JP2003528214A5 - - Google Patents

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Publication number
JP2003528214A5
JP2003528214A5 JP2000585464A JP2000585464A JP2003528214A5 JP 2003528214 A5 JP2003528214 A5 JP 2003528214A5 JP 2000585464 A JP2000585464 A JP 2000585464A JP 2000585464 A JP2000585464 A JP 2000585464A JP 2003528214 A5 JP2003528214 A5 JP 2003528214A5
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JP
Japan
Prior art keywords
electrolyte
chemical
anode
analyzer
supply tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000585464A
Other languages
English (en)
Japanese (ja)
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JP4766579B2 (ja
JP2003528214A (ja
Filing date
Publication date
Priority claimed from US09/263,649 external-priority patent/US6254760B1/en
Priority claimed from US09/289,074 external-priority patent/US6258220B1/en
Priority claimed from US09/350,210 external-priority patent/US6267853B1/en
Application filed filed Critical
Priority claimed from PCT/US1999/028159 external-priority patent/WO2000032835A2/en
Publication of JP2003528214A publication Critical patent/JP2003528214A/ja
Publication of JP2003528214A5 publication Critical patent/JP2003528214A5/ja
Application granted granted Critical
Publication of JP4766579B2 publication Critical patent/JP4766579B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000585464A 1998-11-30 1999-11-29 電気化学堆積装置 Expired - Fee Related JP4766579B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US11020998P 1998-11-30 1998-11-30
US60/110,209 1998-11-30
US09/263,649 1999-03-05
US09/263,649 US6254760B1 (en) 1999-03-05 1999-03-05 Electro-chemical deposition system and method
US09/289,074 1999-04-08
US09/289,074 US6258220B1 (en) 1998-11-30 1999-04-08 Electro-chemical deposition system
US09/350,210 1999-07-09
US09/350,210 US6267853B1 (en) 1999-07-09 1999-07-09 Electro-chemical deposition system
PCT/US1999/028159 WO2000032835A2 (en) 1998-11-30 1999-11-29 Electro-chemical deposition system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009214692A Division JP2009293134A (ja) 1998-11-30 2009-09-16 電気化学堆積装置

Publications (3)

Publication Number Publication Date
JP2003528214A JP2003528214A (ja) 2003-09-24
JP2003528214A5 true JP2003528214A5 (enExample) 2007-01-25
JP4766579B2 JP4766579B2 (ja) 2011-09-07

Family

ID=27493736

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000585464A Expired - Fee Related JP4766579B2 (ja) 1998-11-30 1999-11-29 電気化学堆積装置
JP2009214692A Pending JP2009293134A (ja) 1998-11-30 2009-09-16 電気化学堆積装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009214692A Pending JP2009293134A (ja) 1998-11-30 2009-09-16 電気化学堆積装置

Country Status (3)

Country Link
JP (2) JP4766579B2 (enExample)
TW (1) TW513751B (enExample)
WO (1) WO2000032835A2 (enExample)

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CN105044370B (zh) * 2014-11-04 2017-03-08 长沙绿智电子科技有限公司 一种无人值守的重金属污水监测设备
KR102342006B1 (ko) * 2016-03-04 2021-12-22 가부시키가이샤 에바라 세이사꾸쇼 도금 장치 및 도금 방법
JP6833557B2 (ja) * 2016-03-04 2021-02-24 株式会社荏原製作所 めっき装置及びめっき方法
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