JP2003521123A - 半導体素子に銅相互接続を形成する方法 - Google Patents

半導体素子に銅相互接続を形成する方法

Info

Publication number
JP2003521123A
JP2003521123A JP2001555133A JP2001555133A JP2003521123A JP 2003521123 A JP2003521123 A JP 2003521123A JP 2001555133 A JP2001555133 A JP 2001555133A JP 2001555133 A JP2001555133 A JP 2001555133A JP 2003521123 A JP2003521123 A JP 2003521123A
Authority
JP
Japan
Prior art keywords
dielectric layer
copper
forming
layer
sacrificial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001555133A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003521123A5 (https=
Inventor
パーク，スティーブン・キータイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of JP2003521123A publication Critical patent/JP2003521123A/ja
Publication of JP2003521123A5 publication Critical patent/JP2003521123A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H10W20/084—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures
    • H10W20/086—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts for dual-damascene structures involving buried masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/056—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches
    • H10W20/058—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches by depositing on sacrificial masks, e.g. using lift-off
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/063—Manufacture or treatment of conductive parts of the interconnections by forming conductive members before forming protective insulating material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/425—Barrier, adhesion or liner layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/48—Insulating materials thereof

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2001555133A 2000-01-28 2000-09-20 半導体素子に銅相互接続を形成する方法 Pending JP2003521123A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/493,320 2000-01-28
US09/493,320 US6303486B1 (en) 2000-01-28 2000-01-28 Method of fabricating copper-based semiconductor devices using a sacrificial dielectric layer and an unconstrained copper anneal
PCT/US2000/025679 WO2001056077A1 (en) 2000-01-28 2000-09-20 Method of fabricating copper interconnections in semiconductor devices

Publications (2)

Publication Number Publication Date
JP2003521123A true JP2003521123A (ja) 2003-07-08
JP2003521123A5 JP2003521123A5 (https=) 2007-10-25

Family

ID=23959740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001555133A Pending JP2003521123A (ja) 2000-01-28 2000-09-20 半導体素子に銅相互接続を形成する方法

Country Status (5)

Country Link
US (1) US6303486B1 (https=)
EP (1) EP1250715A1 (https=)
JP (1) JP2003521123A (https=)
KR (1) KR100670227B1 (https=)
WO (1) WO2001056077A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005150681A (ja) * 2003-11-11 2005-06-09 Hynix Semiconductor Inc 半導体素子の金属配線形成方法
WO2012001978A1 (ja) * 2010-07-01 2012-01-05 パナソニック株式会社 不揮発性記憶素子及びその製造方法
JPWO2012140887A1 (ja) * 2011-04-14 2014-07-28 パナソニック株式会社 不揮発性記憶素子およびその製造方法

