JP2004216321A5 - - Google Patents

Download PDF

Info

Publication number
JP2004216321A5
JP2004216321A5 JP2003008875A JP2003008875A JP2004216321A5 JP 2004216321 A5 JP2004216321 A5 JP 2004216321A5 JP 2003008875 A JP2003008875 A JP 2003008875A JP 2003008875 A JP2003008875 A JP 2003008875A JP 2004216321 A5 JP2004216321 A5 JP 2004216321A5
Authority
JP
Japan
Prior art keywords
cleaned
processing chamber
cleaning
optical element
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003008875A
Other languages
English (en)
Japanese (ja)
Other versions
JP4006341B2 (ja
JP2004216321A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003008875A priority Critical patent/JP4006341B2/ja
Priority claimed from JP2003008875A external-priority patent/JP4006341B2/ja
Publication of JP2004216321A publication Critical patent/JP2004216321A/ja
Publication of JP2004216321A5 publication Critical patent/JP2004216321A5/ja
Application granted granted Critical
Publication of JP4006341B2 publication Critical patent/JP4006341B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003008875A 2003-01-16 2003-01-16 光学素子の洗浄装置及び方法 Expired - Fee Related JP4006341B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003008875A JP4006341B2 (ja) 2003-01-16 2003-01-16 光学素子の洗浄装置及び方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003008875A JP4006341B2 (ja) 2003-01-16 2003-01-16 光学素子の洗浄装置及び方法

Publications (3)

Publication Number Publication Date
JP2004216321A JP2004216321A (ja) 2004-08-05
JP2004216321A5 true JP2004216321A5 (https=) 2005-06-23
JP4006341B2 JP4006341B2 (ja) 2007-11-14

Family

ID=32898533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003008875A Expired - Fee Related JP4006341B2 (ja) 2003-01-16 2003-01-16 光学素子の洗浄装置及び方法

Country Status (1)

Country Link
JP (1) JP4006341B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8317929B2 (en) 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
JP2007109446A (ja) * 2005-10-11 2007-04-26 Sharp Corp プラズマ生成装置
KR100717505B1 (ko) * 2005-11-25 2007-05-14 동부일렉트로닉스 주식회사 노광장치의 투영 렌즈 세정장치
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
JP7009746B2 (ja) * 2017-02-15 2022-01-26 大日本印刷株式会社 Ｈａｚｅの除去方法、及びフォトマスクの製造方法
KR102054147B1 (ko) * 2019-10-21 2019-12-12 주식회사 아이엠티 테스트 장치
CN111477537B (zh) * 2020-04-07 2023-05-19 北京晶亦精微科技股份有限公司 一种晶圆清洗方法及晶圆清洗设备
CN111477539A (zh) * 2020-05-14 2020-07-31 西安奕斯伟硅片技术有限公司 硅片处理方法及装置

Similar Documents

Publication Publication Date Title
KR101689987B1 (ko) 광조사 장치
JP7504885B2 (ja) アルミニウム層をインサイチュで保護する方法及びｖｕｖ波長域用の光学装置
CN102791391A (zh) 处理基片的方法和装置
TW201202841A (en) Light processing apparatus and light processing method
US20080296258A1 (en) Plenum reactor system
JP2004216321A5 (https=)
CN113383405A (zh) 用于制造腔室部件的方法
US20020114880A1 (en) Coating of optical elements, in particular for use with ultraviolet light
KR102720152B1 (ko) 극자외선 광원 시스템에서 콜렉터의 실시간 세정 방법
JP2014007260A (ja) インプリント装置、収納ケース及び物品の製造方法
CN102512002B (zh) 一种用于真空紫外光学元件清洁和存放的紫外臭氧干燥柜
WO2018159006A1 (ja) 露光装置、基板処理装置、基板の露光方法および基板処理方法
JP2018146617A5 (https=)
JP2001077011A (ja) 半導体製造装置、その洗浄方法、および光源ユニット
JP2012204381A (ja) 樹脂除去方法および樹脂除去装置
KR101438789B1 (ko) Dlc 코팅 층을 구비한 펠리클 프레임의 제조방법
JP2001176865A (ja) 処理装置及び処理方法
TWI435166B (zh) 製造光罩之方法以及用於其實施之裝置
JP2005166963A5 (https=)
JPH06343938A (ja) 付着物の洗浄方法及びその装置
JPH0429220B2 (https=)
JP2008258240A5 (ja) 基板処理装置及び半導体装置の製造方法
JPS6075327A (ja) 紫外線発生装置及びそれを用いた材料処理装置
JPS6352411A (ja) 処理方法および装置
JPH0452992Y2 (https=)