JP2004134741A5 - - Google Patents

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Publication number
JP2004134741A5
JP2004134741A5 JP2003171797A JP2003171797A JP2004134741A5 JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5 JP 2003171797 A JP2003171797 A JP 2003171797A JP 2003171797 A JP2003171797 A JP 2003171797A JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5
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JP
Japan
Prior art keywords
solid
precursor
mixture
heat
precursors
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Application number
JP2003171797A
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English (en)
Japanese (ja)
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JP2004134741A (ja
JP4486794B2 (ja
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Publication of JP2004134741A publication Critical patent/JP2004134741A/ja
Publication of JP2004134741A5 publication Critical patent/JP2004134741A5/ja
Application granted granted Critical
Publication of JP4486794B2 publication Critical patent/JP4486794B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003171797A 2002-06-17 2003-06-17 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 Expired - Lifetime JP4486794B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US38952802P 2002-06-17 2002-06-17

Publications (3)

Publication Number Publication Date
JP2004134741A JP2004134741A (ja) 2004-04-30
JP2004134741A5 true JP2004134741A5 (ko) 2006-07-20
JP4486794B2 JP4486794B2 (ja) 2010-06-23

Family

ID=32298203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003171797A Expired - Lifetime JP4486794B2 (ja) 2002-06-17 2003-06-17 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物

Country Status (2)

Country Link
JP (1) JP4486794B2 (ko)
TW (1) TWI271443B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299791B1 (ko) * 2005-03-16 2013-08-23 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 시약의 고체 소스로부터 시약을 운반하기 위한 시스템
JP2010503977A (ja) 2006-04-26 2010-02-04 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド 半導体処理システムの洗浄方法
US7678458B2 (en) 2007-01-24 2010-03-16 Asml Holding N.V. Bonding silicon silicon carbide to glass ceramics
TWI494975B (zh) 2008-02-11 2015-08-01 Advanced Tech Materials 在半導體處理系統中離子源之清洗
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
US20160046408A1 (en) * 2015-10-27 2016-02-18 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Internally coated vessel for housing a metal halide
KR20190073788A (ko) 2017-12-19 2019-06-27 주식회사 티씨케이 CVD를 이용한 TaC 코팅층의 제조방법 및 그를 이용하여 제조한 TaC의 물성

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620051B2 (ja) * 1987-08-27 1994-03-16 宇部興産株式会社 有機金属化合物のボンベ充填方法
JP2651530B2 (ja) * 1988-04-15 1997-09-10 住友化学工業株式会社 気相成長用有機金属化合物供給装置
JPH06173011A (ja) * 1992-12-02 1994-06-21 Shin Etsu Chem Co Ltd 気化容器
FR2727322B1 (fr) * 1994-11-30 1996-12-27 Kodak Pathe Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede
JP2964313B2 (ja) * 1995-03-09 1999-10-18 信越化学工業株式会社 固体有機金属化合物供給装置及びその製造方法
JPH09148257A (ja) * 1995-11-29 1997-06-06 Sumitomo Electric Ind Ltd 原料供給装置
JPH10152779A (ja) * 1996-11-25 1998-06-09 Matsushita Electric Ind Co Ltd 気化装置及びｃｖｄ装置
TW576873B (en) * 2000-04-14 2004-02-21 Asm Int Method of growing a thin film onto a substrate
JP4757403B2 (ja) * 2001-06-01 2011-08-24 東京エレクトロン株式会社 固体原料気化装置

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