JP4486794B2 - 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 - Google Patents

固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 Download PDF

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JP4486794B2
JP4486794B2 JP2003171797A JP2003171797A JP4486794B2 JP 4486794 B2 JP4486794 B2 JP 4486794B2 JP 2003171797 A JP2003171797 A JP 2003171797A JP 2003171797 A JP2003171797 A JP 2003171797A JP 4486794 B2 JP4486794 B2 JP 4486794B2
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precursor
container
heat
solid
vapor
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JP2004134741A5 (ko
JP2004134741A (ja
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トゥーミネン マルコ
シェロ エリック
ヴェルグヘス モーヒス
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ASM International NV
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JP2003171797A 2002-06-17 2003-06-17 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 Expired - Lifetime JP4486794B2 (ja)

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US38952802P 2002-06-17 2002-06-17

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JP2004134741A JP2004134741A (ja) 2004-04-30
JP2004134741A5 JP2004134741A5 (ko) 2006-07-20
JP4486794B2 true JP4486794B2 (ja) 2010-06-23

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG160401A1 (en) * 2005-03-16 2010-04-29 Advanced Tech Materials System for delivery of reagents from solid sources thereof
SG171606A1 (en) 2006-04-26 2011-06-29 Advanced Tech Materials Cleaning of semiconductor processing systems
US7678458B2 (en) 2007-01-24 2010-03-16 Asml Holding N.V. Bonding silicon silicon carbide to glass ceramics
WO2009102762A2 (en) 2008-02-11 2009-08-20 Sweeney Joseph D Ion source cleaning in semiconductor processing systems
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
US20160046408A1 (en) * 2015-10-27 2016-02-18 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Internally coated vessel for housing a metal halide
KR20190073788A (ko) * 2017-12-19 2019-06-27 주식회사 티씨케이 CVD를 이용한 TaC 코팅층의 제조방법 및 그를 이용하여 제조한 TaC의 물성

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01265511A (ja) * 1988-04-15 1989-10-23 Sumitomo Chem Co Ltd 気相成長に用いる担体担持有機金属化合物及びこれを用いた気相成長用有機金属化合物供給装置
JPH06173011A (ja) * 1992-12-02 1994-06-21 Shin Etsu Chem Co Ltd 気化容器
JPH08232069A (ja) * 1994-11-30 1996-09-10 Eastman Kodak Co 固体物質の昇華方法及び装置
JPH08299778A (ja) * 1995-03-09 1996-11-19 Shin Etsu Chem Co Ltd 固体有機金属化合物供給装置及びその製造方法
JPH09148257A (ja) * 1995-11-29 1997-06-06 Sumitomo Electric Ind Ltd 原料供給装置
JPH10152779A (ja) * 1996-11-25 1998-06-09 Matsushita Electric Ind Co Ltd 気化装置及びｃｖｄ装置
JP2002004054A (ja) * 2000-04-14 2002-01-09 Asm Microchemistry Oy 基板上に薄膜を成長させる方法
JP2002359238A (ja) * 2001-06-01 2002-12-13 Tokyo Electron Ltd 固体原料気化装置および固体原料気化方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620051B2 (ja) * 1987-08-27 1994-03-16 宇部興産株式会社 有機金属化合物のボンベ充填方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01265511A (ja) * 1988-04-15 1989-10-23 Sumitomo Chem Co Ltd 気相成長に用いる担体担持有機金属化合物及びこれを用いた気相成長用有機金属化合物供給装置
JPH06173011A (ja) * 1992-12-02 1994-06-21 Shin Etsu Chem Co Ltd 気化容器
JPH08232069A (ja) * 1994-11-30 1996-09-10 Eastman Kodak Co 固体物質の昇華方法及び装置
JPH08299778A (ja) * 1995-03-09 1996-11-19 Shin Etsu Chem Co Ltd 固体有機金属化合物供給装置及びその製造方法
JPH09148257A (ja) * 1995-11-29 1997-06-06 Sumitomo Electric Ind Ltd 原料供給装置
JPH10152779A (ja) * 1996-11-25 1998-06-09 Matsushita Electric Ind Co Ltd 気化装置及びｃｖｄ装置
JP2002004054A (ja) * 2000-04-14 2002-01-09 Asm Microchemistry Oy 基板上に薄膜を成長させる方法
JP2002359238A (ja) * 2001-06-01 2002-12-13 Tokyo Electron Ltd 固体原料気化装置および固体原料気化方法

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JP2004134741A (ja) 2004-04-30
TW200404912A (en) 2004-04-01

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