JP2005166961A5 - - Google Patents
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- Publication number
- JP2005166961A5 JP2005166961A5 JP2003403918A JP2003403918A JP2005166961A5 JP 2005166961 A5 JP2005166961 A5 JP 2005166961A5 JP 2003403918 A JP2003403918 A JP 2003403918A JP 2003403918 A JP2003403918 A JP 2003403918A JP 2005166961 A5 JP2005166961 A5 JP 2005166961A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- exhaust
- inert gas
- exposure apparatus
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims 18
- 239000007789 gas Substances 0.000 claims 12
- 239000012535 impurity Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 5
- 238000005286 illumination Methods 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 4
- 238000010926 purge Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 230000003247 decreasing effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003403918A JP2005166961A (ja) | 2003-12-03 | 2003-12-03 | 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス |
| US11/001,115 US7130015B2 (en) | 2003-12-03 | 2004-12-02 | Inert-gas purge method, exposure apparatus, device fabrication method and devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003403918A JP2005166961A (ja) | 2003-12-03 | 2003-12-03 | 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005166961A JP2005166961A (ja) | 2005-06-23 |
| JP2005166961A5 true JP2005166961A5 (https=) | 2007-01-25 |
Family
ID=34631665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003403918A Pending JP2005166961A (ja) | 2003-12-03 | 2003-12-03 | 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7130015B2 (https=) |
| JP (1) | JP2005166961A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101034261B (zh) * | 2006-03-09 | 2010-08-11 | 中芯国际集成电路制造(上海)有限公司 | 防止由阻挡处理对光学元件的污染的方法和设备 |
| EP2959504B1 (en) * | 2013-02-25 | 2018-07-04 | Kla-Tencor Corporation | Method and system for gas flow mitigation of molecular contamination of optics |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3084332B2 (ja) | 1993-01-19 | 2000-09-04 | キヤノン株式会社 | 露光装置 |
| JP3531914B2 (ja) * | 2000-04-14 | 2004-05-31 | キヤノン株式会社 | 光学装置、露光装置及びデバイス製造方法 |
| JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
| JP2004186179A (ja) * | 2002-11-29 | 2004-07-02 | Canon Inc | 露光装置 |
| JP2005142382A (ja) * | 2003-11-07 | 2005-06-02 | Canon Inc | 露光装置 |
-
2003
- 2003-12-03 JP JP2003403918A patent/JP2005166961A/ja active Pending
-
2004
- 2004-12-02 US US11/001,115 patent/US7130015B2/en not_active Expired - Fee Related
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