | Canon Inc | 基板処理装置、露光装置及びデバイス製造方法 |
| KR100901024B1 (ko) * | 2007-09-21 | 2009-06-04 | 엘지전자 주식회사 | 냉장고의 탈기 저장장치 |
| WO2009059614A1 (en) | 2007-11-06 | 2009-05-14 | Carl Zeiss Smt Ag | Method for removing a contamination layer from an optical surface, method for generating a cleaning gas, and corresponding cleaning and cleaning... |
| JP5171482B2 (ja) | 2008-08-27 | 2013-03-27 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| DE102009029282A1 (de) * | 2009-09-08 | 2011-03-24 | Carl Zeiss Smt Gmbh | Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie |
| NL2005208A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
| NL2005207A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
| KR102099880B1 (ko) * | 2013-05-06 | 2020-04-10 | 삼성전자 주식회사 | 유효 열 전자 강화 유닛을 갖는 리소그래피 장치 및 패턴 형성 방법 |
| US10527956B2 (en) | 2017-03-24 | 2020-01-07 | Nikon Corporation | Temperature controlled heat transfer frame for pellicle |
| CN111736432A (zh) * | 2020-06-15 | 2020-10-02 | 上海集成电路研发中心有限公司 | 一种阻隔光阻放气污染的装置 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2691865B2 (ja) | 1994-03-18 | 1997-12-17 | 株式会社ソルテック | 極紫外線縮小投影露光装置 |
| EP1039510A4 (en) | 1997-11-14 | 2003-11-12 | Nikon Corp | EXPOSURE DEVICE, MANUFACTURING METHOD THEREOF, AND EXPOSURE METHOD |
| US6153044A (en) * | 1998-04-30 | 2000-11-28 | Euv Llc | Protection of lithographic components from particle contamination |
| US6459472B1 (en) * | 1998-05-15 | 2002-10-01 | Asml Netherlands B.V. | Lithographic device |
| US6727980B2 (en) | 1998-09-17 | 2004-04-27 | Nikon Corporation | Apparatus and method for pattern exposure and method for adjusting the apparatus |
| JP2000268756A (ja) | 1999-03-12 | 2000-09-29 | Toshiba Corp | 荷電ビーム装置および荷電ビームの制御方法 |
| US20010016302A1 (en) | 1999-12-28 | 2001-08-23 | Nikon Corporation | Wafer chucks allowing controlled reduction of substrate heating and rapid substrate exchange |
| JP2002050568A (ja) | 2000-08-04 | 2002-02-15 | Nikon Corp | 露光方法とこれを用いたデバイスの製造方法、および露光装置とこれを用いたデバイスの製造方法 |
| DE60118669T2 (de) * | 2000-08-25 | 2007-01-11 | Asml Netherlands B.V. | Lithographischer Projektionsapparat |
| US6614505B2 (en) * | 2001-01-10 | 2003-09-02 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
| JP2005175187A (ja) | 2003-12-11 | 2005-06-30 | Canon Inc | 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス |
| JP4666908B2 (ja) | 2003-12-12 | 2011-04-06 | キヤノン株式会社 | 露光装置、計測方法及びデバイス製造方法 |
| JP4383911B2 (ja) | 2004-02-03 | 2009-12-16 | キヤノン株式会社 | 露光装置及び半導体デバイスの製造方法 |
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2004
- 2004-06-14 JP JP2004175586A patent/JP2005353986A/ja not_active Withdrawn
-
2005
- 2005-06-10 US US11/149,532 patent/US7196769B2/en not_active Expired - Fee Related