JP2004528718A5 - - Google Patents

Download PDF

Info

Publication number
JP2004528718A5
JP2004528718A5 JP2002590465A JP2002590465A JP2004528718A5 JP 2004528718 A5 JP2004528718 A5 JP 2004528718A5 JP 2002590465 A JP2002590465 A JP 2002590465A JP 2002590465 A JP2002590465 A JP 2002590465A JP 2004528718 A5 JP2004528718 A5 JP 2004528718A5
Authority
JP
Japan
Prior art keywords
laser
pulse
discharge region
optical instrument
module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002590465A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004528718A (ja
Filing date
Publication date
Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Application filed filed Critical
Publication of JP2004528718A publication Critical patent/JP2004528718A/ja
Publication of JP2004528718A5 publication Critical patent/JP2004528718A5/ja
Pending legal-status Critical Current

Links

JP2002590465A 2001-05-11 2002-04-17 ビーム経路を改善したガス放電レーザ Pending JP2004528718A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
PCT/US2002/012200 WO2002093702A1 (en) 2001-05-11 2002-04-17 Gas discharge laser with improved beam path

Publications (2)

Publication Number Publication Date
JP2004528718A JP2004528718A (ja) 2004-09-16
JP2004528718A5 true JP2004528718A5 (cg-RX-API-DMAC10.html) 2006-01-05

Family

ID=26668392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002590465A Pending JP2004528718A (ja) 2001-05-11 2002-04-17 ビーム経路を改善したガス放電レーザ

Country Status (5)

Country Link
US (1) US6795474B2 (cg-RX-API-DMAC10.html)
EP (1) EP1386377A4 (cg-RX-API-DMAC10.html)
JP (1) JP2004528718A (cg-RX-API-DMAC10.html)
TW (1) TW557617B (cg-RX-API-DMAC10.html)
WO (1) WO2002093702A1 (cg-RX-API-DMAC10.html)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US20020127497A1 (en) * 1998-09-10 2002-09-12 Brown Daniel J. W. Large diffraction grating for gas discharge laser
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
TW567400B (en) * 2000-11-23 2003-12-21 Asml Netherlands Bv Lithographic projection apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured by the manufacturing method
US20050025882A1 (en) * 2001-01-29 2005-02-03 Partlo William N. Optical elements with protective undercoating
US6801562B2 (en) * 2001-03-02 2004-10-05 Corning Incorporated High repetition rate excimer laser system
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7079564B2 (en) 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US6963595B2 (en) 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US6714580B2 (en) * 2001-12-05 2004-03-30 Honeywell International Inc. Current control biasing to protect electrode seals
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
JP3773858B2 (ja) * 2002-01-30 2006-05-10 株式会社小松製作所 注入同期式又はｍｏｐａ方式のガスレーザ装置
WO2003069739A1 (en) * 2002-02-13 2003-08-21 Corning Incorporated High repetition rate excimer laser system
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7277188B2 (en) 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
WO2007064947A2 (en) * 2005-12-01 2007-06-07 Electro Scientific Industries, Inc. Optical component cleanliness and debris management in laser micromachining applications
US7720120B2 (en) 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
DE102012205308B4 (de) * 2012-03-30 2018-05-30 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Vorrichtung zur Verstärkung eines Laserstrahls
JP6170928B2 (ja) * 2012-09-18 2017-07-26 ギガフォトン株式会社 スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置
WO2017158694A1 (ja) 2016-03-14 2017-09-21 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
WO2020170350A1 (ja) * 2019-02-20 2020-08-27 ギガフォトン株式会社 ガスレーザ装置、ガスレーザ装置のレーザ光の出射方法、及び電子デバイスの製造方法
CN113199289B (zh) * 2021-03-31 2022-03-15 成都飞机工业（集团）有限责任公司 一种卧式柔性生产线工作台与机床互换精度调整方法

