JP2005175069A - 赤外線吸収膜 - Google Patents
赤外線吸収膜 Download PDFInfo
- Publication number
- JP2005175069A JP2005175069A JP2003410372A JP2003410372A JP2005175069A JP 2005175069 A JP2005175069 A JP 2005175069A JP 2003410372 A JP2003410372 A JP 2003410372A JP 2003410372 A JP2003410372 A JP 2003410372A JP 2005175069 A JP2005175069 A JP 2005175069A
- Authority
- JP
- Japan
- Prior art keywords
- porous material
- infrared absorbing
- absorbing film
- infrared
- mesoporous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011148 porous material Substances 0.000 claims abstract description 44
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000013335 mesoporous material Substances 0.000 claims abstract description 12
- 239000002243 precursor Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 238000007641 inkjet printing Methods 0.000 claims abstract description 6
- 239000002245 particle Substances 0.000 claims description 21
- 238000010521 absorption reaction Methods 0.000 claims description 15
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- 239000002612 dispersion medium Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 10
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 3
- 150000004706 metal oxides Chemical class 0.000 abstract description 3
- 238000007639 printing Methods 0.000 abstract description 2
- 238000002310 reflectometry Methods 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000003575 carbonaceous material Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- -1 silicon alkoxide Chemical class 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 241000047703 Nonion Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000006253 pitch coke Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/046—Materials; Selection of thermal materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/107—Porous materials, e.g. for reducing the refractive index
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
【解決手段】 本発明は、多孔質材料を用いてなる赤外線吸収膜に関し、好適にはその多孔質材料は少なくとも数百nmから数μmの範囲の空孔サイズを有し、カーボンもしくはシリカなどの金属酸化物もしくは有機無機ハイブリッド材料もしくは前記組成のメソポーラス材料からなる。このような赤外線吸収膜は、多孔質材料前駆体溶液を基板上に塗布し、ついで焼成することにより製造される。
【選択図】 図1
Description
2…カーボン粒子
3…空孔
4…カーボンマトリックス
5…メソポーラス材料マトリックス
Claims (11)
- 多孔質材料を用いてなる赤外線吸収膜。
- 多孔質材料の空孔サイズが少なくとも数百nmから数μmの範囲を有する請求項1記載の赤外線吸収膜。
- 多孔質材料がカーボンである請求項1もしくは2記載の赤外線吸収膜。
- 多孔質材料がメソポーラス材料である請求項1〜3のいずれか記載の赤外線吸収膜。
- 多孔質材料前駆体溶液を基板上に塗布し、ついで焼成することを特徴とする請求項1〜4のいずれか記載の赤外線吸収膜の製造方法。
- 多孔質材料前駆体溶液がカーボン粒子および樹脂粒子が分散媒体中に分散された溶液である請求項5記載の製造方法。
- 多孔質材料前駆体溶液が、メソポーラス骨格材料、界面活性剤および水を含む分散媒体中に樹脂粒子を分散した溶液である請求項5記載の製造方法。
- メソポーラス骨格材料が金属アルコキシドである請求項7記載の製造方法。
- 塗布がインクジェット印刷である請求項5記載の製造方法。
- 多孔質材料の空孔サイズが樹脂粒子の焼失により決定される請求項6〜8のいずれか記載の赤外線吸収膜。
- 請求項1〜4のいずれか記載の赤外線吸収膜を有する赤外線センサ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003410372A JP4337530B2 (ja) | 2003-12-09 | 2003-12-09 | 赤外線吸収膜の製造方法 |
US11/008,804 US7183551B2 (en) | 2003-12-09 | 2004-12-09 | Infrared-ray absorption film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003410372A JP4337530B2 (ja) | 2003-12-09 | 2003-12-09 | 赤外線吸収膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005175069A true JP2005175069A (ja) | 2005-06-30 |
JP4337530B2 JP4337530B2 (ja) | 2009-09-30 |
Family
ID=34674928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003410372A Expired - Fee Related JP4337530B2 (ja) | 2003-12-09 | 2003-12-09 | 赤外線吸収膜の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7183551B2 (ja) |
JP (1) | JP4337530B2 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007263768A (ja) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Works Ltd | 赤外線センサ |
JP2011133239A (ja) * | 2009-12-22 | 2011-07-07 | Stanley Electric Co Ltd | 光強度測定装置及びその製造方法 |
JP2013519510A (ja) * | 2010-02-13 | 2013-05-30 | マクアリスター テクノロジーズ エルエルシー | 再放射面を有する化学反応器ならびにその関連システムおよび方法 |
