JP2004177952A5 - - Google Patents
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- JP2004177952A5 JP2004177952A5 JP2003389094A JP2003389094A JP2004177952A5 JP 2004177952 A5 JP2004177952 A5 JP 2004177952A5 JP 2003389094 A JP2003389094 A JP 2003389094A JP 2003389094 A JP2003389094 A JP 2003389094A JP 2004177952 A5 JP2004177952 A5 JP 2004177952A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42780902P | 2002-11-20 | 2002-11-20 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010173753A Division JP2010256933A (ja) | 2002-11-20 | 2010-08-02 | 多層フォトレジスト系 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004177952A JP2004177952A (ja) | 2004-06-24 |
| JP2004177952A5 true JP2004177952A5 (cg-RX-API-DMAC7.html) | 2007-03-08 |
Family
ID=32230429
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003389094A Pending JP2004177952A (ja) | 2002-11-20 | 2003-11-19 | 多層フォトレジスト系 |
| JP2010173753A Ceased JP2010256933A (ja) | 2002-11-20 | 2010-08-02 | 多層フォトレジスト系 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010173753A Ceased JP2010256933A (ja) | 2002-11-20 | 2010-08-02 | 多層フォトレジスト系 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7582412B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1422566A1 (cg-RX-API-DMAC7.html) |
| JP (2) | JP2004177952A (cg-RX-API-DMAC7.html) |
| KR (3) | KR20040044368A (cg-RX-API-DMAC7.html) |
| CN (1) | CN1550889B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI258637B (cg-RX-API-DMAC7.html) |
Families Citing this family (57)
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|---|---|---|---|---|
| WO2000077575A1 (en) | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
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| US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
| JP2004206082A (ja) | 2002-11-20 | 2004-07-22 | Rohm & Haas Electronic Materials Llc | 多層フォトレジスト系 |
| CN1570763A (zh) * | 2003-02-23 | 2005-01-26 | 罗姆和哈斯电子材料有限责任公司 | 氟化的硅-聚合物和包含该聚合物的光刻胶 |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| KR100586165B1 (ko) * | 2003-12-30 | 2006-06-07 | 동부일렉트로닉스 주식회사 | 바닥 반사 방지 코팅 방법 |
| JP4494060B2 (ja) * | 2004-03-30 | 2010-06-30 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP4494061B2 (ja) * | 2004-03-30 | 2010-06-30 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| TW200623993A (en) * | 2004-08-19 | 2006-07-01 | Rohm & Haas Elect Mat | Methods of forming printed circuit boards |
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| CN100447672C (zh) * | 2005-03-04 | 2008-12-31 | 中芯国际集成电路制造(上海)有限公司 | 一种微细光刻图案方法 |
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| EP1762895B1 (en) | 2005-08-29 | 2016-02-24 | Rohm and Haas Electronic Materials, L.L.C. | Antireflective Hard Mask Compositions |
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| WO2008002975A2 (en) * | 2006-06-28 | 2008-01-03 | Dow Corning Corporation | Silsesquioxane resin systems with base additives bearing electron- attracting functionalities |
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| US7959818B2 (en) | 2006-09-12 | 2011-06-14 | Hynix Semiconductor Inc. | Method for forming a fine pattern of a semiconductor device |
| US9244355B2 (en) | 2006-10-30 | 2016-01-26 | Rohm And Haas Electronic Materials, Llc | Compositions and processes for immersion lithography |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
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| CN101526737B (zh) | 2007-11-05 | 2014-02-26 | 罗门哈斯电子材料有限公司 | 浸渍平版印刷用组合物和浸渍平版印刷方法 |
| KR101546222B1 (ko) | 2008-02-25 | 2015-08-20 | 허니웰 인터내셔널 인코포레이티드 | 공정가능한 무기 및 유기 중합체 배합물, 이의 제조방법 및 이의 용도 |
