JP2004148494A5 - - Google Patents

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Publication number
JP2004148494A5
JP2004148494A5 JP2003364008A JP2003364008A JP2004148494A5 JP 2004148494 A5 JP2004148494 A5 JP 2004148494A5 JP 2003364008 A JP2003364008 A JP 2003364008A JP 2003364008 A JP2003364008 A JP 2003364008A JP 2004148494 A5 JP2004148494 A5 JP 2004148494A5
Authority
JP
Japan
Prior art keywords
silicon
angstroms
predetermined depth
substrate
nanoimprint stamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003364008A
Other languages
English (en)
Japanese (ja)
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JP2004148494A (ja
Filing date
Publication date
Priority claimed from US10/279,407 external-priority patent/US6916511B2/en
Application filed filed Critical
Publication of JP2004148494A publication Critical patent/JP2004148494A/ja
Publication of JP2004148494A5 publication Critical patent/JP2004148494A5/ja
Pending legal-status Critical Current

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JP2003364008A 2002-10-24 2003-10-24 硬化ナノインプリントスタンプ Pending JP2004148494A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/279,407 US6916511B2 (en) 2002-10-24 2002-10-24 Method of hardening a nano-imprinting stamp

Publications (2)

Publication Number Publication Date
JP2004148494A JP2004148494A (ja) 2004-05-27
JP2004148494A5 true JP2004148494A5 (enExample) 2006-09-07

Family

ID=32106705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003364008A Pending JP2004148494A (ja) 2002-10-24 2003-10-24 硬化ナノインプリントスタンプ

Country Status (5)

Country Link
US (2) US6916511B2 (enExample)
EP (1) EP1424309A3 (enExample)
JP (1) JP2004148494A (enExample)
CN (1) CN1498776A (enExample)
TW (1) TWI300237B (enExample)

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AU2005282060A1 (en) * 2004-09-08 2006-03-16 Nil Technology Aps A flexible nano-imprint stamp
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US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
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US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
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US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
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JP4262267B2 (ja) * 2005-09-06 2009-05-13 キヤノン株式会社 モールド、インプリント装置及びデバイスの製造方法
US20090231714A1 (en) 2005-09-19 2009-09-17 Yang Zhao Transparent anti-reflective article and method of fabricating same
WO2007053242A2 (en) * 2005-09-19 2007-05-10 Wayne State University Transparent hydrophobic article having self-cleaning and liquid repellant features and method of fabricating same
JP5268239B2 (ja) * 2005-10-18 2013-08-21 キヤノン株式会社 パターン形成装置、パターン形成方法
WO2007046110A1 (en) * 2005-10-19 2007-04-26 Indian Institute Of Technology, Kanpur A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
CN100437361C (zh) * 2005-12-08 2008-11-26 中国科学院微电子研究所 一种紫外固化纳米压印模版的制备方法
CN100453444C (zh) * 2005-12-14 2009-01-21 中国科学院微电子研究所 利用多层侧墙技术制备纳米压印模版的方法
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
CN100500449C (zh) * 2005-12-27 2009-06-17 中国科学院化学研究所 一种计算机直接制版版材及其制备方法
US7690910B2 (en) * 2006-02-01 2010-04-06 Canon Kabushiki Kaisha Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
JP5114848B2 (ja) * 2006-02-09 2013-01-09 凸版印刷株式会社 インプリント用モールドの欠陥修正方法及びインプリント用モールドの製造方法
US7341825B2 (en) * 2006-05-25 2008-03-11 Hitachi Global Storage Technologies Netherlands B.V. Method for producing high resolution nano-imprinting masters
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
KR100831046B1 (ko) * 2006-09-13 2008-05-21 삼성전자주식회사 나노 임프린트용 몰드 및 그 제조 방법
US7388661B2 (en) * 2006-10-20 2008-06-17 Hewlett-Packard Development Company, L.P. Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS)
US7391511B1 (en) 2007-01-31 2008-06-24 Hewlett-Packard Development Company, L.P. Raman signal-enhancing structures and Raman spectroscopy systems including such structures
JP5110924B2 (ja) * 2007-03-14 2012-12-26 キヤノン株式会社 モールド、モールドの製造方法、加工装置及び加工方法
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
USD578536S1 (en) * 2007-08-27 2008-10-14 Podium Photonics (Guangzhou) Ltd. Chip
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
US20090274874A1 (en) * 2008-04-30 2009-11-05 Zhiyong Li Photonic Device And Method For Forming Nano-Structures
JP2010009729A (ja) * 2008-06-30 2010-01-14 Toshiba Corp インプリント用スタンパ、インプリント用スタンパの製造方法、磁気記録媒体、磁気記録媒体の製造方法及び磁気ディスク装置
TWI449087B (zh) * 2008-10-01 2014-08-11 國立清華大學 A method for growing a silicon carbide film on a (100) silicon substrate
CA2754701A1 (en) * 2009-04-14 2010-10-21 Nanoink, Inc. Conducting lines, nanoparticles, inks, and patterning
CN101859066B (zh) * 2010-06-02 2012-07-04 河南大学 一种基于生物材料表面结构的纳米压印模板及其制备方法
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CN102591142B (zh) * 2012-02-29 2013-03-27 青岛理工大学 用于蓝宝石衬底图形化的纳米压印装置及方法
EP3401731B1 (de) 2013-06-20 2021-03-03 EV Group E. Thallner GmbH Stempel mit einer stempelstruktur sowie verfahren zu dessen herstellung
CN108292592B (zh) * 2015-12-08 2022-04-01 吉佳蓝科技股份有限公司 压印装置及方法
KR20180105433A (ko) * 2017-03-15 2018-09-28 주식회사 기가레인 임프린트 장치 및 임프린트 방법
KR102206492B1 (ko) * 2019-11-04 2021-01-22 주식회사 기가레인 전사 장치 및 이를 이용한 전사된 기판의 생산 방법

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