JP2004134741A5 - - Google Patents
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- Publication number
- JP2004134741A5 JP2004134741A5 JP2003171797A JP2003171797A JP2004134741A5 JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5 JP 2003171797 A JP2003171797 A JP 2003171797A JP 2003171797 A JP2003171797 A JP 2003171797A JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5
- Authority
- JP
- Japan
- Prior art keywords
- solid
- precursor
- mixture
- heat
- precursors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38952802P | 2002-06-17 | 2002-06-17 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004134741A JP2004134741A (ja) | 2004-04-30 |
JP2004134741A5 true JP2004134741A5 (ko) | 2006-07-20 |
JP4486794B2 JP4486794B2 (ja) | 2010-06-23 |
Family
ID=32298203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003171797A Expired - Lifetime JP4486794B2 (ja) | 2002-06-17 | 2003-06-17 | 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4486794B2 (ko) |
TW (1) | TWI271443B (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101299791B1 (ko) * | 2005-03-16 | 2013-08-23 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 시약의 고체 소스로부터 시약을 운반하기 위한 시스템 |
JP2010503977A (ja) | 2006-04-26 | 2010-02-04 | アドバンスト テクノロジー マテリアルズ,インコーポレイテッド | 半導体処理システムの洗浄方法 |
US7678458B2 (en) | 2007-01-24 | 2010-03-16 | Asml Holding N.V. | Bonding silicon silicon carbide to glass ceramics |
TWI494975B (zh) | 2008-02-11 | 2015-08-01 | Advanced Tech Materials | 在半導體處理系統中離子源之清洗 |
US8741062B2 (en) * | 2008-04-22 | 2014-06-03 | Picosun Oy | Apparatus and methods for deposition reactors |
US20160046408A1 (en) * | 2015-10-27 | 2016-02-18 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Internally coated vessel for housing a metal halide |
KR20190073788A (ko) | 2017-12-19 | 2019-06-27 | 주식회사 티씨케이 | CVD를 이용한 TaC 코팅층의 제조방법 및 그를 이용하여 제조한 TaC의 물성 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0620051B2 (ja) * | 1987-08-27 | 1994-03-16 | 宇部興産株式会社 | 有機金属化合物のボンベ充填方法 |
JP2651530B2 (ja) * | 1988-04-15 | 1997-09-10 | 住友化学工業株式会社 | 気相成長用有機金属化合物供給装置 |
JPH06173011A (ja) * | 1992-12-02 | 1994-06-21 | Shin Etsu Chem Co Ltd | 気化容器 |
FR2727322B1 (fr) * | 1994-11-30 | 1996-12-27 | Kodak Pathe | Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede |
JP2964313B2 (ja) * | 1995-03-09 | 1999-10-18 | 信越化学工業株式会社 | 固体有機金属化合物供給装置及びその製造方法 |
JPH09148257A (ja) * | 1995-11-29 | 1997-06-06 | Sumitomo Electric Ind Ltd | 原料供給装置 |
JPH10152779A (ja) * | 1996-11-25 | 1998-06-09 | Matsushita Electric Ind Co Ltd | 気化装置及びcvd装置 |
TW576873B (en) * | 2000-04-14 | 2004-02-21 | Asm Int | Method of growing a thin film onto a substrate |
JP4757403B2 (ja) * | 2001-06-01 | 2011-08-24 | 東京エレクトロン株式会社 | 固体原料気化装置 |
-
2003
- 2003-06-17 JP JP2003171797A patent/JP4486794B2/ja not_active Expired - Lifetime
- 2003-06-17 TW TW92116365A patent/TWI271443B/zh not_active IP Right Cessation
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