JP2004525426A5 - - Google Patents

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Publication number
JP2004525426A5
JP2004525426A5 JP2002586039A JP2002586039A JP2004525426A5 JP 2004525426 A5 JP2004525426 A5 JP 2004525426A5 JP 2002586039 A JP2002586039 A JP 2002586039A JP 2002586039 A JP2002586039 A JP 2002586039A JP 2004525426 A5 JP2004525426 A5 JP 2004525426A5
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JP
Japan
Prior art keywords
layer
composition
core
inert gas
buffer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002586039A
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English (en)
Japanese (ja)
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JP2004525426A (ja
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Publication date
Priority claimed from US09/846,697 external-priority patent/US7011932B2/en
Application filed filed Critical
Publication of JP2004525426A publication Critical patent/JP2004525426A/ja
Publication of JP2004525426A5 publication Critical patent/JP2004525426A5/ja
Withdrawn legal-status Critical Current

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JP2002586039A 2001-05-01 2002-04-04 ポリマー導波管製造方法 Withdrawn JP2004525426A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/846,697 US7011932B2 (en) 2001-05-01 2001-05-01 Polymer waveguide fabrication process
PCT/US2002/010770 WO2002088794A1 (en) 2001-05-01 2002-04-04 Polymer waveguide fabrication process

Publications (2)

Publication Number Publication Date
JP2004525426A JP2004525426A (ja) 2004-08-19
JP2004525426A5 true JP2004525426A5 (enExample) 2005-12-22

Family

ID=25298683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002586039A Withdrawn JP2004525426A (ja) 2001-05-01 2002-04-04 ポリマー導波管製造方法

Country Status (6)

Country Link
US (1) US7011932B2 (enExample)
EP (1) EP1393102A4 (enExample)
JP (1) JP2004525426A (enExample)
KR (1) KR20040015228A (enExample)
CN (1) CN1561458A (enExample)
WO (1) WO2002088794A1 (enExample)

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US7006753B2 (en) * 2002-12-18 2006-02-28 General Electric Company Optical waveguide devices with deuterated amorphous carbon core structures
DE10340608A1 (de) * 2003-08-29 2005-03-24 Infineon Technologies Ag Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht
DE10340609A1 (de) * 2003-08-29 2005-04-07 Infineon Technologies Ag Polymerformulierung und Verfahren zur Herstellung einer Dielektrikumsschicht
JP2005173039A (ja) * 2003-12-09 2005-06-30 Nitto Denko Corp 光導波路の製法
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
JP2007523642A (ja) * 2004-01-28 2007-08-23 ザ、リージェンツ、オブ、ザ、ユニバーシティ、オブ、ミシガン ヒト前立腺癌の骨への移動および浸潤を調節する骨芽細胞因子
US7378456B2 (en) * 2004-01-30 2008-05-27 Promerus Llc Directly photodefinable polymer compositions and methods thereof
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
US20060281021A1 (en) * 2005-05-26 2006-12-14 Inphase Technologies, Inc. Illuminative treatment of holographic media
US20060275670A1 (en) * 2005-05-26 2006-12-07 Inphase Technologies, Inc. Post-curing of holographic media
US7759407B2 (en) * 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8557351B2 (en) * 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8846195B2 (en) * 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US7391949B2 (en) * 2005-09-27 2008-06-24 The Regents Of The University Of California Low loss hollow core optical waveguide
JP4622878B2 (ja) * 2006-02-09 2011-02-02 株式会社豊田中央研究所 光導波路の製造方法
US8017193B1 (en) * 2008-08-06 2011-09-13 Hrl Laboratories, Llc Monomeric formulation for making polymer waveguides
US20080101744A1 (en) * 2006-10-31 2008-05-01 Honeywell International Inc. Optical Waveguide Sensor Devices and Methods For Making and Using Them
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
JP5614018B2 (ja) * 2009-09-17 2014-10-29 日立化成株式会社 光導波路及び光電気複合基板の製造方法並びにそれにより得られる光導波路及び光電気複合基板
US20110104388A1 (en) * 2009-11-02 2011-05-05 Harris Corporation Method for making an optical device including a curable index matching elastomeric solid layer
US20110165412A1 (en) * 2009-11-24 2011-07-07 Molecular Imprints, Inc. Adhesion layers in nanoimprint lithograhy
WO2012151497A1 (en) * 2011-05-04 2012-11-08 The University Of Akron Suppression of dewetting of polymer films via inexpensive soft lithography
RU2011140310A (ru) * 2011-09-16 2013-04-10 Конинклейке Филипс Электроникс Н.В. Высокочастотная волоноводная структура
KR102396005B1 (ko) * 2013-10-21 2022-05-10 닛산 가가쿠 가부시키가이샤 광도파로의 제조방법
WO2015146499A1 (ja) 2014-03-28 2015-10-01 テルモ株式会社 蛍光センサ
WO2015179553A2 (en) 2014-05-21 2015-11-26 Iowa State University Research Foundation, Inc. Poly(acrylated polyol) and method for making and using thereof as asphalt rubber modifiers, adhesives, fracking additives, or fracking fluids
CN104076439A (zh) * 2014-06-19 2014-10-01 清华大学 一种波导及其制备方法
WO2018031373A1 (en) 2016-08-12 2018-02-15 Iowa State University Research Foundation, Inc. Acrylated and acylated or acetalized polyol as a biobased substitute for hard, rigid thermoplastic and thermoplastic and thermoset materials
CN106410345A (zh) * 2016-10-31 2017-02-15 清华大学 基于压力控制的惰性气体的太赫兹波导器件及控制方法
JP6909627B2 (ja) * 2017-04-28 2021-07-28 新光電気工業株式会社 光導波路装置及びその製造方法
US10670959B2 (en) 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same
CN108957628A (zh) * 2018-09-20 2018-12-07 广西师范大学 一种基于二硫化钼的长程介质加载的混合等离子波导
JP7135670B2 (ja) * 2018-09-27 2022-09-13 住友電気工業株式会社 光ファイバ及び紫外線硬化型樹脂組成物
CN111694094A (zh) * 2020-06-16 2020-09-22 王亚非 一种wpcw管结构
CN113866880A (zh) * 2021-10-09 2021-12-31 温州大学 一种基于飞秒激光直写的光学模拟平台制备方法
CN115912026B (zh) * 2022-11-29 2025-06-27 吉林大学 一种基于铒镱共掺聚合物复合结构芯层的光波导放大器及其制备方法
WO2025183093A1 (ja) * 2024-02-28 2025-09-04 京セラ株式会社 光回路基板および実装構造体

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US4609252A (en) 1979-04-02 1986-09-02 Hughes Aircraft Company Organic optical waveguide device and method of making
JPH01138509A (ja) 1987-11-26 1989-05-31 Asahi Chem Ind Co Ltd 高密度光導波路及びその製法
US5106211A (en) * 1991-02-14 1992-04-21 Hoechst Celanese Corp. Formation of polymer channel waveguides by excimer laser ablation and method of making same
US5263111A (en) * 1991-04-15 1993-11-16 Raychem Corporation Optical waveguide structures and formation methods
TW262537B (enExample) 1993-07-01 1995-11-11 Allied Signal Inc
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JPH09258051A (ja) * 1996-03-22 1997-10-03 Toyota Central Res & Dev Lab Inc リッジ型光導波路の製造方法
JPH1039151A (ja) 1996-07-25 1998-02-13 Hitachi Cable Ltd 光導波路及びその製造方法
US6306563B1 (en) * 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions

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