JP2005340825A5 - - Google Patents
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- Publication number
- JP2005340825A5 JP2005340825A5 JP2005150621A JP2005150621A JP2005340825A5 JP 2005340825 A5 JP2005340825 A5 JP 2005340825A5 JP 2005150621 A JP2005150621 A JP 2005150621A JP 2005150621 A JP2005150621 A JP 2005150621A JP 2005340825 A5 JP2005340825 A5 JP 2005340825A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas outlet
- laminator
- flushing device
- lithographic apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/852,686 US7136142B2 (en) | 2004-05-25 | 2004-05-25 | Lithographic apparatus having a gas flushing device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008265455A Division JP4637223B2 (ja) | 2004-05-25 | 2008-10-14 | ガス・フラッシング・デバイスを有するリソグラフィ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005340825A JP2005340825A (ja) | 2005-12-08 |
| JP2005340825A5 true JP2005340825A5 (enExample) | 2007-06-28 |
| JP4318667B2 JP4318667B2 (ja) | 2009-08-26 |
Family
ID=34938293
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005150621A Expired - Fee Related JP4318667B2 (ja) | 2004-05-25 | 2005-05-24 | ガス・フラッシング・デバイスを有するリソグラフィ装置 |
| JP2008265455A Expired - Lifetime JP4637223B2 (ja) | 2004-05-25 | 2008-10-14 | ガス・フラッシング・デバイスを有するリソグラフィ装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008265455A Expired - Lifetime JP4637223B2 (ja) | 2004-05-25 | 2008-10-14 | ガス・フラッシング・デバイスを有するリソグラフィ装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7136142B2 (enExample) |
| EP (1) | EP1600819B1 (enExample) |
| JP (2) | JP4318667B2 (enExample) |
| KR (1) | KR100768946B1 (enExample) |
| CN (1) | CN100541334C (enExample) |
| DE (1) | DE602005013145D1 (enExample) |
| SG (1) | SG117593A1 (enExample) |
| TW (1) | TWI266965B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060119811A1 (en) * | 2004-12-07 | 2006-06-08 | Asml Netherlands B.V. | Radiation exposure apparatus comprising a gas flushing system |
| KR101252312B1 (ko) * | 2004-12-23 | 2013-04-08 | 칼 짜이스 에스엠테 게엠베하 | 적어도 하나의 교체 가능한 광학 요소를 포함하는 대물렌즈모듈 |
| NL1036181A1 (nl) * | 2007-11-30 | 2009-06-04 | Asml Netherlands Bv | A lithographic apparatus, a projection system and a device manufacturing method. |
| KR101399303B1 (ko) * | 2008-12-05 | 2014-05-26 | 엘지디스플레이 주식회사 | 평판표시장치용 노광장비 |
| NL2008184A (en) | 2011-02-28 | 2012-08-29 | Asml Netherlands Bv | Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
| US9453801B2 (en) | 2012-05-25 | 2016-09-27 | Kla-Tencor Corporation | Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems |
| US9662688B2 (en) | 2012-07-09 | 2017-05-30 | Kla-Tencor Corporation | Apparatus and method for cross-flow purge for optical components in a chamber |
| NL2012291A (en) * | 2013-02-20 | 2014-08-21 | Asml Netherlands Bv | Gas flow optimization in reticle stage environment. |
| CN109283797B (zh) * | 2017-07-21 | 2021-04-30 | 上海微电子装备（集团）股份有限公司 | 物镜保护装置、物镜系统以及光刻设备 |
| CN108398858B (zh) * | 2018-03-20 | 2019-05-10 | 李笛 | 一种气体隔离装置及隔离方法 |
| WO2020182540A1 (en) | 2019-03-14 | 2020-09-17 | Asml Netherlands B.V. | Providing substantially laminar fluid flow in a lithographic apparatus |
| JP7427461B2 (ja) * | 2020-02-06 | 2024-02-05 | キヤノン株式会社 | 露光装置、及び物品の製造方法 |
| DE102022128598A1 (de) * | 2022-10-28 | 2024-05-08 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung und Verfahren zur Inertisierung einer Prozesskammer für die additive Fertigung eines Werkstücks |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4692934A (en) | 1984-11-08 | 1987-09-08 | Hampshire Instruments | X-ray lithography system |
| JPH03252507A (ja) | 1990-03-02 | 1991-11-11 | Hitachi Ltd | レーザ干渉測長装置およびそれを用いた位置決め方法 |
| JP3448670B2 (ja) | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
| JP3637639B2 (ja) | 1995-07-10 | 2005-04-13 | 株式会社ニコン | 露光装置 |
| JP2828090B2 (ja) * | 1997-03-24 | 1998-11-25 | 株式会社ニコン | 露光装置 |
| DE19830438A1 (de) | 1998-07-08 | 2000-01-13 | Zeiss Carl Fa | Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen |
| TW480372B (en) | 1999-11-05 | 2002-03-21 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method |
| TW563002B (en) * | 1999-11-05 | 2003-11-21 | Asml Netherlands Bv | Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method |
| JP2002373852A (ja) * | 2001-06-15 | 2002-12-26 | Canon Inc | 露光装置 |
-
2004
- 2004-05-25 US US10/852,686 patent/US7136142B2/en not_active Expired - Lifetime
-
2005
- 2005-05-23 DE DE602005013145T patent/DE602005013145D1/de not_active Expired - Lifetime
- 2005-05-23 EP EP05076194A patent/EP1600819B1/en not_active Expired - Lifetime
- 2005-05-24 SG SG200503180A patent/SG117593A1/en unknown
- 2005-05-24 TW TW094116915A patent/TWI266965B/zh not_active IP Right Cessation
- 2005-05-24 CN CNB2005100817530A patent/CN100541334C/zh not_active Expired - Lifetime
- 2005-05-24 JP JP2005150621A patent/JP4318667B2/ja not_active Expired - Fee Related
- 2005-05-25 KR KR1020050044143A patent/KR100768946B1/ko not_active Expired - Fee Related
-
2008
- 2008-10-14 JP JP2008265455A patent/JP4637223B2/ja not_active Expired - Lifetime
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