JP2003535356A5 - - Google Patents

Download PDF

Info

Publication number
JP2003535356A5
JP2003535356A5 JP2001550065A JP2001550065A JP2003535356A5 JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5 JP 2001550065 A JP2001550065 A JP 2001550065A JP 2001550065 A JP2001550065 A JP 2001550065A JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001550065A
Other languages
Japanese (ja)
Other versions
JP2003535356A (ja
Filing date
Publication date
Priority claimed from DE2000102626 external-priority patent/DE10002626A1/de
Application filed filed Critical
Priority claimed from PCT/EP2000/013148 external-priority patent/WO2001050171A1/de
Publication of JP2003535356A publication Critical patent/JP2003535356A/ja
Publication of JP2003535356A5 publication Critical patent/JP2003535356A5/ja
Pending legal-status Critical Current

Links

JP2001550065A 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ Pending JP2003535356A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US17352399P 1999-12-29 1999-12-29
US60/173,523 1999-12-29
DE2000102626 DE10002626A1 (de) 2000-01-22 2000-01-22 Katadioptrisches Objektiv mit Asphären
DE10002626.5 2000-01-22
DE10021739 2000-05-04
DE10021739.7 2000-05-04
PCT/EP2000/013148 WO2001050171A1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Publications (2)

Publication Number Publication Date
JP2003535356A JP2003535356A (ja) 2003-11-25
JP2003535356A5 true JP2003535356A5 (ru) 2007-12-27

Family

ID=27213593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001550065A Pending JP2003535356A (ja) 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ

Country Status (6)

Country Link
US (3) US6646718B2 (ru)
EP (1) EP1242843B1 (ru)
JP (1) JP2003535356A (ru)
KR (1) KR100854052B1 (ru)
DE (1) DE50012452D1 (ru)
WO (1) WO2001050171A1 (ru)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19939088A1 (de) * 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
DE50012452D1 (de) * 1999-12-29 2006-05-11 Zeiss Carl Smt Ag Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
JP2004524554A (ja) * 2000-12-22 2004-08-12 カール・ツアイス・エスエムテイ・アーゲー 投射対物レンズ
KR20030072568A (ko) * 2000-12-22 2003-09-15 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 하나 이상의 비구면 렌즈를 갖는 대물렌즈
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
EP1390783A2 (de) 2001-05-15 2004-02-25 Carl Zeiss Objektiv mit fluorid-kristall-linsen
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
KR20040089688A (ko) * 2002-03-01 2004-10-21 칼 짜이스 에스엠테 아게 굴절투사렌즈
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
WO2004010164A2 (en) * 2002-07-18 2004-01-29 Carl Zeiss Smt Ag Catadioptric projection objective
WO2004023172A1 (de) 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
AU2003254550A1 (en) * 2002-09-09 2004-04-30 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
TWI305872B (en) * 2003-03-17 2009-02-01 Nikon Corp Optical projection system, light-exposure apparatus and light-exposure method
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
WO2005033800A1 (de) 2003-09-09 2005-04-14 Carl Zeiss Smt Ag Lithographie-objektiv und projektionsbelichtungsanlage mit mindestens einem solchen lithographie-objektiv
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7177087B2 (en) * 2003-10-28 2007-02-13 Leupold & Stevens, Inc. Compound asperic ocular for riflescope
KR100965330B1 (ko) 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 적어도 한 개의 액체 렌즈를 가진 마이크로리소그래피 투사대물렌즈로서의 대물렌즈
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN100592210C (zh) 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
WO2006051689A1 (ja) * 2004-11-10 2006-05-18 Nikon Corporation 投影光学系、露光装置、および露光方法
TWI454731B (zh) 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
TWI305107B (en) * 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
JP5661172B2 (ja) * 2010-04-23 2015-01-28 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4871237A (en) 1983-07-27 1989-10-03 Nikon Corporation Method and apparatus for adjusting imaging performance of projection optical apparatus
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
US4757354A (en) * 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
EP0332201B1 (en) * 1988-03-11 1994-06-29 Matsushita Electric Industrial Co., Ltd. Optical projection system
SU1587461A1 (ru) 1988-08-03 1990-08-23 Предприятие П/Я Р-6495 Проекционный объектив с увеличением -1/5 @
JP2548359B2 (ja) * 1989-03-01 1996-10-30 松下電器産業株式会社 投影レンズとそれを用いたプロジェクションテレビ
US4963007A (en) * 1989-09-05 1990-10-16 U.S. Precision Lens, Inc. Color corrected projection lens
JP3041939B2 (ja) 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US5724121A (en) * 1995-05-12 1998-03-03 Hughes Danbury Optical Systems, Inc. Mounting member method and apparatus with variable length supports
JPH103039A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折光学系
EP0851304B1 (en) * 1996-12-28 2004-03-17 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
US5999331A (en) * 1997-02-07 1999-12-07 Minolta Co., Ltd. Zoom lens system
DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
JPH10325922A (ja) * 1997-05-26 1998-12-08 Nikon Corp 投影光学系
US5990926A (en) * 1997-07-16 1999-11-23 Nikon Corporation Projection lens systems for excimer laser exposure lithography
JPH1195098A (ja) 1997-09-16 1999-04-09 Nitto Kogaku Kk 投写用ズームレンズおよびプロジェクタ装置
JP4083856B2 (ja) * 1998-02-18 2008-04-30 リコー光学株式会社 投射用ズームレンズ
US6166864A (en) * 1998-03-10 2000-12-26 Canon Kabushiki Kaisha Zoom lens and optical apparatus using the same
JP2000195772A (ja) * 1998-12-25 2000-07-14 Nikon Corp 投影露光装置
WO1999052004A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
DE19939088A1 (de) * 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
KR20010041257A (ko) * 1998-12-25 2001-05-15 오노 시게오 반사굴절 결상 광학계 및 그 광학계를 구비한 투영 노광장치
US6867922B1 (en) * 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP3423644B2 (ja) * 1999-06-14 2003-07-07 キヤノン株式会社 投影光学系及びそれを用いた投影露光装置
JP3359302B2 (ja) * 1999-06-14 2002-12-24 キヤノン株式会社 投影露光装置
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
DE50012452D1 (de) * 1999-12-29 2006-05-11 Zeiss Carl Smt Ag Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
US6542723B1 (en) * 2000-02-11 2003-04-01 Lucent Technologies Inc. Optoelectronic phase locked loop with balanced photodetection for clock recovery in high-speed optical time division multiplexed systems

Similar Documents

Publication Publication Date Title
BE2014C019I2 (ru)
BE2013C048I2 (ru)
JP2000308644A5 (ru)
BE2009C057I2 (ru)
JP2003505835A5 (ru)
JP2003510963A5 (ru)
JP2003501823A5 (ru)
JP2003515983A5 (ru)
JP2003535356A5 (ru)
AR028236A3 (ru)
JP2002182455A5 (ru)
BE2010C040I2 (ru)
JP2003501702A5 (ru)
JP2000306834A5 (ru)
BRPI0113372A8 (ru)
JP2002055220A5 (ru)
JP2002006860A5 (ru)
JP2002049069A5 (ru)
JP2002076960A5 (ru)
JP2001282007A5 (ru)
JP2001285417A5 (ru)
JP2002163128A5 (ru)
JP2002170665A5 (ru)
JP2001233380A5 (ru)
JP2001340572A5 (ru)