JP2005244185A5 - - Google Patents
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- Publication number
- JP2005244185A5 JP2005244185A5 JP2005008643A JP2005008643A JP2005244185A5 JP 2005244185 A5 JP2005244185 A5 JP 2005244185A5 JP 2005008643 A JP2005008643 A JP 2005008643A JP 2005008643 A JP2005008643 A JP 2005008643A JP 2005244185 A5 JP2005244185 A5 JP 2005244185A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- semiconductor layer
- mask
- gate electrode
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 26
- 238000000034 method Methods 0.000 claims 17
- 238000004519 manufacturing process Methods 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 9
- 239000004020 conductor Substances 0.000 claims 8
- 239000007788 liquid Substances 0.000 claims 7
- 239000000463 material Substances 0.000 claims 7
- 230000001678 irradiating effect Effects 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
- 239000005871 repellent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005008643A JP4884675B2 (ja) | 2004-01-26 | 2005-01-17 | 半導体装置の作製方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004017675 | 2004-01-26 | ||
| JP2004017675 | 2004-01-26 | ||
| JP2004017694 | 2004-01-26 | ||
| JP2004017694 | 2004-01-26 | ||
| JP2005008643A JP4884675B2 (ja) | 2004-01-26 | 2005-01-17 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005244185A JP2005244185A (ja) | 2005-09-08 |
| JP2005244185A5 true JP2005244185A5 (enExample) | 2008-02-07 |
| JP4884675B2 JP4884675B2 (ja) | 2012-02-29 |
Family
ID=35025546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005008643A Expired - Fee Related JP4884675B2 (ja) | 2004-01-26 | 2005-01-17 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4884675B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5329784B2 (ja) * | 2006-08-25 | 2013-10-30 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP5314842B2 (ja) * | 2006-08-25 | 2013-10-16 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP5210594B2 (ja) * | 2006-10-31 | 2013-06-12 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP5095650B2 (ja) * | 2008-09-30 | 2012-12-12 | シャープ株式会社 | 膜パターンとその膜パターン形成方法、及び導電膜配線、並びに電気光学装置 |
| JP6578533B1 (ja) * | 2018-06-13 | 2019-09-25 | 株式会社Ｎｓｃ | 液晶パネル製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6273669A (ja) * | 1985-09-26 | 1987-04-04 | Seiko Instr & Electronics Ltd | 薄膜トランジスタ装置の製造方法 |
| GB9919913D0 (en) * | 1999-08-24 | 1999-10-27 | Koninkl Philips Electronics Nv | Thin-film transistors and method for producing the same |
| EP1393389B1 (en) * | 2001-05-23 | 2018-12-05 | Flexenable Limited | Laser patterning of devices |
| JP2003059940A (ja) * | 2001-08-08 | 2003-02-28 | Fuji Photo Film Co Ltd | ミクロファブリケーション用基板、その製造方法および像状薄膜形成方法 |
| JP4683825B2 (ja) * | 2002-04-24 | 2011-05-18 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
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2005
- 2005-01-17 JP JP2005008643A patent/JP4884675B2/ja not_active Expired - Fee Related