JP2005166897A - 露光装置 - Google Patents

露光装置 Download PDF

Info

Publication number
JP2005166897A
JP2005166897A JP2003402900A JP2003402900A JP2005166897A JP 2005166897 A JP2005166897 A JP 2005166897A JP 2003402900 A JP2003402900 A JP 2003402900A JP 2003402900 A JP2003402900 A JP 2003402900A JP 2005166897 A JP2005166897 A JP 2005166897A
Authority
JP
Japan
Prior art keywords
exposure apparatus
space
motor
housing
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003402900A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005166897A5 (enExample
Inventor
Yasuteru Tominaga
泰輝 冨永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003402900A priority Critical patent/JP2005166897A/ja
Priority to US10/998,736 priority patent/US7110088B2/en
Publication of JP2005166897A publication Critical patent/JP2005166897A/ja
Publication of JP2005166897A5 publication Critical patent/JP2005166897A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003402900A 2003-12-02 2003-12-02 露光装置 Pending JP2005166897A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置
US10/998,736 US7110088B2 (en) 2003-12-02 2004-11-30 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Publications (2)

Publication Number Publication Date
JP2005166897A true JP2005166897A (ja) 2005-06-23
JP2005166897A5 JP2005166897A5 (enExample) 2007-01-25

Family

ID=34616763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003402900A Pending JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Country Status (2)

Country Link
US (1) US7110088B2 (enExample)
JP (1) JP2005166897A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010501997A (ja) * 2005-09-13 2010-01-21 カール・ツァイス・エスエムティー・アーゲー 露光工程のための光学要素ユニット

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US8467034B2 (en) * 2008-07-02 2013-06-18 Nikon Corporation Light shielding unit, variable slit apparatus, and exposure apparatus
KR101399303B1 (ko) * 2008-12-05 2014-05-26 엘지디스플레이 주식회사 평판표시장치용 노광장비

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078380A (en) 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
JP3282222B2 (ja) 1992-07-07 2002-05-13 株式会社ニコン 投影光学装置、及び該装置を用いる素子製造方法
AU2958699A (en) * 1998-03-31 1999-10-18 Nikon Corporation Optical device and exposure system equipped with optical device
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
AU2327800A (en) * 1999-02-12 2000-08-29 Nikon Corporation Exposure method and apparatus
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010501997A (ja) * 2005-09-13 2010-01-21 カール・ツァイス・エスエムティー・アーゲー 露光工程のための光学要素ユニット

Also Published As

Publication number Publication date
US7110088B2 (en) 2006-09-19
US20050117136A1 (en) 2005-06-02

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