US8835208B2 (en) | 2012-04-02 | 2014-09-16 | Seiko Epson Corporation | Method for manufacturing detecting element, method for manufacturing imaging device, detecting element, imaging device, and electronic device |
US9103548B2 (en) | 2010-02-13 | 2015-08-11 | Mcalister Technologies, Llc | Reactors for conducting thermochemical processes with solar heat input, and associated systems and methods |
US9302681B2 (en) | 2011-08-12 | 2016-04-05 | Mcalister Technologies, Llc | Mobile transport platforms for producing hydrogen and structural materials, and associated systems and methods |
CN111816754A (zh) * | 2020-09-04 | 2020-10-23 | 上海翼捷工业安全设备股份有限公司 | 热释电灵敏元的制备方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102656007A (zh) * | 2009-11-30 | 2012-09-05 | 南洋理工学院 | 有孔膜传感器 |
CN102530843B (zh) * | 2012-01-20 | 2014-08-13 | 中国科学院上海技术物理研究所 | 一种疏松化聚酰亚胺红外吸收薄膜的制备方法 |
JP2014235145A (ja) * | 2013-06-05 | 2014-12-15 | セイコーエプソン株式会社 | テラヘルツ波検出装置、カメラ、イメージング装置および計測装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4048980A (en) * | 1976-03-08 | 1977-09-20 | The United States Of America As Represented By The United States Energy Research And Development Administration | Solar radiation absorbing material |
JP4511676B2 (ja) | 1999-03-24 | 2010-07-28 | 石塚電子株式会社 | サーモパイル型赤外線センサ及びその製造方法 |
US6348650B1 (en) * | 1999-03-24 | 2002-02-19 | Ishizuka Electronics Corporation | Thermopile infrared sensor and process for producing the same |
US6890700B2 (en) * | 2000-12-20 | 2005-05-10 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
US6513540B2 (en) | 2001-05-11 | 2003-02-04 | Therma Corporation, Inc. | System and method for using bent pipes in high-purity fluid handling systems |
JP3594923B2 (ja) | 2001-07-16 | 2004-12-02 | 株式会社日本自動車部品総合研究所 | サーモパイル式赤外線センサの製造方法 |
DE10225377B4 (de) * | 2001-06-11 | 2014-10-09 | Denso Corporation | Verfahren zur Herstellung eines Thermosäuleninfrarotstrahlungssensors |
JP3887337B2 (ja) * | 2003-03-25 | 2007-02-28 | 株式会社東芝 | 配線部材およびその製造方法 |
JP3944465B2 (ja) * | 2003-04-11 | 2007-07-11 | 三菱電機株式会社 | 熱型赤外線検出器及び赤外線フォーカルプレーンアレイ |
-
2003
- 2003-12-09 JP JP2003410372A patent/JP4337530B2/ja not_active Expired - Fee Related
-
2004
- 2004-12-09 US US11/008,804 patent/US7183551B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007263768A (ja) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Works Ltd | 赤外線センサ |
JP4710691B2 (ja) * | 2006-03-28 | 2011-06-29 | パナソニック電工株式会社 | 赤外線センサ |
JP2011133239A (ja) * | 2009-12-22 | 2011-07-07 | Stanley Electric Co Ltd | 光強度測定装置及びその製造方法 |
JP2013519510A (ja) * | 2010-02-13 | 2013-05-30 | マクアリスター テクノロジーズ エルエルシー | 再放射面を有する化学反応器ならびにその関連システムおよび方法 |
US9103548B2 (en) | 2010-02-13 | 2015-08-11 | Mcalister Technologies, Llc | Reactors for conducting thermochemical processes with solar heat input, and associated systems and methods |
US9541284B2 (en) | 2010-02-13 | 2017-01-10 | Mcalister Technologies, Llc | Chemical reactors with annularly positioned delivery and removal devices, and associated systems and methods |
US9302681B2 (en) | 2011-08-12 | 2016-04-05 | Mcalister Technologies, Llc | Mobile transport platforms for producing hydrogen and structural materials, and associated systems and methods |
US8835208B2 (en) | 2012-04-02 | 2014-09-16 | Seiko Epson Corporation | Method for manufacturing detecting element, method for manufacturing imaging device, detecting element, imaging device, and electronic device |
CN111816754A (zh) * | 2020-09-04 | 2020-10-23 | 上海翼捷工业安全设备股份有限公司 | 热释电灵敏元的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4337530B2 (ja) | 2009-09-30 |
US20050133722A1 (en) | 2005-06-23 |
US7183551B2 (en) | 2007-02-27 |
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