JP2005141213A5 - - Google Patents
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- Publication number
- JP2005141213A5 JP2005141213A5 JP2004315625A JP2004315625A JP2005141213A5 JP 2005141213 A5 JP2005141213 A5 JP 2005141213A5 JP 2004315625 A JP2004315625 A JP 2004315625A JP 2004315625 A JP2004315625 A JP 2004315625A JP 2005141213 A5 JP2005141213 A5 JP 2005141213A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- display device
- planarization
- thickness
- wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 20
- 238000002161 passivation Methods 0.000 claims 14
- 239000011229 interlayer Substances 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 9
- 239000010410 layer Substances 0.000 claims 6
- 239000004925 Acrylic resin Substances 0.000 claims 4
- 229920000178 Acrylic resin Polymers 0.000 claims 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 4
- 229910052782 aluminium Inorganic materials 0.000 claims 4
- 230000015572 biosynthetic process Effects 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 229920001721 polyimide Polymers 0.000 claims 4
- 239000009719 polyimide resin Substances 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 4
- -1 siloxane structure Chemical group 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 229910052719 titanium Inorganic materials 0.000 claims 4
- 239000010936 titanium Substances 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004315625A JP4963158B2 (ja) | 2000-01-25 | 2004-10-29 | 表示装置の作製方法、電気光学装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000016309 | 2000-01-25 | ||
| JP2000016309 | 2000-01-25 | ||
| JP2004315625A JP4963158B2 (ja) | 2000-01-25 | 2004-10-29 | 表示装置の作製方法、電気光学装置の作製方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001013099A Division JP2001284342A (ja) | 2000-01-25 | 2001-01-22 | 電気光学装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005141213A JP2005141213A (ja) | 2005-06-02 |
| JP2005141213A5 true JP2005141213A5 (enExample) | 2008-02-14 |
| JP4963158B2 JP4963158B2 (ja) | 2012-06-27 |
Family
ID=34702630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004315625A Expired - Lifetime JP4963158B2 (ja) | 2000-01-25 | 2004-10-29 | 表示装置の作製方法、電気光学装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4963158B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4438790B2 (ja) | 2006-11-17 | 2010-03-24 | ソニー株式会社 | 画素回路および表示装置、並びに画素回路の製造方法 |
| KR102717808B1 (ko) | 2016-11-30 | 2024-10-15 | 엘지디스플레이 주식회사 | 두 개의 전극들 사이에 위치하는 다수의 절연막들을 포함하는 디스플레이 장치 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3663759B2 (ja) * | 1996-08-06 | 2005-06-22 | 東レ株式会社 | 液晶表示装置の製造方法および液晶表示装置 |
| JP4086925B2 (ja) * | 1996-12-27 | 2008-05-14 | 株式会社半導体エネルギー研究所 | アクティブマトリクスディスプレイ |
| JP3580092B2 (ja) * | 1997-08-21 | 2004-10-20 | セイコーエプソン株式会社 | アクティブマトリクス型表示装置 |
| JPH11133457A (ja) * | 1997-10-24 | 1999-05-21 | Canon Inc | マトリクス基板と表示装置及びその製造方法及び投写型液晶表示装置 |
| JP3022443B2 (ja) * | 1997-11-05 | 2000-03-21 | 日本電気株式会社 | 半導体デバイスおよびその製造方法 |
| JP4014710B2 (ja) * | 1997-11-28 | 2007-11-28 | 株式会社半導体エネルギー研究所 | 液晶表示装置 |
| JPH11177105A (ja) * | 1997-12-15 | 1999-07-02 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| JPH11297972A (ja) * | 1998-04-10 | 1999-10-29 | Fujitsu Ltd | 半導体装置の製造方法 |
| JP3230664B2 (ja) * | 1998-04-23 | 2001-11-19 | 日本電気株式会社 | 液晶表示装置とその製造方法 |
-
2004
- 2004-10-29 JP JP2004315625A patent/JP4963158B2/ja not_active Expired - Lifetime
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