JP2005093697A5 - - Google Patents

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Publication number
JP2005093697A5
JP2005093697A5 JP2003324689A JP2003324689A JP2005093697A5 JP 2005093697 A5 JP2005093697 A5 JP 2005093697A5 JP 2003324689 A JP2003324689 A JP 2003324689A JP 2003324689 A JP2003324689 A JP 2003324689A JP 2005093697 A5 JP2005093697 A5 JP 2005093697A5
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JP
Japan
Prior art keywords
pellicle
light
reflected light
exposure apparatus
optical system
Prior art date
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Application number
JP2003324689A
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English (en)
Japanese (ja)
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JP2005093697A (ja
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Priority to JP2003324689A priority Critical patent/JP2005093697A/ja
Priority claimed from JP2003324689A external-priority patent/JP2005093697A/ja
Publication of JP2005093697A publication Critical patent/JP2005093697A/ja
Publication of JP2005093697A5 publication Critical patent/JP2005093697A5/ja
Withdrawn legal-status Critical Current

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JP2003324689A 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法 Withdrawn JP2005093697A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003324689A JP2005093697A (ja) 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003324689A JP2005093697A (ja) 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法

Publications (2)

Publication Number Publication Date
JP2005093697A JP2005093697A (ja) 2005-04-07
JP2005093697A5 true JP2005093697A5 (enExample) 2006-11-02

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ID=34455372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003324689A Withdrawn JP2005093697A (ja) 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法

Country Status (1)

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JP (1) JP2005093697A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101258387A (zh) * 2005-07-05 2008-09-03 马特森技术公司 确定半导体晶片的光学属性的方法与系统
FR2908674A1 (fr) * 2007-01-29 2008-05-23 Alcatel Sa Dispositif de nettoyage et de depollution d'un objet a environnement confine non etanche limite par une paroi a membrane souple
EP1925909A1 (fr) * 2006-11-21 2008-05-28 Alcatel Lucent Dispositif de nettoyage et de dépollution d'un objet à environnement confiné non étanche limité par une paroi à membrane souple
FR2908875B1 (fr) * 2006-11-21 2009-06-12 Alcatel Sa Dispositif de mesure sans contact de la deformation d'une membrane, et applications
JP2009031169A (ja) * 2007-07-28 2009-02-12 Nikon Corp 位置検出装置、露光装置、及びデバイスの製造方法
FR2954583B1 (fr) 2009-12-18 2017-11-24 Alcatel Lucent Procede et dispositif de pilotage de fabrication de semi conducteurs par mesure de contamination
FR2961946B1 (fr) 2010-06-29 2012-08-03 Alcatel Lucent Dispositif de traitement pour boites de transport et de stockage
WO2016169727A1 (en) * 2015-04-23 2016-10-27 Asml Netherlands B.V. Lithographic apparatus and lithographic projection method
CN114442422A (zh) * 2020-11-05 2022-05-06 中国科学院微电子研究所 图形失真的补偿方法及光刻曝光的方法

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