JP2019516866A5 - - Google Patents

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Publication number
JP2019516866A5
JP2019516866A5 JP2018561623A JP2018561623A JP2019516866A5 JP 2019516866 A5 JP2019516866 A5 JP 2019516866A5 JP 2018561623 A JP2018561623 A JP 2018561623A JP 2018561623 A JP2018561623 A JP 2018561623A JP 2019516866 A5 JP2019516866 A5 JP 2019516866A5
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JP
Japan
Prior art keywords
chuck
shadow mask
substrate
major surface
plane
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JP2018561623A
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English (en)
Japanese (ja)
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JP7097821B2 (ja
JP2019516866A (ja
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Priority claimed from US15/602,939 external-priority patent/US10386731B2/en
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JP2018561623A 2016-05-24 2017-05-24 シャドーマスク堆積システム及びその方法 Active JP7097821B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662340793P 2016-05-24 2016-05-24
US62/340,793 2016-05-24
US15/602,939 US10386731B2 (en) 2016-05-24 2017-05-23 Shadow-mask-deposition system and method therefor
US15/602,939 2017-05-23
PCT/US2017/034203 WO2017205479A1 (en) 2016-05-24 2017-05-24 Shadow-mask-deposition system and method therefor

Publications (3)

Publication Number Publication Date
JP2019516866A JP2019516866A (ja) 2019-06-20
JP2019516866A5 true JP2019516866A5 (enExample) 2020-06-25
JP7097821B2 JP7097821B2 (ja) 2022-07-08

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JP2018561623A Active JP7097821B2 (ja) 2016-05-24 2017-05-24 シャドーマスク堆積システム及びその方法

Country Status (6)

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US (1) US10386731B2 (enExample)
EP (1) EP3464673B1 (enExample)
JP (1) JP7097821B2 (enExample)
KR (1) KR102378671B1 (enExample)
CN (1) CN109642308B (enExample)
WO (1) WO2017205479A1 (enExample)

Families Citing this family (8)

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US10644239B2 (en) 2014-11-17 2020-05-05 Emagin Corporation High precision, high resolution collimating shadow mask and method for fabricating a micro-display
US10386731B2 (en) 2016-05-24 2019-08-20 Emagin Corporation Shadow-mask-deposition system and method therefor
KR102377183B1 (ko) 2016-05-24 2022-03-21 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
TWI721170B (zh) 2016-05-24 2021-03-11 美商伊麥傑公司 蔽蔭遮罩沉積系統及其方法
US10886452B2 (en) * 2018-01-25 2021-01-05 United States Of America As Represented By The Administrator Of Nasa Selective and direct deposition technique for streamlined CMOS processing
CN108198958B (zh) * 2018-01-30 2020-06-30 京东方科技集团股份有限公司 显示基板及其制作方法、制作设备、显示装置
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KR20250122025A (ko) * 2024-02-05 2025-08-13 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조 방법

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US10644239B2 (en) 2014-11-17 2020-05-05 Emagin Corporation High precision, high resolution collimating shadow mask and method for fabricating a micro-display
KR102318264B1 (ko) * 2015-01-14 2021-10-27 삼성디스플레이 주식회사 증착장치
TWI721170B (zh) 2016-05-24 2021-03-11 美商伊麥傑公司 蔽蔭遮罩沉積系統及其方法
KR102377183B1 (ko) 2016-05-24 2022-03-21 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
US10386731B2 (en) 2016-05-24 2019-08-20 Emagin Corporation Shadow-mask-deposition system and method therefor

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