Family Cites Families (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3593189A (en) * 1969-02-27 1971-07-13 Gen Telephone & Elect Frequency stabilization system
GB1256398A (en) * 1969-09-26 1971-12-08 Elliott Brothers London Ltd Improvements in or relating to gas lasers
US4223279A (en) * 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4455658A (en) * 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US4575853A (en) * 1983-12-30 1986-03-11 Jako Geza J Sealed laser
US4883352A (en) * 1984-06-21 1989-11-28 American Telephone And Telegraph Company Deep-uv lithography
US4679204A (en) * 1985-12-31 1987-07-07 Amada Engineering Service Co., Inc. Rear mirror holder device for a laser generator
US4697270A (en) * 1986-08-27 1987-09-29 The United States Of America As Represented By The United States Department Of Energy Copper vapor laser acoustic thermometry system
US4940331A (en) * 1986-09-24 1990-07-10 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US4798467A (en) * 1986-09-24 1989-01-17 The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US5189678A (en) * 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US5315611A (en) * 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US4817101A (en) * 1986-09-26 1989-03-28 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser spectroscopy system
DE3891284T1 (de) * 1987-07-17 1990-04-26 Komatsu Mfg Co Ltd Laserwellenlaengen-regelvorrichtung
US4823354A (en) * 1987-12-15 1989-04-18 Lumonics Inc. Excimer lasers
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5023884A (en) * 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5025446A (en) * 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US4881231A (en) * 1988-11-28 1989-11-14 Kantilal Jain Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
IL91240A (en) * 1989-08-07 1994-07-31 Quick Tech Ltd Pulsed laser apparatus and systems and techniques for its operation
US5025445A (en) * 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US4977566A (en) * 1990-02-02 1990-12-11 Spectra-Physics, Inc. Purged cavity solid state tunable laser
US5083093A (en) * 1990-06-22 1992-01-21 Varian Associates, Inc. Circuit for coupling energy to pulse forming network or capacitor
US5095492A (en) * 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
JPH04314374A (ja) 1991-04-12 1992-11-05 Komatsu Ltd 狭帯域レ−ザ装置
US5691989A (en) * 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
JP2696285B2 (ja) 1991-12-16 1998-01-14 株式会社小松製作所 狭帯域発振エキシマレーザ装置およびそのパージ方法
US6404158B1 (en) * 1992-04-22 2002-06-11 Nartron Corporation Collision monitoring system
US5371587A (en) * 1992-05-06 1994-12-06 The Boeing Company Chirped synthetic wavelength laser radar
JP3155837B2 (ja) * 1992-09-14 2001-04-16 株式会社東芝 光伝送装置
US5440578B1 (en) * 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
US5450207A (en) * 1993-07-16 1995-09-12 Cymer Laser Technologies Method and apparatus for calibrating a laser wavelength control mechanism
US5420877A (en) * 1993-07-16 1995-05-30 Cymer Laser Technologies Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby
US6420819B1 (en) * 1994-01-27 2002-07-16 Active Control Experts, Inc. Packaged strain actuator
US5448580A (en) * 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
JPH08172233A (ja) * 1994-12-15 1996-07-02 Anritsu Corp 可変波長光源装置
JP3175515B2 (ja) * 1994-12-26 2001-06-11 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US5706301A (en) * 1995-08-16 1998-01-06 Telefonaktiebolaget L M Ericsson Laser wavelength control system
US6109574A (en) * 1996-01-05 2000-08-29 Cymer, Inc. Gas laser chamber/optics support structure
CA2190697C (en) * 1996-01-31 2000-07-25 Donald Glenn Larson Blower motor with adjustable timing
US5771258A (en) * 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6128323A (en) * 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5848089A (en) * 1997-07-11 1998-12-08 Cymer, Inc. Excimer laser with magnetic bearings supporting fan
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6240110B1 (en) * 1997-06-04 2001-05-29 Cymer, Inc. Line narrowed F2 laser with etalon based output coupler
US6018537A (en) * 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) * 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6757316B2 (en) * 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
DE29714489U1 (de) * 1997-08-13 1997-10-09 Trumpf GmbH + Co., 71254 Ditzingen Laserbearbeitungsmaschine mit Gasausgleichsvolumen
US5870420A (en) * 1997-08-18 1999-02-09 Cymer, Inc. Cross-flow blower with braces
AU9472298A (en) * 1997-09-05 1999-03-22 Micron Optics, Inc. Tunable fiber fabry-perot surface-emitting lasers
US5953360A (en) * 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
DE19750320C1 (de) * 1997-11-13 1999-04-01 Max Planck Gesellschaft Verfahren und Vorrichtung zur Lichtpulsverstärkung
US6151349A (en) * 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US5978405A (en) * 1998-03-06 1999-11-02 Cymer, Inc. Laser chamber with minimized acoustic and shock wave disturbances
US6466599B1 (en) * 1999-04-07 2002-10-15 Lambda Physik Ag Discharge unit for a high repetition rate excimer or molecular fluorine laser
US6424666B1 (en) * 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US5991234A (en) * 1998-06-11 1999-11-23 Trw Inc. Ultrasonic sensor system and method having automatic excitation frequency adjustment
US6477193B2 (en) * 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) * 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6208674B1 (en) * 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
WO2000038286A1 (en) * 1998-12-15 2000-06-29 Cymer, Inc. ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE
US6154470A (en) * 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US6219368B1 (en) * 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6327290B1 (en) * 1999-02-12 2001-12-04 Lambda Physik Ag Beam delivery system for molecular fluorine (F2) laser
US6243405B1 (en) * 1999-03-17 2001-06-05 Lambda Physik Ag Very stable excimer or molecular fluorine laser
US6104735A (en) * 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) * 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6493364B1 (en) * 1999-06-07 2002-12-10 Lambda Physik Ag Beam shutter for excimer laser
US6529533B1 (en) * 1999-11-22 2003-03-04 Lambda Physik Ag Beam parameter monitoring unit for a molecular fluorine (F2) laser
DE20004616U1 (de) * 2000-03-13 2000-12-14 Lambda Physik Gesellschaft zur Herstellung von Lasern mbH, 37079 Göttingen Vorrichtung zur Regelung der Ausgangsleistung eines Lasers
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer

