JP4963158B2 - 表示装置の作製方法、電気光学装置の作製方法 - Google Patents

表示装置の作製方法、電気光学装置の作製方法 Download PDF

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Publication number
JP4963158B2
JP4963158B2 JP2004315625A JP2004315625A JP4963158B2 JP 4963158 B2 JP4963158 B2 JP 4963158B2 JP 2004315625 A JP2004315625 A JP 2004315625A JP 2004315625 A JP2004315625 A JP 2004315625A JP 4963158 B2 JP4963158 B2 JP 4963158B2
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film
thickness
display device
planarizing
manufacturing
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Japanese (ja)
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JP2005141213A (ja
JP2005141213A5 (enExample
Inventor
里築子 長尾
智史 村上
美佐子 仲沢
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2005141213A5 publication Critical patent/JP2005141213A5/ja
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
JP2004315625A 2000-01-25 2004-10-29 表示装置の作製方法、電気光学装置の作製方法 Expired - Lifetime JP4963158B2 (ja)

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JP2004315625A JP4963158B2 (ja) 2000-01-25 2004-10-29 表示装置の作製方法、電気光学装置の作製方法

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JP2000016309 2000-01-25
JP2000016309 2000-01-25
JP2004315625A JP4963158B2 (ja) 2000-01-25 2004-10-29 表示装置の作製方法、電気光学装置の作製方法

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JP2001013099A Division JP2001284342A (ja) 2000-01-25 2001-01-22 電気光学装置の作製方法

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JP2005141213A JP2005141213A (ja) 2005-06-02
JP2005141213A5 JP2005141213A5 (enExample) 2008-02-14
JP4963158B2 true JP4963158B2 (ja) 2012-06-27

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4438790B2 (ja) 2006-11-17 2010-03-24 ソニー株式会社 画素回路および表示装置、並びに画素回路の製造方法
KR102717808B1 (ko) 2016-11-30 2024-10-15 엘지디스플레이 주식회사 두 개의 전극들 사이에 위치하는 다수의 절연막들을 포함하는 디스플레이 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3663759B2 (ja) * 1996-08-06 2005-06-22 東レ株式会社 液晶表示装置の製造方法および液晶表示装置
JP4086925B2 (ja) * 1996-12-27 2008-05-14 株式会社半導体エネルギー研究所 アクティブマトリクスディスプレイ
JP3580092B2 (ja) * 1997-08-21 2004-10-20 セイコーエプソン株式会社 アクティブマトリクス型表示装置
JPH11133457A (ja) * 1997-10-24 1999-05-21 Canon Inc マトリクス基板と表示装置及びその製造方法及び投写型液晶表示装置
JP3022443B2 (ja) * 1997-11-05 2000-03-21 日本電気株式会社 半導体デバイスおよびその製造方法
JP4014710B2 (ja) * 1997-11-28 2007-11-28 株式会社半導体エネルギー研究所 液晶表示装置
JPH11177105A (ja) * 1997-12-15 1999-07-02 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JPH11297972A (ja) * 1998-04-10 1999-10-29 Fujitsu Ltd 半導体装置の製造方法
JP3230664B2 (ja) * 1998-04-23 2001-11-19 日本電気株式会社 液晶表示装置とその製造方法

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