JP2003515479A - ステレオリソグラフィー用組成物の使用 - Google Patents

ステレオリソグラフィー用組成物の使用

Info

Publication number
JP2003515479A
JP2003515479A JP2001542278A JP2001542278A JP2003515479A JP 2003515479 A JP2003515479 A JP 2003515479A JP 2001542278 A JP2001542278 A JP 2001542278A JP 2001542278 A JP2001542278 A JP 2001542278A JP 2003515479 A JP2003515479 A JP 2003515479A
Authority
JP
Japan
Prior art keywords
formula
compound
group
use according
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001542278A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003515479A5 (https=
Inventor
ジョン ウィリアム グッドビー
アラン ウィリアム ホール
キース モリー ブラックウッド
ポール エドワード ヤング ミルン
アンドリュー グレイアム ビッグス
ライアン マイケル ヒース
ロバート ウィリアム バニスター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qinetiq Ltd
Original Assignee
Qinetiq Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qinetiq Ltd filed Critical Qinetiq Ltd
Publication of JP2003515479A publication Critical patent/JP2003515479A/ja
Publication of JP2003515479A5 publication Critical patent/JP2003515479A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/003—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
JP2001542278A 1999-12-04 2000-11-30 ステレオリソグラフィー用組成物の使用 Pending JP2003515479A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9928621.3A GB9928621D0 (en) 1999-12-04 1999-12-04 Composition for use in stereolithography
GB9928621.3 1999-12-04
PCT/GB2000/004756 WO2001040874A1 (en) 1999-12-04 2000-11-30 Use of a composition in stereolithography

Publications (2)

Publication Number Publication Date
JP2003515479A true JP2003515479A (ja) 2003-05-07
JP2003515479A5 JP2003515479A5 (https=) 2008-01-17

Family

ID=10865666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001542278A Pending JP2003515479A (ja) 1999-12-04 2000-11-30 ステレオリソグラフィー用組成物の使用

Country Status (7)

Country Link
US (1) US6951700B2 (https=)
EP (1) EP1242851B1 (https=)
JP (1) JP2003515479A (https=)
AU (1) AU2195601A (https=)
DE (1) DE60042840D1 (https=)
GB (1) GB9928621D0 (https=)
WO (1) WO2001040874A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020090294A1 (ja) * 2018-10-31 2020-05-07 日立化成株式会社 イオン性化合物、有機エレクトロニクス材料、インク組成物、及び有機エレクトロニクス素子
JP2021509374A (ja) * 2017-10-05 2021-03-25 スリーディー システムズ インコーポレーテッド ３ｄプリント用の環化重合性化合物

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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GB0613013D0 (en) 2006-06-30 2006-08-09 Novel Polymer Solutions Ltd Polymeric Materials and Methods for Manufacturing Them
GB0722631D0 (en) * 2007-11-17 2007-12-27 Novel Polymer Solutions Ltd Method of encapsulating a substance
CN102301277B (zh) * 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
JP5885742B2 (ja) 2010-08-02 2016-03-15 シンター ファイン ケミカルズ リミテッド 織物繊維を処理する方法
WO2012017235A1 (en) 2010-08-02 2012-02-09 Novel Polymer Solutions Limited Covered floors and methods of adhering flooring to a floor
WO2012017233A1 (en) 2010-08-02 2012-02-09 Novel Polymer Solutions Limited Methods of coating a low surface energy substrate
JP5986081B2 (ja) 2010-08-02 2016-09-06 シンター ファイン ケミカルズ リミテッド 複合部材及びその製造方法
GB201016670D0 (en) 2010-10-04 2010-11-17 Novel Polymer Solutions Ltd Textile having a camouflage pattern thereon
GB201105453D0 (en) 2011-03-31 2011-05-18 Novel Polymer Solutions Ltd Window frames, structural elements for a roofed construction and methods of assembling same
GB201115823D0 (en) 2011-09-13 2011-10-26 Novel Polymer Solutions Ltd Mineral processing
US10544311B2 (en) 2014-01-16 2020-01-28 Hewlett-Packard Development Company, L.P. Polymeric powder composition for three-dimensional (3D) printing
CN105899346B (zh) 2014-01-16 2017-11-07 惠普发展公司，有限责任合伙企业 三维(3d)印刷方法
WO2015149223A1 (en) 2014-03-31 2015-10-08 Dow Global Technologies Llc Crosslinkable polymeric compositions with diallylamide crosslinking coagents, methods for making the same, and articles made therefrom
US20180015662A1 (en) * 2015-03-05 2018-01-18 Carbon, Inc. Fabrication of three dimensional objects with variable slice thickness
FI129702B (en) * 2015-10-09 2022-07-15 Inkron Ltd Three dimensional printing materials and method for making a 3D printed article
CN107857706B (zh) * 2017-11-30 2020-11-24 华南理工大学 一种增加氨纶酸性染料上染率和色牢度的添加剂及其应用