Similar Documents

Publication Publication Date Title
JP2004528718A5 (cg-RX-API-DMAC10.html)
JP2005502209A5 (cg-RX-API-DMAC10.html)
RU2306649C2 (ru) Система очень узкополосного двухкамерного газоразрядного лазера с высокой частотой следования импульсов
US6795474B2 (en) Gas discharge laser with improved beam path
TWI469691B (zh) 用於極端紫外光源之射束輸送系統
JP2010021543A (ja) 極端紫外光源装置
JP3228424B2 (ja) ガス検出システムおよびガス検出方法
TW201251517A (en) Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US10904994B2 (en) Supply system for an extreme ultraviolet light source
JPH07283461A (ja) スラブ導波路型レーザ
US20020167986A1 (en) Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
JP5448402B2 (ja) ガスフロー式ｓｐｆを備えた極端紫外光源装置
US3768035A (en) Modular aerodynamic laser window
JP7114708B2 (ja) レーザ加工装置、レーザ加工システム、及びレーザ加工方法
KR20020059825A (ko) 헬륨 퍼지된 라인 협소화 유닛을 구비한 고전력 가스 방전레이저
CN118130414B (zh) 基于高次谐波极紫外光源的超高时空分辨泵浦探测系统
JPH04352320A (ja) 気相成長装置
Legare et al. Adaptive compression of intense 250-nm-bandwidth laser pulses
JP5426815B2 (ja) 液滴生成装置および液滴生成方法
JP5078741B2 (ja) 超音波検査装置および原子力プラントの非破壊検査方法
JP2006147987A (ja) レーザー発振器
JP2021039321A (ja) 極端紫外光生成装置、及び電子デバイスの製造方法
JP3636303B2 (ja) ガスレーザ装置及びガスレーザ装置の狭帯域化ユニットのアライメント方法
CN119223572A (zh) 一种透明光学介质冲击波参数实时测定装置
CN121284810A (zh) 基于激光驱动氙气靶的清洁极紫外光源产生装置与方法