JP2005308629A - ミラーユニット及びそれの製造方法 - Google Patents

ミラーユニット及びそれの製造方法 Download PDF

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Publication number
JP2005308629A
JP2005308629A JP2004128128A JP2004128128A JP2005308629A JP 2005308629 A JP2005308629 A JP 2005308629A JP 2004128128 A JP2004128128 A JP 2004128128A JP 2004128128 A JP2004128128 A JP 2004128128A JP 2005308629 A JP2005308629 A JP 2005308629A
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JP
Japan
Prior art keywords
substrate
multilayer film
mirror unit
deformation
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004128128A
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English (en)
Japanese (ja)
Other versions
JP2005308629A5 (enExample
Inventor
Takeshi Yamamoto
武 山本
Akira Miyake
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004128128A priority Critical patent/JP2005308629A/ja
Priority to US11/113,113 priority patent/US7311407B2/en
Publication of JP2005308629A publication Critical patent/JP2005308629A/ja
Publication of JP2005308629A5 publication Critical patent/JP2005308629A5/ja
Priority to US11/938,439 priority patent/US7628497B2/en
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2004128128A 2004-04-23 2004-04-23 ミラーユニット及びそれの製造方法 Withdrawn JP2005308629A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004128128A JP2005308629A (ja) 2004-04-23 2004-04-23 ミラーユニット及びそれの製造方法
US11/113,113 US7311407B2 (en) 2004-04-23 2005-04-22 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
US11/938,439 US7628497B2 (en) 2004-04-23 2007-11-12 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004128128A JP2005308629A (ja) 2004-04-23 2004-04-23 ミラーユニット及びそれの製造方法

Publications (2)

Publication Number Publication Date
JP2005308629A true JP2005308629A (ja) 2005-11-04
JP2005308629A5 JP2005308629A5 (enExample) 2007-06-14

Family

ID=35136108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004128128A Withdrawn JP2005308629A (ja) 2004-04-23 2004-04-23 ミラーユニット及びそれの製造方法

Country Status (2)

Country Link
US (2) US7311407B2 (enExample)
JP (1) JP2005308629A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007329457A (ja) * 2006-04-25 2007-12-20 Asml Netherlands Bv 収差補正光学エレメントおよびこれを備えたリソグラフィ装置
JP2014514742A (ja) * 2011-03-23 2014-06-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖミラー機構、ｅｕｖミラー機構を備えた光学系、及びｅｕｖミラー機構を備えた光学系を操作する方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007108194A (ja) * 2005-10-11 2007-04-26 Canon Inc 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法
JP4814782B2 (ja) * 2006-12-28 2011-11-16 株式会社ジェイテック 位相回復法を用いたｘ線集光方法及びその装置
JP5756982B2 (ja) * 2009-12-28 2015-07-29 株式会社ジェイテック Ｘ線集光方法、反射面形状制御ミラー装置及び反射面形状制御ミラーの製造方法
US20120026473A1 (en) * 2010-07-29 2012-02-02 Michael Lucien Genier Highly reflective, hardened silica titania article and method of making
DE102011084649A1 (de) * 2011-10-17 2013-04-18 Carl Zeiss Smt Gmbh Spiegel mit piezoelektrischem Substrat sowie optische Anordnung damit
US9606447B2 (en) * 2012-05-21 2017-03-28 Nikon Corporation Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
DE102013219583A1 (de) * 2013-09-27 2015-04-02 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0310844A (ja) 1989-06-09 1991-01-18 Fuji Electric Co Ltd インクジェット・プリンタ
JP3010844B2 (ja) 1991-10-03 2000-02-21 株式会社ニコン Ｘ線反射鏡
JP2687780B2 (ja) 1991-10-14 1997-12-08 株式会社日立製作所 原子炉の水素注入設備
US5598031A (en) * 1993-06-23 1997-01-28 Vlsi Technology, Inc. Electrically and thermally enhanced package using a separate silicon substrate
WO2001041155A1 (en) * 1999-11-29 2001-06-07 Tohoku Techno Arch Co., Ltd. Optical element such as multilayer film reflection mirror, production method therefor and device using it
US20020171922A1 (en) * 2000-10-20 2002-11-21 Nikon Corporation Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same
US20030081722A1 (en) * 2001-08-27 2003-05-01 Nikon Corporation Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations
US7332819B2 (en) * 2002-01-09 2008-02-19 Micron Technology, Inc. Stacked die in die BGA package
JP3782736B2 (ja) 2002-01-29 2006-06-07 キヤノン株式会社 露光装置及びその制御方法
JP2003234269A (ja) * 2002-02-07 2003-08-22 Nikon Corp 反射ミラーの保持方法、反射ミラーの保持部材及び露光装置
US7662263B2 (en) * 2002-09-27 2010-02-16 Euv Llc. Figure correction of multilayer coated optics
US7038305B1 (en) * 2003-07-15 2006-05-02 Altera Corp. Package for integrated circuit die
US7125128B2 (en) * 2004-01-26 2006-10-24 Nikon Corporation Adaptive-optics actuator arrays and methods for using such arrays

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007329457A (ja) * 2006-04-25 2007-12-20 Asml Netherlands Bv 収差補正光学エレメントおよびこれを備えたリソグラフィ装置
JP2014514742A (ja) * 2011-03-23 2014-06-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖミラー機構、ｅｕｖミラー機構を備えた光学系、及びｅｕｖミラー機構を備えた光学系を操作する方法
US9442383B2 (en) 2011-03-23 2016-09-13 Carl Zeiss Smt Gmbh EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method
US9997268B2 (en) 2011-03-23 2018-06-12 Carl Zeiss Smt Gmbh EUV-mirror, optical system with EUV-mirror and associated operating method

Also Published As

Publication number Publication date
US7311407B2 (en) 2007-12-25
US20080117512A1 (en) 2008-05-22
US20050237618A1 (en) 2005-10-27
US7628497B2 (en) 2009-12-08

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