JP2005064315A5 - - Google Patents
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- Publication number
- JP2005064315A5 JP2005064315A5 JP2003294215A JP2003294215A JP2005064315A5 JP 2005064315 A5 JP2005064315 A5 JP 2005064315A5 JP 2003294215 A JP2003294215 A JP 2003294215A JP 2003294215 A JP2003294215 A JP 2003294215A JP 2005064315 A5 JP2005064315 A5 JP 2005064315A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- film
- electrode layer
- insulating film
- aluminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 4
- 150000004645 aluminates Chemical class 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 239000013078 crystal Substances 0.000 claims 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003294215A JP2005064315A (ja) | 2003-08-18 | 2003-08-18 | 半導体装置および半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003294215A JP2005064315A (ja) | 2003-08-18 | 2003-08-18 | 半導体装置および半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005064315A JP2005064315A (ja) | 2005-03-10 |
| JP2005064315A5 true JP2005064315A5 (enExample) | 2006-08-24 |
Family
ID=34370837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003294215A Pending JP2005064315A (ja) | 2003-08-18 | 2003-08-18 | 半導体装置および半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005064315A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005277318A (ja) * | 2004-03-26 | 2005-10-06 | Semiconductor Leading Edge Technologies Inc | 高誘電体薄膜を備えた半導体装置及びその製造方法 |
| JP5034332B2 (ja) * | 2006-06-14 | 2012-09-26 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
-
2003
- 2003-08-18 JP JP2003294215A patent/JP2005064315A/ja active Pending
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