KR100768946B1 - 가스 플러싱 디바이스를 구비한 리소그래피 장치 - Google Patents

가스 플러싱 디바이스를 구비한 리소그래피 장치 Download PDF

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Publication number
KR100768946B1
KR100768946B1 KR1020050044143A KR20050044143A KR100768946B1 KR 100768946 B1 KR100768946 B1 KR 100768946B1 KR 1020050044143 A KR1020050044143 A KR 1020050044143A KR 20050044143 A KR20050044143 A KR 20050044143A KR 100768946 B1 KR100768946 B1 KR 100768946B1
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KR
South Korea
Prior art keywords
gas
gas outlet
laminator
additional
flushing device
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Expired - Fee Related
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KR1020050044143A
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English (en)
Korean (ko)
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KR20060048091A (ko
Inventor
마르첼 벡커스
로날드 요한네스 헐터만스
카테 니콜라스 텐
니콜라스 루돌프 켐퍼
니콜라스 프란시스쿠스 코펠라르스
얀-마리우스 쇼츠만
데르 함 로날드 반
우이요트렉트 요한네스 안토니우스 마리아 마르티나 반
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20060048091A publication Critical patent/KR20060048091A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050044143A 2004-05-25 2005-05-25 가스 플러싱 디바이스를 구비한 리소그래피 장치 Expired - Fee Related KR100768946B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/852,686 2004-05-25
US10/852,686 US7136142B2 (en) 2004-05-25 2004-05-25 Lithographic apparatus having a gas flushing device

Publications (2)

Publication Number Publication Date
KR20060048091A KR20060048091A (ko) 2006-05-18
KR100768946B1 true KR100768946B1 (ko) 2007-10-19

Family

ID=34938293

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050044143A Expired - Fee Related KR100768946B1 (ko) 2004-05-25 2005-05-25 가스 플러싱 디바이스를 구비한 리소그래피 장치

Country Status (8)

Country Link
US (1) US7136142B2 (enExample)
EP (1) EP1600819B1 (enExample)
JP (2) JP4318667B2 (enExample)
KR (1) KR100768946B1 (enExample)
CN (1) CN100541334C (enExample)
DE (1) DE602005013145D1 (enExample)
SG (1) SG117593A1 (enExample)
TW (1) TWI266965B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060119811A1 (en) * 2004-12-07 2006-06-08 Asml Netherlands B.V. Radiation exposure apparatus comprising a gas flushing system
JP5022912B2 (ja) * 2004-12-23 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 少なくとも１つの交換可能な光学素子を備えるレンズモジュール
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
KR101399303B1 (ko) * 2008-12-05 2014-05-26 엘지디스플레이 주식회사 평판표시장치용 노광장비
NL2008184A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
US9453801B2 (en) 2012-05-25 2016-09-27 Kla-Tencor Corporation Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems
US9662688B2 (en) 2012-07-09 2017-05-30 Kla-Tencor Corporation Apparatus and method for cross-flow purge for optical components in a chamber
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
CN108398858B (zh) * 2018-03-20 2019-05-10 李笛 一种气体隔离装置及隔离方法
WO2020182540A1 (en) 2019-03-14 2020-09-17 Asml Netherlands B.V. Providing substantially laminar fluid flow in a lithographic apparatus
JP7427461B2 (ja) * 2020-02-06 2024-02-05 キヤノン株式会社 露光装置、及び物品の製造方法
DE102022128598A1 (de) * 2022-10-28 2024-05-08 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zur Inertisierung einer Prozesskammer für die additive Fertigung eines Werkstücks

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5906429A (en) 1993-09-02 1999-05-25 Nikon Corporation Optical illumination device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4692934A (en) 1984-11-08 1987-09-08 Hampshire Instruments X-ray lithography system
JPH03252507A (ja) 1990-03-02 1991-11-11 Hitachi Ltd レーザ干渉測長装置およびそれを用いた位置決め方法
JP3637639B2 (ja) 1995-07-10 2005-04-13 株式会社ニコン 露光装置
JP2828090B2 (ja) * 1997-03-24 1998-11-25 株式会社ニコン 露光装置
DE19830438A1 (de) 1998-07-08 2000-01-13 Zeiss Carl Fa Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen
TW480372B (en) 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP2002373852A (ja) * 2001-06-15 2002-12-26 Canon Inc 露光装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5906429A (en) 1993-09-02 1999-05-25 Nikon Corporation Optical illumination device

Also Published As

Publication number Publication date
US20050264773A1 (en) 2005-12-01
TWI266965B (en) 2006-11-21
CN1725110A (zh) 2006-01-25
SG117593A1 (en) 2005-12-29
EP1600819A1 (en) 2005-11-30
JP4318667B2 (ja) 2009-08-26
TW200609687A (en) 2006-03-16
JP2005340825A (ja) 2005-12-08
KR20060048091A (ko) 2006-05-18
EP1600819B1 (en) 2009-03-11
CN100541334C (zh) 2009-09-16
DE602005013145D1 (de) 2009-04-23
US7136142B2 (en) 2006-11-14
JP4637223B2 (ja) 2011-02-23
JP2009021636A (ja) 2009-01-29

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