JP2003247811A5 - - Google Patents

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Publication number
JP2003247811A5
JP2003247811A5 JP2002049607A JP2002049607A JP2003247811A5 JP 2003247811 A5 JP2003247811 A5 JP 2003247811A5 JP 2002049607 A JP2002049607 A JP 2002049607A JP 2002049607 A JP2002049607 A JP 2002049607A JP 2003247811 A5 JP2003247811 A5 JP 2003247811A5
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JP
Japan
Prior art keywords
substrate
optical
film thickness
monitoring
thin film
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JP2002049607A
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English (en)
Japanese (ja)
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JP2003247811A (ja
JP3865303B2 (ja
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Priority to JP2002049607A priority Critical patent/JP3865303B2/ja
Priority claimed from JP2002049607A external-priority patent/JP3865303B2/ja
Publication of JP2003247811A publication Critical patent/JP2003247811A/ja
Publication of JP2003247811A5 publication Critical patent/JP2003247811A5/ja
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Publication of JP3865303B2 publication Critical patent/JP3865303B2/ja
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JP2002049607A 2002-02-26 2002-02-26 光学式膜厚監視方法および装置 Expired - Lifetime JP3865303B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002049607A JP3865303B2 (ja) 2002-02-26 2002-02-26 光学式膜厚監視方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002049607A JP3865303B2 (ja) 2002-02-26 2002-02-26 光学式膜厚監視方法および装置

Publications (3)

Publication Number Publication Date
JP2003247811A JP2003247811A (ja) 2003-09-05
JP2003247811A5 true JP2003247811A5 (enExample) 2005-02-10
JP3865303B2 JP3865303B2 (ja) 2007-01-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002049607A Expired - Lifetime JP3865303B2 (ja) 2002-02-26 2002-02-26 光学式膜厚監視方法および装置

Country Status (1)

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JP (1) JP3865303B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100482856C (zh) * 2005-05-24 2009-04-29 鸿富锦精密工业（深圳）有限公司 镀膜设备及其镀膜方法
WO2013186879A1 (ja) * 2012-06-13 2013-12-19 株式会社シンクロン 膜厚測定装置及び成膜装置

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