JP2004504455A5 - - Google Patents

Download PDF

Info

Publication number
JP2004504455A5
JP2004504455A5 JP2002514210A JP2002514210A JP2004504455A5 JP 2004504455 A5 JP2004504455 A5 JP 2004504455A5 JP 2002514210 A JP2002514210 A JP 2002514210A JP 2002514210 A JP2002514210 A JP 2002514210A JP 2004504455 A5 JP2004504455 A5 JP 2004504455A5
Authority
JP
Japan
Prior art keywords
aryl
arylene ether
polymer
branched
triple bond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002514210A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004504455A (ja
Filing date
Publication date
Priority claimed from US09/618,945 external-priority patent/US6469123B1/en
Priority claimed from US09/897,936 external-priority patent/US20020022708A1/en
Application filed filed Critical
Publication of JP2004504455A publication Critical patent/JP2004504455A/ja
Publication of JP2004504455A5 publication Critical patent/JP2004504455A5/ja
Withdrawn legal-status Critical Current

Links

JP2002514210A 2000-07-19 2001-07-13 有機組成物における熱硬化性分子の組成物および方法 Withdrawn JP2004504455A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/618,945 US6469123B1 (en) 2000-07-19 2000-07-19 Compositions and methods for thermosetting molecules in organic compositions
US09/897,936 US20020022708A1 (en) 2000-07-19 2001-07-05 Compositions and methods for thermosetting molecules in organic compositions
PCT/US2001/022204 WO2002008308A1 (en) 2000-07-19 2001-07-13 Compositions and methods for thermosetting molecules in organic compositions

Publications (2)

Publication Number Publication Date
JP2004504455A JP2004504455A (ja) 2004-02-12
JP2004504455A5 true JP2004504455A5 (OSRAM) 2008-08-21

Family

ID=27088367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002514210A Withdrawn JP2004504455A (ja) 2000-07-19 2001-07-13 有機組成物における熱硬化性分子の組成物および方法

Country Status (9)

Country Link
US (2) US20020022708A1 (OSRAM)
EP (1) EP1309639A4 (OSRAM)
JP (1) JP2004504455A (OSRAM)
KR (1) KR100620207B1 (OSRAM)
CN (1) CN1458945A (OSRAM)
AU (1) AU2001280549A1 (OSRAM)
MY (1) MY134260A (OSRAM)
TW (1) TWI241310B (OSRAM)
WO (1) WO2002008308A1 (OSRAM)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6987147B2 (en) * 2001-10-01 2006-01-17 Honeywell International Inc. Low dielectric constant materials with improved thermo-mechanical strength and processability
US20030143332A1 (en) * 2002-01-31 2003-07-31 Sumitomo Chemical Company, Limited Coating solution for forming insulating film
JP4878779B2 (ja) 2004-06-10 2012-02-15 富士フイルム株式会社 膜形成用組成物、絶縁膜及び電子デバイス
JP4516857B2 (ja) * 2005-02-28 2010-08-04 富士フイルム株式会社 カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス
JP2007119706A (ja) * 2005-09-28 2007-05-17 Fujifilm Corp 重合体および膜形成用組成物
JP4792282B2 (ja) * 2005-12-09 2011-10-12 富士フイルム株式会社 重合体および膜形成用組成物
JP2007161780A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 膜形成用組成物、該組成物を用いた絶縁膜及び電子デバイス
US7558186B2 (en) * 2007-01-02 2009-07-07 International Business Machines Corporation High density data storage medium, method and device
US20080159114A1 (en) * 2007-01-02 2008-07-03 Dipietro Richard Anthony High density data storage medium, method and device
JP2008192879A (ja) 2007-02-06 2008-08-21 Fujifilm Corp 半導体集積回路の絶縁膜
JP2008231174A (ja) * 2007-03-19 2008-10-02 Fujifilm Corp 膜形成用組成物、絶縁膜及び電子デバイス
GB2451865A (en) * 2007-08-15 2009-02-18 Univ Liverpool Microporous polymers from alkynyl monomers
JP5012372B2 (ja) * 2007-09-27 2012-08-29 住友ベークライト株式会社 有機絶縁膜及び半導体装置
US7799843B2 (en) 2008-02-29 2010-09-21 Fujifilm Corporation Film
JP5404772B2 (ja) * 2008-04-28 2014-02-05 ビーエーエスエフ ソシエタス・ヨーロピア ツイン重合によって得られるLow−k誘電体
JP5401118B2 (ja) 2008-12-10 2014-01-29 富士フイルム株式会社 組成物
JP6666138B2 (ja) 2015-12-24 2020-03-13 エア・ウォーター株式会社 多価アルキン化合物、その製法および用途

