JP2005101512A - 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子、液体噴射ヘッド、プリンタ及び強誘電体膜の製造方法 - Google Patents
強誘電体膜、強誘電体メモリ、圧電素子、半導体素子、液体噴射ヘッド、プリンタ及び強誘電体膜の製造方法 Download PDFInfo
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- JP2005101512A JP2005101512A JP2004105295A JP2004105295A JP2005101512A JP 2005101512 A JP2005101512 A JP 2005101512A JP 2004105295 A JP2004105295 A JP 2004105295A JP 2004105295 A JP2004105295 A JP 2004105295A JP 2005101512 A JP2005101512 A JP 2005101512A
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- ferroelectric
- ferroelectric film
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- Semiconductor Memories (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Inorganic Insulating Materials (AREA)
- Insulating Bodies (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Coating Apparatus (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004105295A JP2005101512A (ja) | 2002-10-24 | 2004-03-31 | 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子、液体噴射ヘッド、プリンタ及び強誘電体膜の製造方法 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002309487 | 2002-10-24 | ||
| JP2003076129 | 2003-03-19 | ||
| JP2003294072 | 2003-08-18 | ||
| JP2004105295A JP2005101512A (ja) | 2002-10-24 | 2004-03-31 | 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子、液体噴射ヘッド、プリンタ及び強誘電体膜の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003302900A Division JP3791614B2 (ja) | 2002-10-24 | 2003-08-27 | 強誘電体膜、強誘電体メモリ装置、圧電素子、半導体素子、圧電アクチュエータ、液体噴射ヘッド及びプリンタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005101512A true JP2005101512A (ja) | 2005-04-14 |
| JP2005101512A5 JP2005101512A5 (enExample) | 2006-10-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2004105295A Pending JP2005101512A (ja) | 2002-10-24 | 2004-03-31 | 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子、液体噴射ヘッド、プリンタ及び強誘電体膜の製造方法 |
| JP2006007343A Expired - Fee Related JP4735834B2 (ja) | 2002-10-24 | 2006-01-16 | 強誘電体キャパシタの製造方法、強誘電体メモリの製造方法、圧電素子の製造方法、圧電アクチュエータの製造方法、及び液体噴射ヘッドの製造方法 |
| JP2006007342A Withdrawn JP2006188427A (ja) | 2002-10-24 | 2006-01-16 | 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子及び強誘電体膜の製造方法 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2006007343A Expired - Fee Related JP4735834B2 (ja) | 2002-10-24 | 2006-01-16 | 強誘電体キャパシタの製造方法、強誘電体メモリの製造方法、圧電素子の製造方法、圧電アクチュエータの製造方法、及び液体噴射ヘッドの製造方法 |
| JP2006007342A Withdrawn JP2006188427A (ja) | 2002-10-24 | 2006-01-16 | 強誘電体膜、強誘電体メモリ、圧電素子、半導体素子及び強誘電体膜の製造方法 |
Country Status (1)
| Country | Link |
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| JP (3) | JP2005101512A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7371473B2 (en) * | 2002-10-24 | 2008-05-13 | Seiko Epson Corporation | Ferroelectric film, ferroelectric capacitor, ferroelectric memory, piezoelectric element, semiconductor element, method of manufacturing ferroelectric film, and method of manufacturing ferroelectric capacitor |
| EP2034535A2 (en) | 2007-09-07 | 2009-03-11 | FUJIFILM Corporation | Piezoelectric device, liquid droplet ejecting head using the same, and process for producing the same |
| JP2010187003A (ja) * | 2010-03-08 | 2010-08-26 | Seiko Epson Corp | 前駆体組成物および圧電素子の製造方法 |
| US8100513B2 (en) | 2007-03-22 | 2012-01-24 | Fujifilm Corporation | Ferroelectric film, process for producing the same, ferroelectric device, and liquid discharge device |
| WO2016031134A1 (ja) * | 2014-08-29 | 2016-03-03 | 富士フイルム株式会社 | 圧電体膜とその製造方法、圧電素子、及び液体吐出装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008149525A (ja) | 2006-12-15 | 2008-07-03 | Fuji Xerox Co Ltd | 画像形成装置 |
| JP5157157B2 (ja) * | 2006-12-22 | 2013-03-06 | セイコーエプソン株式会社 | アクチュエータ装置及びその製造方法並びにその駆動方法、液体噴射ヘッド |
| US8437174B2 (en) | 2010-02-15 | 2013-05-07 | Micron Technology, Inc. | Memcapacitor devices, field effect transistor devices, non-volatile memory arrays, and methods of programming |
| US8416609B2 (en) | 2010-02-15 | 2013-04-09 | Micron Technology, Inc. | Cross-point memory cells, non-volatile memory arrays, methods of reading a memory cell, methods of programming a memory cell, methods of writing to and reading from a memory cell, and computer systems |
| US8634224B2 (en) | 2010-08-12 | 2014-01-21 | Micron Technology, Inc. | Memory cells, non-volatile memory arrays, methods of operating memory cells, methods of writing to and reading from a memory cell, and methods of programming a memory cell |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06215625A (ja) * | 1993-01-14 | 1994-08-05 | Tdk Corp | 誘電体材料 |
| JPH06318405A (ja) * | 1993-03-12 | 1994-11-15 | Sumitomo Chem Co Ltd | 誘電体組成物とその製造方法および薄膜コンデンサ |
| JPH11121696A (ja) * | 1997-10-20 | 1999-04-30 | Sony Corp | 誘電体キャパシタの製造方法および半導体記憶装置の製造方法 |
| JP2001213625A (ja) * | 2000-01-27 | 2001-08-07 | Seiko Epson Corp | チタン酸ジルコン酸鉛薄膜の製造方法及びそれを用いた薄膜デバイス |
-
2004
- 2004-03-31 JP JP2004105295A patent/JP2005101512A/ja active Pending
-
2006
- 2006-01-16 JP JP2006007343A patent/JP4735834B2/ja not_active Expired - Fee Related
- 2006-01-16 JP JP2006007342A patent/JP2006188427A/ja not_active Withdrawn
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7371473B2 (en) * | 2002-10-24 | 2008-05-13 | Seiko Epson Corporation | Ferroelectric film, ferroelectric capacitor, ferroelectric memory, piezoelectric element, semiconductor element, method of manufacturing ferroelectric film, and method of manufacturing ferroelectric capacitor |
| US8100513B2 (en) | 2007-03-22 | 2012-01-24 | Fujifilm Corporation | Ferroelectric film, process for producing the same, ferroelectric device, and liquid discharge device |
| EP2034535A2 (en) | 2007-09-07 | 2009-03-11 | FUJIFILM Corporation | Piezoelectric device, liquid droplet ejecting head using the same, and process for producing the same |
| JP2010187003A (ja) * | 2010-03-08 | 2010-08-26 | Seiko Epson Corp | 前駆体組成物および圧電素子の製造方法 |
| WO2016031134A1 (ja) * | 2014-08-29 | 2016-03-03 | 富士フイルム株式会社 | 圧電体膜とその製造方法、圧電素子、及び液体吐出装置 |
| JPWO2016031134A1 (ja) * | 2014-08-29 | 2017-06-15 | 富士フイルム株式会社 | 圧電体膜とその製造方法、圧電素子、及び液体吐出装置 |
| US10011111B2 (en) | 2014-08-29 | 2018-07-03 | Fujifilm Corporation | Piezoelectric film, production method thereof, piezoelectric element, and liquid discharge apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006188427A (ja) | 2006-07-20 |
| JP2006182642A (ja) | 2006-07-13 |
| JP4735834B2 (ja) | 2011-07-27 |
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