JP2005075697A - マイクロ波吸収発熱セラミックス - Google Patents
マイクロ波吸収発熱セラミックス Download PDFInfo
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- JP2005075697A JP2005075697A JP2003309910A JP2003309910A JP2005075697A JP 2005075697 A JP2005075697 A JP 2005075697A JP 2003309910 A JP2003309910 A JP 2003309910A JP 2003309910 A JP2003309910 A JP 2003309910A JP 2005075697 A JP2005075697 A JP 2005075697A
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- ceramic
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- 239000000919 ceramic Substances 0.000 title claims abstract description 37
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 31
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052742 iron Inorganic materials 0.000 claims abstract description 14
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims abstract description 9
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000010304 firing Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910052604 silicate mineral Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 15
- 238000010438 heat treatment Methods 0.000 abstract description 14
- 230000000694 effects Effects 0.000 abstract description 8
- 238000000151 deposition Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000002994 raw material Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 5
- 235000013980 iron oxide Nutrition 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 5
- 229910010271 silicon carbide Inorganic materials 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 4
- 239000004071 soot Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000002734 clay mineral Substances 0.000 description 3
- 150000002506 iron compounds Chemical class 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- -1 but recently Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052840 fayalite Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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Abstract
【解決手段】セラミックス素地に、鉄元素を酸化第二鉄換算で80重量%以上含む釉薬を施し、焼成によって金属鉄およびマグネタイトもしくはその両方を釉薬層中に析出せしめることにより、マイクロ波吸収発熱効果の高いセラミックスを得る。
【選択図】図1
Description
はガラス中に担持され酸化されないので、発熱機能は長期的に持続し、しかもセラミック基材と釉層の間に焼成過程で必然的に形成される中間層が熱ストレスを緩和するために、剥離や割れを生じにくい効果を発揮する。
2 金属鉄
3 マグネタイト
4 セラミックス基材(素地)
5 中間層
Claims (2)
- 焼成によって、釉薬層中または釉薬表面もしくはセラミックス基材表面に、金属鉄の結晶とマグネタイトあるいはその一方を生成せしめた構造であることを特徴とする、マイクロ波吸収発熱セラミックス。
- 鉄の含有量が、酸化第二鉄換算の重量で80%以上含まれる釉薬を、ケイ酸塩鉱物を含むセラミックス基材の表面に施した後、1150℃以上の温度で還元焼成を行い、最高温度に達した後の冷却過程においても還元雰囲気を保持することを特徴とする、請求項1に記載のマイクロ波吸収発熱セラミックスの製造方法。
Priority Applications (1)
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JP2003309910A JP4273227B2 (ja) | 2003-09-02 | 2003-09-02 | マイクロ波発熱体の製造方法 |
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JP2003309910A JP4273227B2 (ja) | 2003-09-02 | 2003-09-02 | マイクロ波発熱体の製造方法 |
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JP2005075697A true JP2005075697A (ja) | 2005-03-24 |