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918158A (en) * 1986-07-21 1990-04-17 Fluorochem Inc. 1,3-diethynyladamantane and methods of polymerization thereof
US5017734A (en) * 1989-12-11 1991-05-21 Kurt Baum Ethynyl adamantane derivatives and methods of polymerization thereof
JPH04314394A (ja) 1991-04-12 1992-11-05 Fujitsu Ltd ガラスセラミック回路基板とその製造方法
US5347063A (en) 1993-03-09 1994-09-13 Mobil Oil Corporation Method for direct arylation of diamondoids
US5576355A (en) * 1993-06-04 1996-11-19 Mobil Oil Corp. Diamondoid derivatives for pharmaceutical use
US5744399A (en) 1995-11-13 1998-04-28 Lsi Logic Corporation Process for forming low dielectric constant layers using fullerenes
JP2002530505A (ja) * 1998-11-24 2002-09-17 ザ ダウ ケミカル カンパニー 架橋性マトリックス前駆体および気孔発生体を含有する組成物、並びにそれから製造された多孔質マトリックス
US6413202B1 (en) * 1999-01-21 2002-07-02 Alliedsignal, Inc. Solvent systems for polymeric dielectric materials
US6509415B1 (en) * 2000-04-07 2003-01-21 Honeywell International Inc. Low dielectric constant organic dielectrics based on cage-like structures
US6444715B1 (en) * 2000-06-06 2002-09-03 Honeywell International Inc. Low dielectric materials and methods of producing same
US6469123B1 (en) * 2000-07-19 2002-10-22 Honeywell International Inc. Compositions and methods for thermosetting molecules in organic compositions
US6423811B1 (en) * 2000-07-19 2002-07-23 Honeywell International Inc. Low dielectric constant materials with polymeric networks

Similar Documents

Publication Publication Date Title
JP2004504455A5 (OSRAM)
US6713590B2 (en) Low dielectric constant materials with polymeric networks
CN1312754C (zh) 电子、光电子或机电器件的制造方法以及电子器件
US7867689B2 (en) Method of use for photopatternable dielectric materials for BEOL applications
JP6969868B2 (ja) 重合体、有機膜組成物、およびパターン形成方法
KR101821735B1 (ko) 유기막 조성물, 유기막, 및 패턴형성방법
KR101798935B1 (ko) 유기막 조성물, 유기막, 및 패턴형성방법
JPH11315139A (ja) 熱架橋のための官能基を持つポリ(アリ―レンエ―テル)ポリマ―を含む組成物、このポリマ―の合成方法及びこのポリマ―の架橋方法
KR930007921B1 (ko) 폴리실 페닐렌 실옥산 및 그 제조방법과 레지스트 재료 및 반도체 장치
KR20020091181A (ko) 케이지형 구조에 기초한 저유전율 유기 유전체
EP3761115B1 (en) Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
US7883742B2 (en) Porous materials derived from polymer composites
US6803441B2 (en) Compositions and methods for thermosetting molecules in organic compositions
KR101698510B1 (ko) 하드마스크 조성물용 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법
KR101810610B1 (ko) 모노머, 유기막 조성물, 유기막, 및 패턴형성방법
KR20040016843A (ko) 케이지형 구조에 기초한 저유전율 유기 유전체
US20030060590A1 (en) Compositions and methods for thermosetting molecules in organic compositions
US7928430B2 (en) Mononuclear star-branched polymer dielectric material and organic thin film transistor
JP2002174904A5 (OSRAM)
US20040102584A1 (en) Low dielectric constant materials with polymeric networks
EP1245638B1 (en) Composition for insulating film formation
JPH04181254A (ja) ポリシルフェニレンシロキサン及びその製造方法ならびにレジスト材料及び半導体装置
JP2006241239A (ja) 重合体の製造法、膜形成用組成物、絶縁膜および電子デバイス
JPH09241385A (ja) 含フッ素ポリシラン共重合体、ケイ素ポリマー組成物、および含フッ素シロキサン架橋体の製造方法
JP3176550B2 (ja) 電子回路の形成方法