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US6332900B1 (en) * 1999-02-08 2001-12-25 Wilson Greatbatch Ltd. Physical vapor deposited electrode component and method of manufacture
US6355555B1 (en) * 2000-01-28 2002-03-12 Advanced Micro Devices, Inc. Method of fabricating copper-based semiconductor devices using a sacrificial dielectric layer
US6858937B2 (en) * 2000-03-02 2005-02-22 Micron Technology, Inc. Backend metallization method and device obtained therefrom
US6635564B1 (en) * 2000-09-14 2003-10-21 Infineon Technologies Ag Semiconductor structure and method of fabrication including forming aluminum columns
US6373135B1 (en) * 2000-09-14 2002-04-16 Infineon Technologies Ag Semiconductor structure and method of fabrication
US6429118B1 (en) * 2000-09-18 2002-08-06 Taiwan Semiconductor Manufacturing Company Elimination of electrochemical deposition copper line damage for damascene processing
US6689684B1 (en) * 2001-02-15 2004-02-10 Advanced Micro Devices, Inc. Cu damascene interconnections using barrier/capping layer
US6506668B1 (en) * 2001-06-22 2003-01-14 Advanced Micro Devices, Inc. Utilization of annealing enhanced or repaired seed layer to improve copper interconnect reliability
US6686273B2 (en) * 2001-09-26 2004-02-03 Sharp Laboratories Of America, Inc. Method of fabricating copper interconnects with very low-k inter-level insulator
US20050202667A1 (en) * 2001-12-03 2005-09-15 University Of Southern California Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates
US20080121343A1 (en) * 2003-12-31 2008-05-29 Microfabrica Inc. Electrochemical Fabrication Methods Incorporating Dielectric Materials and/or Using Dielectric Substrates
US6706629B1 (en) 2003-01-07 2004-03-16 Taiwan Semiconductor Manufacturing Company Barrier-free copper interconnect
KR100539444B1 (ko) * 2003-07-11 2005-12-27 매그나칩 반도체 유한회사 반도체 소자의 금속배선 형성방법
FR2859822B1 (fr) * 2003-09-16 2006-05-05 Commissariat Energie Atomique Structure d'interconnexion a faible constante dielectrique
US20050130407A1 (en) * 2003-12-12 2005-06-16 Jui-Neng Tu Dual damascene process for forming a multi-layer low-k dielectric interconnect
US7169659B2 (en) * 2004-08-31 2007-01-30 Texas Instruments Incorporated Method to selectively recess ETCH regions on a wafer surface using capoly as a mask
US7312146B2 (en) * 2004-09-21 2007-12-25 Applied Materials, Inc. Semiconductor device interconnect fabricating techniques
US7129127B2 (en) * 2004-09-24 2006-10-31 Texas Instruments Incorporated Integration scheme to improve NMOS with poly cap while mitigating PMOS degradation
US7172936B2 (en) * 2004-09-24 2007-02-06 Texas Instruments Incorporated Method to selectively strain NMOS devices using a cap poly layer
KR100613346B1 (ko) * 2004-12-15 2006-08-21 동부일렉트로닉스 주식회사 반도체 소자 및 그 제조 방법
US7468545B2 (en) * 2005-05-06 2008-12-23 Megica Corporation Post passivation structure for a semiconductor device and packaging process for same
US7582556B2 (en) * 2005-06-24 2009-09-01 Megica Corporation Circuitry component and method for forming the same
US7422975B2 (en) * 2005-08-18 2008-09-09 Sony Corporation Composite inter-level dielectric structure for an integrated circuit
US20070194450A1 (en) 2006-02-21 2007-08-23 Tyberg Christy S BEOL compatible FET structure
US9613852B2 (en) * 2014-03-21 2017-04-04 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor structure and method making the same
US10629478B2 (en) 2017-08-22 2020-04-21 International Business Machines Corporation Dual-damascene formation with dielectric spacer and thin liner
US11361993B2 (en) * 2018-12-14 2022-06-14 Tokyo Electron Limited Method for inverse via patterning for back end of line dual damascene structures
US10903111B2 (en) * 2019-03-20 2021-01-26 International Business Machines Corporation Semiconductor device with linerless contacts
US11177170B2 (en) 2020-01-16 2021-11-16 International Business Machines Corporation Removal of barrier and liner layers from a bottom of a via
US11177166B2 (en) * 2020-04-17 2021-11-16 International Business Machines Corporation Etch stop layer removal for capacitance reduction in damascene top via integration
US12438084B2 (en) * 2021-12-13 2025-10-07 International Business Machines Corporation Dual-metal ultra thick metal (UTM) structure

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JPH11126820A (ja) * 1997-08-21 1999-05-11 Matsushita Electron Corp 半導体装置とその製造方法
WO1999054934A1 (en) * 1998-04-22 1999-10-28 Cvc Products, Inc. Ultra high-speed chip interconnect using free-space dielectrics
JP2003518325A (ja) * 1999-01-08 2003-06-03 ラム・リサーチ・コーポレーション ダマシンによるメタリゼーション層を形成するためのリソグラフィックな方法

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US6124189A (en) * 1997-03-14 2000-09-26 Kabushiki Kaisha Toshiba Metallization structure and method for a semiconductor device
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JPH11126820A (ja) * 1997-08-21 1999-05-11 Matsushita Electron Corp 半導体装置とその製造方法
WO1999054934A1 (en) * 1998-04-22 1999-10-28 Cvc Products, Inc. Ultra high-speed chip interconnect using free-space dielectrics
JP2002506577A (ja) * 1998-04-22 2002-02-26 シーブイシー プロダクツ、インコーポレイテッド 自由空間誘電体を用いた超高速チップの相互接続
JP2003518325A (ja) * 1999-01-08 2003-06-03 ラム・リサーチ・コーポレーション ダマシンによるメタリゼーション層を形成するためのリソグラフィックな方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005150681A (ja) * 2003-11-11 2005-06-09 Hynix Semiconductor Inc 半導体素子の金属配線形成方法
WO2012001978A1 (ja) * 2010-07-01 2012-01-05 パナソニック株式会社 不揮発性記憶素子及びその製造方法
JP5436669B2 (ja) * 2010-07-01 2014-03-05 パナソニック株式会社 不揮発性記憶素子及びその製造方法
US8785238B2 (en) 2010-07-01 2014-07-22 Panasonic Corporation Nonvolatile memory element and method for manufacturing same
JPWO2012140887A1 (ja) * 2011-04-14 2014-07-28 パナソニック株式会社 不揮発性記憶素子およびその製造方法
US8921200B2 (en) 2011-04-14 2014-12-30 Panasonic Corporation Nonvolatile storage element and method of manufacturing thereof

Also Published As

Publication number Publication date
KR20020074216A (ko) 2002-09-28
KR100670227B1 (ko) 2007-01-17
EP1250715A1 (en) 2002-10-23
WO2001056077A1 (en) 2001-08-02
US6303486B1 (en) 2001-10-16

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