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| US10151981B2 (en) | 2008-05-22 | 2018-12-11 | Micron Technology, Inc. | Methods of forming structures supported by semiconductor substrates |
| US8273634B2 (en) | 2008-12-04 | 2012-09-25 | Micron Technology, Inc. | Methods of fabricating substrates |
| US8247302B2 (en) | 2008-12-04 | 2012-08-21 | Micron Technology, Inc. | Methods of fabricating substrates |
| US8796155B2 (en) | 2008-12-04 | 2014-08-05 | Micron Technology, Inc. | Methods of fabricating substrates |
| US8268543B2 (en) | 2009-03-23 | 2012-09-18 | Micron Technology, Inc. | Methods of forming patterns on substrates |
| US9330934B2 (en) | 2009-05-18 | 2016-05-03 | Micron Technology, Inc. | Methods of forming patterns on substrates |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8323871B2 (en) * | 2010-02-24 | 2012-12-04 | International Business Machines Corporation | Antireflective hardmask composition and a method of preparing a patterned material using same |
| JP5517848B2 (ja) * | 2010-09-08 | 2014-06-11 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| US8395228B2 (en) | 2010-11-08 | 2013-03-12 | International Business Machines Corporation | Integration process to improve focus leveling within a lot process variation |
| US8575032B2 (en) | 2011-05-05 | 2013-11-05 | Micron Technology, Inc. | Methods of forming a pattern on a substrate |
| CN102236253B (zh) * | 2011-05-20 | 2012-11-07 | 潍坊星泰克微电子材料有限公司 | 用于微光刻工艺的多相高硅光刻胶成像方法、多相高硅光刻胶及应用 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| TW201314389A (zh) * | 2011-09-29 | 2013-04-01 | Wistron Corp | 感光性間隙物及液晶顯示器的製作方法與陣列基板 |
| US9177794B2 (en) | 2012-01-13 | 2015-11-03 | Micron Technology, Inc. | Methods of patterning substrates |
| US8629048B1 (en) | 2012-07-06 | 2014-01-14 | Micron Technology, Inc. | Methods of forming a pattern on a substrate |
| KR102099712B1 (ko) | 2013-01-15 | 2020-04-10 | 삼성전자주식회사 | 패턴 형성 방법 및 이를 이용한 반도체 소자의 제조 방법 |
| KR102021484B1 (ko) | 2014-10-31 | 2019-09-16 | 삼성에스디아이 주식회사 | 막 구조물 제조 방법, 막 구조물, 및 패턴형성방법 |
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| TWI646397B (zh) * | 2015-10-31 | 2019-01-01 | 南韓商羅門哈斯電子材料韓國公司 | 與外塗佈光致抗蝕劑一起使用的塗料組合物 |
| WO2018179704A1 (ja) * | 2017-03-27 | 2018-10-04 | Jsr株式会社 | パターン形成方法 |
| KR102448568B1 (ko) * | 2020-01-17 | 2022-09-27 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법 |
| US11747733B2 (en) * | 2021-01-08 | 2023-09-05 | Tokyo Electron Limited | Freeze-less methods for self-aligned double patterning |
| CN113045863A (zh) * | 2021-04-22 | 2021-06-29 | 襄阳银鼎电力设备有限责任公司 | 一种大直径芯棒及其制备方法 |
| US12313971B2 (en) | 2021-07-06 | 2025-05-27 | Dupont Electronic Materials International, Llc | Coated underlayer for overcoated photoresist |
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-
2003
- 2003-11-19 JP JP2003389094A patent/JP2004177952A/ja active Pending
- 2003-11-19 KR KR1020030081964A patent/KR20040044368A/ko not_active Ceased
- 2003-11-19 EP EP03257325A patent/EP1422566A1/en not_active Withdrawn
- 2003-11-20 US US10/717,975 patent/US7582412B2/en not_active Expired - Lifetime
- 2003-11-20 CN CN2003101249668A patent/CN1550889B/zh not_active Expired - Fee Related
- 2003-11-20 TW TW092132520A patent/TWI258637B/zh not_active IP Right Cessation
-
2010
- 2010-08-02 JP JP2010173753A patent/JP2010256933A/ja not_active Ceased
-
2011
- 2011-04-19 KR KR1020110036021A patent/KR101203215B1/ko not_active Expired - Fee Related
-
2012
- 2012-02-01 KR KR1020120010239A patent/KR20120031965A/ko not_active Ceased