JP2005093697A - 面位置検出装置及び方法、露光装置並びに収差補正方法 - Google Patents

面位置検出装置及び方法、露光装置並びに収差補正方法 Download PDF

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Publication number
JP2005093697A
JP2005093697A JP2003324689A JP2003324689A JP2005093697A JP 2005093697 A JP2005093697 A JP 2005093697A JP 2003324689 A JP2003324689 A JP 2003324689A JP 2003324689 A JP2003324689 A JP 2003324689A JP 2005093697 A JP2005093697 A JP 2005093697A
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Japan
Prior art keywords
pellicle
light
detection
reticle
reflected light
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Withdrawn
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JP2003324689A
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Japanese (ja)
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JP2005093697A5 (enExample
Inventor
Hiroshi Inada
博志 稲田
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Canon Inc
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Canon Inc
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Priority to JP2003324689A priority Critical patent/JP2005093697A/ja
Publication of JP2005093697A publication Critical patent/JP2005093697A/ja
Publication of JP2005093697A5 publication Critical patent/JP2005093697A5/ja
Withdrawn legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003324689A 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法 Withdrawn JP2005093697A (ja)

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JP2003324689A JP2005093697A (ja) 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法

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JP2003324689A JP2005093697A (ja) 2003-09-17 2003-09-17 面位置検出装置及び方法、露光装置並びに収差補正方法

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JP2005093697A true JP2005093697A (ja) 2005-04-07
JP2005093697A5 JP2005093697A5 (enExample) 2006-11-02

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2908674A1 (fr) * 2007-01-29 2008-05-23 Alcatel Sa Dispositif de nettoyage et de depollution d'un objet a environnement confine non etanche limite par une paroi a membrane souple
FR2908875A1 (fr) * 2006-11-21 2008-05-23 Alcatel Sa Dispositif de mesure sans contact de la deformation d'une membrane, et applications
EP1925909A1 (fr) * 2006-11-21 2008-05-28 Alcatel Lucent Dispositif de nettoyage et de dépollution d'un objet à environnement confiné non étanche limité par une paroi à membrane souple
JP2009500851A (ja) * 2005-07-05 2009-01-08 マットソン テクノロジー インコーポレイテッド 半導体ウェハの光学的特性を求めるための方法およびシステム
JP2009031169A (ja) * 2007-07-28 2009-02-12 Nikon Corp 位置検出装置、露光装置、及びデバイスの製造方法
US9403196B2 (en) 2010-06-29 2016-08-02 Adixen Vacuum Products Treatment device for transport and storage boxes
US9779972B2 (en) 2009-12-18 2017-10-03 Adixen Vacuum Products Method and device for controlling the manufacture of semiconductor by measuring contamination
JP2018513410A (ja) * 2015-04-23 2018-05-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ投影方法
CN114442422A (zh) * 2020-11-05 2022-05-06 中国科学院微电子研究所 图形失真的补偿方法及光刻曝光的方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009500851A (ja) * 2005-07-05 2009-01-08 マットソン テクノロジー インコーポレイテッド 半導体ウェハの光学的特性を求めるための方法およびシステム
FR2908875A1 (fr) * 2006-11-21 2008-05-23 Alcatel Sa Dispositif de mesure sans contact de la deformation d'une membrane, et applications
EP1925909A1 (fr) * 2006-11-21 2008-05-28 Alcatel Lucent Dispositif de nettoyage et de dépollution d'un objet à environnement confiné non étanche limité par une paroi à membrane souple
FR2908674A1 (fr) * 2007-01-29 2008-05-23 Alcatel Sa Dispositif de nettoyage et de depollution d'un objet a environnement confine non etanche limite par une paroi a membrane souple
JP2009031169A (ja) * 2007-07-28 2009-02-12 Nikon Corp 位置検出装置、露光装置、及びデバイスの製造方法
US9779972B2 (en) 2009-12-18 2017-10-03 Adixen Vacuum Products Method and device for controlling the manufacture of semiconductor by measuring contamination
US9403196B2 (en) 2010-06-29 2016-08-02 Adixen Vacuum Products Treatment device for transport and storage boxes
JP2018513410A (ja) * 2015-04-23 2018-05-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ投影方法
CN114442422A (zh) * 2020-11-05 2022-05-06 中国科学院微电子研究所 图形失真的补偿方法及光刻曝光的方法

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