JP2003505891A5 - - Google Patents

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Publication number
JP2003505891A5
JP2003505891A5 JP2001512998A JP2001512998A JP2003505891A5 JP 2003505891 A5 JP2003505891 A5 JP 2003505891A5 JP 2001512998 A JP2001512998 A JP 2001512998A JP 2001512998 A JP2001512998 A JP 2001512998A JP 2003505891 A5 JP2003505891 A5 JP 2003505891A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2001512998A
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Japanese (ja)
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JP2003505891A (ja
JP3770542B2 (ja
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Priority claimed from PCT/US2000/019060 external-priority patent/WO2001007967A1/en
Publication of JP2003505891A publication Critical patent/JP2003505891A/ja
Publication of JP2003505891A5 publication Critical patent/JP2003505891A5/ja
Application granted granted Critical
Publication of JP3770542B2 publication Critical patent/JP3770542B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2001512998A 1999-07-22 2000-07-13 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置 Expired - Lifetime JP3770542B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14505799P 1999-07-22 1999-07-22
US60/145,057 1999-07-22
US14984099P 1999-08-19 1999-08-19
US60/149,840 1999-08-19
PCT/US2000/019060 WO2001007967A1 (en) 1999-07-22 2000-07-13 Extreme ultraviolet soft x-ray projection lithographic method and mask devices

Publications (3)

Publication Number Publication Date
JP2003505891A JP2003505891A (ja) 2003-02-12
JP2003505891A5 true JP2003505891A5 (enExample) 2006-01-05
JP3770542B2 JP3770542B2 (ja) 2006-04-26

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JP2001512998A Expired - Lifetime JP3770542B2 (ja) 1999-07-22 2000-07-13 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置

Country Status (6)

Country Link
US (2) US6465272B1 (enExample)
EP (1) EP1218796A4 (enExample)
JP (1) JP3770542B2 (enExample)
KR (1) KR100647968B1 (enExample)
AU (1) AU5932500A (enExample)
WO (1) WO2001007967A1 (enExample)

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CN114245832B (zh) 2019-06-07 2025-10-28 朗姆研究公司 原子层沉积期间的膜特性的原位控制

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