JP2005308629A5 - - Google Patents
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- Publication number
- JP2005308629A5 JP2005308629A5 JP2004128128A JP2004128128A JP2005308629A5 JP 2005308629 A5 JP2005308629 A5 JP 2005308629A5 JP 2004128128 A JP2004128128 A JP 2004128128A JP 2004128128 A JP2004128128 A JP 2004128128A JP 2005308629 A5 JP2005308629 A5 JP 2005308629A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004128128A JP2005308629A (ja) | 2004-04-23 | 2004-04-23 | ミラーユニット及びそれの製造方法 |
| US11/113,113 US7311407B2 (en) | 2004-04-23 | 2005-04-22 | Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit |
| US11/938,439 US7628497B2 (en) | 2004-04-23 | 2007-11-12 | Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004128128A JP2005308629A (ja) | 2004-04-23 | 2004-04-23 | ミラーユニット及びそれの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005308629A JP2005308629A (ja) | 2005-11-04 |
| JP2005308629A5 true JP2005308629A5 (enExample) | 2007-06-14 |
Family
ID=35136108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004128128A Withdrawn JP2005308629A (ja) | 2004-04-23 | 2004-04-23 | ミラーユニット及びそれの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7311407B2 (enExample) |
| JP (1) | JP2005308629A (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007108194A (ja) * | 2005-10-11 | 2007-04-26 | Canon Inc | 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法 |
| US7715107B2 (en) * | 2006-04-25 | 2010-05-11 | Asml Netherlands B.V. | Optical element for correction of aberration, and a lithographic apparatus comprising same |
| JP4814782B2 (ja) * | 2006-12-28 | 2011-11-16 | 株式会社ジェイテック | 位相回復法を用いたｘ線集光方法及びその装置 |
| JP5756982B2 (ja) * | 2009-12-28 | 2015-07-29 | 株式会社ジェイテック | Ｘ線集光方法、反射面形状制御ミラー装置及び反射面形状制御ミラーの製造方法 |
| US20120026473A1 (en) * | 2010-07-29 | 2012-02-02 | Michael Lucien Genier | Highly reflective, hardened silica titania article and method of making |
| EP2689427B1 (en) | 2011-03-23 | 2017-05-03 | Carl Zeiss SMT GmbH | Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement |
| DE102011084649A1 (de) * | 2011-10-17 | 2013-04-18 | Carl Zeiss Smt Gmbh | Spiegel mit piezoelektrischem Substrat sowie optische Anordnung damit |
| US9606447B2 (en) * | 2012-05-21 | 2017-03-28 | Nikon Corporation | Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method |
| DE102013219583A1 (de) * | 2013-09-27 | 2015-04-02 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0310844A (ja) | 1989-06-09 | 1991-01-18 | Fuji Electric Co Ltd | インクジェット・プリンタ |
| JP3010844B2 (ja) | 1991-10-03 | 2000-02-21 | 株式会社ニコン | Ｘ線反射鏡 |
| JP2687780B2 (ja) | 1991-10-14 | 1997-12-08 | 株式会社日立製作所 | 原子炉の水素注入設備 |
| US5598031A (en) * | 1993-06-23 | 1997-01-28 | Vlsi Technology, Inc. | Electrically and thermally enhanced package using a separate silicon substrate |
| WO2001041155A1 (en) * | 1999-11-29 | 2001-06-07 | Tohoku Techno Arch Co., Ltd. | Optical element such as multilayer film reflection mirror, production method therefor and device using it |
| US20020171922A1 (en) * | 2000-10-20 | 2002-11-21 | Nikon Corporation | Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same |
| US20030081722A1 (en) * | 2001-08-27 | 2003-05-01 | Nikon Corporation | Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations |
| US7332819B2 (en) * | 2002-01-09 | 2008-02-19 | Micron Technology, Inc. | Stacked die in die BGA package |
| JP3782736B2 (ja) | 2002-01-29 | 2006-06-07 | キヤノン株式会社 | 露光装置及びその制御方法 |
| JP2003234269A (ja) * | 2002-02-07 | 2003-08-22 | Nikon Corp | 反射ミラーの保持方法、反射ミラーの保持部材及び露光装置 |
| US7662263B2 (en) * | 2002-09-27 | 2010-02-16 | Euv Llc. | Figure correction of multilayer coated optics |
| US7038305B1 (en) * | 2003-07-15 | 2006-05-02 | Altera Corp. | Package for integrated circuit die |
| US7125128B2 (en) * | 2004-01-26 | 2006-10-24 | Nikon Corporation | Adaptive-optics actuator arrays and methods for using such arrays |
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2004
- 2004-04-23 JP JP2004128128A patent/JP2005308629A/ja not_active Withdrawn
-
2005
- 2005-04-22 US US11/113,113 patent/US7311407B2/en not_active Expired - Fee Related
-
2007
- 2007-11-12 US US11/938,439 patent/US7628497B2/en not_active Expired - Fee Related