JP2005166897A5 - - Google Patents

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Publication number
JP2005166897A5
JP2005166897A5 JP2003402900A JP2003402900A JP2005166897A5 JP 2005166897 A5 JP2005166897 A5 JP 2005166897A5 JP 2003402900 A JP2003402900 A JP 2003402900A JP 2003402900 A JP2003402900 A JP 2003402900A JP 2005166897 A5 JP2005166897 A5 JP 2005166897A5
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JP
Japan
Prior art keywords
exposure apparatus
motor
flange
space
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003402900A
Other languages
English (en)
Japanese (ja)
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JP2005166897A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003402900A priority Critical patent/JP2005166897A/ja
Priority claimed from JP2003402900A external-priority patent/JP2005166897A/ja
Priority to US10/998,736 priority patent/US7110088B2/en
Publication of JP2005166897A publication Critical patent/JP2005166897A/ja
Publication of JP2005166897A5 publication Critical patent/JP2005166897A5/ja
Pending legal-status Critical Current

Links

JP2003402900A 2003-12-02 2003-12-02 露光装置 Pending JP2005166897A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置
US10/998,736 US7110088B2 (en) 2003-12-02 2004-11-30 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Publications (2)

Publication Number Publication Date
JP2005166897A JP2005166897A (ja) 2005-06-23
JP2005166897A5 true JP2005166897A5 (enExample) 2007-01-25

Family

ID=34616763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003402900A Pending JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Country Status (2)

Country Link
US (1) US7110088B2 (enExample)
JP (1) JP2005166897A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
JP5023064B2 (ja) * 2005-09-13 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 露光工程のための光学要素ユニット
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US8467034B2 (en) * 2008-07-02 2013-06-18 Nikon Corporation Light shielding unit, variable slit apparatus, and exposure apparatus
KR101399303B1 (ko) * 2008-12-05 2014-05-26 엘지디스플레이 주식회사 평판표시장치용 노광장비

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078380A (en) 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
JP3282222B2 (ja) 1992-07-07 2002-05-13 株式会社ニコン 投影光学装置、及び該装置を用いる素子製造方法
AU2958699A (en) * 1998-03-31 1999-10-18 Nikon Corporation Optical device and exposure system equipped with optical device
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
AU2327800A (en) * 1999-02-12 2000-08-29 Nikon Corporation Exposure method and apparatus
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法

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