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DE2146511A1 (de) * 1970-09-22 1972-03-23 Rohm and Haas Co., Philadelphia, Pa. (V.StA.) Naßfeste Harze, Verfahren zu deren Herstellung und Verwendung
JPS5035286A (https=) * 1973-07-26 1975-04-03
JPS5039383A (https=) * 1973-08-13 1975-04-11
US3888928A (en) * 1972-07-31 1975-06-10 Ici Australia Ltd 1,4-bis(diallylaminomethyl)-benzene
JPS5137986A (ja) * 1974-09-27 1976-03-30 Nitto Boseki Co Ltd Jiariruaminkyojugotai no seizohoho
JPH03200815A (ja) * 1989-04-05 1991-09-02 Mitsui Toatsu Chem Inc 光重合性組成物、親水性重合体膜および親水性重合体膜で被覆された板状体
JPH09157235A (ja) * 1995-12-13 1997-06-17 Mitsui Toatsu Chem Inc 新規ｎ−アリル置換フタル酸ハーフアミド化合物
JPH09202757A (ja) * 1996-01-26 1997-08-05 Mitsui Toatsu Chem Inc Ｎ−アリル置換テトラヒドロフタル酸ハーフアミド化合物
JPH09216924A (ja) * 1996-02-01 1997-08-19 Heraeus Kulzer Gmbh 配合物
JPH09227640A (ja) * 1995-10-31 1997-09-02 Teijin Seiki Co Ltd 耐熱性に優れる光硬化性樹脂組成物
JP2002521551A (ja) * 1998-07-25 2002-07-16 イギリス国 接着剤およびシーラント
JP2002521531A (ja) * 1998-07-25 2002-07-16 イギリス国 ポリマー製造
JP2002521529A (ja) * 1998-07-25 2002-07-16 イギリス国 単量体及び、それらから得られる網状高分子

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US3912693A (en) * 1973-04-05 1975-10-14 Nitto Boseki Co Ltd Process for producing polyamines
US3957699A (en) * 1973-06-12 1976-05-18 Ici Australia Limited Process for polymerizing allylamines employing a redox initiator consisting of Fe++ or Ti+++ with H2 O2, hydroxyl amine, or hydroperoxides to form insoluble crosslinked polymers
US4121986A (en) 1975-05-07 1978-10-24 Ici Australia Limited Process for the polymerization of polyallylamines in the presence of a mineral acid solution
DE3233912A1 (de) * 1982-09-13 1984-03-15 Merck Patent Gmbh, 6100 Darmstadt Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
US5241041A (en) * 1991-12-16 1993-08-31 Occidental Chemical Corporation Photocrosslinkable polyimide ammonium salts
GB9522367D0 (en) * 1995-11-01 1996-01-03 Secr Defence Liquid crystal polymers
GB9522362D0 (en) * 1995-11-01 1996-01-03 Secr Defence Liquid crystal polymers
GB9606768D0 (en) * 1996-03-29 1996-06-05 Secr Defence Liquid crystal materials and devices
US6350840B1 (en) * 1998-07-02 2002-02-26 National Starch And Chemical Investment Holding Corporation Underfill encapsulants prepared from allylated amide compounds
GB9816163D0 (en) * 1998-07-25 1998-09-23 Secr Defence Liquid crystal polymers
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
EP1268586B1 (en) * 2000-04-01 2010-01-27 Qinetiq Limited Polymers, processes, compositions, adhesives, uses, products

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2146511A1 (de) * 1970-09-22 1972-03-23 Rohm and Haas Co., Philadelphia, Pa. (V.StA.) Naßfeste Harze, Verfahren zu deren Herstellung und Verwendung
US3888928A (en) * 1972-07-31 1975-06-10 Ici Australia Ltd 1,4-bis(diallylaminomethyl)-benzene
JPS5035286A (https=) * 1973-07-26 1975-04-03
JPS5039383A (https=) * 1973-08-13 1975-04-11
JPS5137986A (ja) * 1974-09-27 1976-03-30 Nitto Boseki Co Ltd Jiariruaminkyojugotai no seizohoho
JPH03200815A (ja) * 1989-04-05 1991-09-02 Mitsui Toatsu Chem Inc 光重合性組成物、親水性重合体膜および親水性重合体膜で被覆された板状体
JPH09227640A (ja) * 1995-10-31 1997-09-02 Teijin Seiki Co Ltd 耐熱性に優れる光硬化性樹脂組成物
JPH09157235A (ja) * 1995-12-13 1997-06-17 Mitsui Toatsu Chem Inc 新規ｎ−アリル置換フタル酸ハーフアミド化合物
JPH09202757A (ja) * 1996-01-26 1997-08-05 Mitsui Toatsu Chem Inc Ｎ−アリル置換テトラヒドロフタル酸ハーフアミド化合物
JPH09216924A (ja) * 1996-02-01 1997-08-19 Heraeus Kulzer Gmbh 配合物
JP2002521551A (ja) * 1998-07-25 2002-07-16 イギリス国 接着剤およびシーラント
JP2002521531A (ja) * 1998-07-25 2002-07-16 イギリス国 ポリマー製造
JP2002521529A (ja) * 1998-07-25 2002-07-16 イギリス国 単量体及び、それらから得られる網状高分子

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021509374A (ja) * 2017-10-05 2021-03-25 スリーディー システムズ インコーポレーテッド ３ｄプリント用の環化重合性化合物
JP7062778B2 (ja) 2017-10-05 2022-05-06 スリーディー システムズ インコーポレーテッド ３ｄプリント用の環化重合性化合物
US11767440B2 (en) 2017-10-05 2023-09-26 3D Systems, Inc. Cyclopolymerizable compounds for 3D printing
WO2020090294A1 (ja) * 2018-10-31 2020-05-07 日立化成株式会社 イオン性化合物、有機エレクトロニクス材料、インク組成物、及び有機エレクトロニクス素子

Also Published As

Publication number Publication date
WO2001040874A1 (en) 2001-06-07
EP1242851A1 (en) 2002-09-25
EP1242851B1 (en) 2009-08-26
US20030157435A1 (en) 2003-08-21
GB9928621D0 (en) 2000-02-02
AU2195601A (en) 2001-06-12
US6951700B2 (en) 2005-10-04
DE60042840D1 (de) 2009-10-08

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