JP4318667B2 - ガス・フラッシング・デバイスを有するリソグラフィ装置 - Google Patents

ガス・フラッシング・デバイスを有するリソグラフィ装置 Download PDF

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Publication number
JP4318667B2
JP4318667B2 JP2005150621A JP2005150621A JP4318667B2 JP 4318667 B2 JP4318667 B2 JP 4318667B2 JP 2005150621 A JP2005150621 A JP 2005150621A JP 2005150621 A JP2005150621 A JP 2005150621A JP 4318667 B2 JP4318667 B2 JP 4318667B2
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JP
Japan
Prior art keywords
gas
gas outlet
laminator
flushing device
flow
Prior art date
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Expired - Fee Related
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JP2005150621A
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English (en)
Japanese (ja)
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JP2005340825A (ja
JP2005340825A5 (enExample
Inventor
ベッカーズ マルセル
ヨハネス フルターマンス ロナルド
テン カテ ニコラース
ルドルフ ケンパー ニコラース
フランシスクス コッペラース ニコラース
− マリウス ショトスマン ヤン
ファン デル ハム ロナルド
アントニウス マリア マルティーナ ファン ウイユトレグト ヨハネス
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2005340825A publication Critical patent/JP2005340825A/ja
Publication of JP2005340825A5 publication Critical patent/JP2005340825A5/ja
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005150621A 2004-05-25 2005-05-24 ガス・フラッシング・デバイスを有するリソグラフィ装置 Expired - Fee Related JP4318667B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/852,686 US7136142B2 (en) 2004-05-25 2004-05-25 Lithographic apparatus having a gas flushing device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008265455A Division JP4637223B2 (ja) 2004-05-25 2008-10-14 ガス・フラッシング・デバイスを有するリソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2005340825A JP2005340825A (ja) 2005-12-08
JP2005340825A5 JP2005340825A5 (enExample) 2007-06-28
JP4318667B2 true JP4318667B2 (ja) 2009-08-26

Family

ID=34938293

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2005150621A Expired - Fee Related JP4318667B2 (ja) 2004-05-25 2005-05-24 ガス・フラッシング・デバイスを有するリソグラフィ装置
JP2008265455A Expired - Lifetime JP4637223B2 (ja) 2004-05-25 2008-10-14 ガス・フラッシング・デバイスを有するリソグラフィ装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008265455A Expired - Lifetime JP4637223B2 (ja) 2004-05-25 2008-10-14 ガス・フラッシング・デバイスを有するリソグラフィ装置

Country Status (8)

Country Link
US (1) US7136142B2 (enExample)
EP (1) EP1600819B1 (enExample)
JP (2) JP4318667B2 (enExample)
KR (1) KR100768946B1 (enExample)
CN (1) CN100541334C (enExample)
DE (1) DE602005013145D1 (enExample)
SG (1) SG117593A1 (enExample)
TW (1) TWI266965B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060119811A1 (en) * 2004-12-07 2006-06-08 Asml Netherlands B.V. Radiation exposure apparatus comprising a gas flushing system
JP5022912B2 (ja) * 2004-12-23 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 少なくとも１つの交換可能な光学素子を備えるレンズモジュール
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
KR101399303B1 (ko) * 2008-12-05 2014-05-26 엘지디스플레이 주식회사 평판표시장치용 노광장비
NL2008184A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
US9453801B2 (en) 2012-05-25 2016-09-27 Kla-Tencor Corporation Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems
US9662688B2 (en) 2012-07-09 2017-05-30 Kla-Tencor Corporation Apparatus and method for cross-flow purge for optical components in a chamber
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
CN108398858B (zh) * 2018-03-20 2019-05-10 李笛 一种气体隔离装置及隔离方法
WO2020182540A1 (en) 2019-03-14 2020-09-17 Asml Netherlands B.V. Providing substantially laminar fluid flow in a lithographic apparatus
JP7427461B2 (ja) * 2020-02-06 2024-02-05 キヤノン株式会社 露光装置、及び物品の製造方法
DE102022128598A1 (de) * 2022-10-28 2024-05-08 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zur Inertisierung einer Prozesskammer für die additive Fertigung eines Werkstücks

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4692934A (en) 1984-11-08 1987-09-08 Hampshire Instruments X-ray lithography system
JPH03252507A (ja) 1990-03-02 1991-11-11 Hitachi Ltd レーザ干渉測長装置およびそれを用いた位置決め方法
JP3448670B2 (ja) 1993-09-02 2003-09-22 株式会社ニコン 露光装置及び素子製造方法
JP3637639B2 (ja) 1995-07-10 2005-04-13 株式会社ニコン 露光装置
JP2828090B2 (ja) * 1997-03-24 1998-11-25 株式会社ニコン 露光装置
DE19830438A1 (de) 1998-07-08 2000-01-13 Zeiss Carl Fa Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen
TW480372B (en) 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP2002373852A (ja) * 2001-06-15 2002-12-26 Canon Inc 露光装置

Also Published As

Publication number Publication date
US20050264773A1 (en) 2005-12-01
TWI266965B (en) 2006-11-21
CN1725110A (zh) 2006-01-25
SG117593A1 (en) 2005-12-29
EP1600819A1 (en) 2005-11-30
TW200609687A (en) 2006-03-16
JP2005340825A (ja) 2005-12-08
KR20060048091A (ko) 2006-05-18
EP1600819B1 (en) 2009-03-11
CN100541334C (zh) 2009-09-16
KR100768946B1 (ko) 2007-10-19
DE602005013145D1 (de) 2009-04-23
US7136142B2 (en) 2006-11-14
JP4637223B2 (ja) 2011-02-23
JP2009021636A (ja) 2009-01-29

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