JP4273227B2 JP4273227B2 (ja) | 2009-06-03 |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100918965B1 (ko) * | 2009-04-06 | 2009-09-25 | 주식회사 유엔아이텍 | 발열 법랑 유약 및 이에 도포된 발열 용기 |
JP2012025618A (ja) * | 2010-07-23 | 2012-02-09 | Noritake Co Ltd | 白磁用鉄結晶窯変調転写紙および結晶窯変調模様を有する陶磁器 |
JP2012115523A (ja) * | 2010-12-01 | 2012-06-21 | Nagatani Seito Kk | 電子レンジ用陶磁製調理器 |
JP2012162404A (ja) * | 2011-02-03 | 2012-08-30 | Mie Prefecture | マイクロ波吸収・自己発熱性耐熱陶磁器およびその製造方法 |
JP2012218970A (ja) * | 2011-04-07 | 2012-11-12 | Hanwa Hooroo Kk | 発熱琺瑯釉薬、加熱電磁加熱装置及び発熱琺瑯製品 |
JP2013110095A (ja) * | 2011-10-27 | 2013-06-06 | Jfe Chemical Corp | マイクロ波吸収発熱体用粉末の製造方法およびマイクロ波吸収発熱体用粉末ならびにその粉末を用いたマイクロ波吸収発熱体 |
US20150282258A1 (en) * | 2010-10-07 | 2015-10-01 | Jong Peter Park | Microwaveable vessel |
KR101906155B1 (ko) | 2016-12-09 | 2018-12-05 | 한국세라믹기술원 | 전자파 흡수 특성을 가지는 도자타일 및 그 제조방법 |
US10405695B2 (en) * | 2016-07-11 | 2019-09-10 | Josiah D. Smith | Thermodynamic element for reducing cooling rate of a liquid |
JP2019527811A (ja) * | 2016-08-03 | 2019-10-03 | ショット ジェムトロン コーポレイションSCHOTT Gemtron Corporation | 電磁放射を吸収しかつ熱放射を放出する誘電的にコーティングされたガラス基板を有するオーブン |
-
2003
- 2003-09-02 JP JP2003309910A patent/JP4273227B2/ja not_active Expired - Fee Related
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102548920A (zh) * | 2009-04-06 | 2012-07-04 | 你和我技术有限公司 | 发热珐琅釉料及涂布它的发热容器 |
WO2010117137A2 (ko) * | 2009-04-06 | 2010-10-14 | (주)유엔아이텍 | 발열 법랑 유약 및 이에 도포된 발열 용기 |
WO2010117137A3 (ko) * | 2009-04-06 | 2010-12-02 | (주)유엔아이텍 | 발열 법랑 유약 및 이에 도포된 발열 용기 |
KR100918965B1 (ko) * | 2009-04-06 | 2009-09-25 | 주식회사 유엔아이텍 | 발열 법랑 유약 및 이에 도포된 발열 용기 |
JP2012025618A (ja) * | 2010-07-23 | 2012-02-09 | Noritake Co Ltd | 白磁用鉄結晶窯変調転写紙および結晶窯変調模様を有する陶磁器 |
US20150282258A1 (en) * | 2010-10-07 | 2015-10-01 | Jong Peter Park | Microwaveable vessel |
US10098190B2 (en) * | 2010-10-07 | 2018-10-09 | Jong Peter Park | Microwaveable vessel |
JP2012115523A (ja) * | 2010-12-01 | 2012-06-21 | Nagatani Seito Kk | 電子レンジ用陶磁製調理器 |
JP2012162404A (ja) * | 2011-02-03 | 2012-08-30 | Mie Prefecture | マイクロ波吸収・自己発熱性耐熱陶磁器およびその製造方法 |
JP2012218970A (ja) * | 2011-04-07 | 2012-11-12 | Hanwa Hooroo Kk | 発熱琺瑯釉薬、加熱電磁加熱装置及び発熱琺瑯製品 |
JP2013110095A (ja) * | 2011-10-27 | 2013-06-06 | Jfe Chemical Corp | マイクロ波吸収発熱体用粉末の製造方法およびマイクロ波吸収発熱体用粉末ならびにその粉末を用いたマイクロ波吸収発熱体 |
US10405695B2 (en) * | 2016-07-11 | 2019-09-10 | Josiah D. Smith | Thermodynamic element for reducing cooling rate of a liquid |
JP2019527811A (ja) * | 2016-08-03 | 2019-10-03 | ショット ジェムトロン コーポレイションSCHOTT Gemtron Corporation | 電磁放射を吸収しかつ熱放射を放出する誘電的にコーティングされたガラス基板を有するオーブン |
US11268704B2 (en) | 2016-08-03 | 2022-03-08 | Schott Ag | Oven having a dielectrically coated glass substrate that absorbs electromagnetic radiation and emits heat radiation into the oven cavity |
KR101906155B1 (ko) | 2016-12-09 | 2018-12-05 | 한국세라믹기술원 | 전자파 흡수 특성을 가지는 도자타일 및 그 제조방법 |
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